JPH0328809B2 - - Google Patents

Info

Publication number
JPH0328809B2
JPH0328809B2 JP57084787A JP8478782A JPH0328809B2 JP H0328809 B2 JPH0328809 B2 JP H0328809B2 JP 57084787 A JP57084787 A JP 57084787A JP 8478782 A JP8478782 A JP 8478782A JP H0328809 B2 JPH0328809 B2 JP H0328809B2
Authority
JP
Japan
Prior art keywords
reduction
substrate
reticle
pattern
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57084787A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58202449A (ja
Inventor
Yoshio Kawamura
Akihiro Takanashi
Shinji Kunyoshi
Toshishige Kurosaki
Tsuneo Terasawa
Sumio Hosaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57084787A priority Critical patent/JPS58202449A/ja
Publication of JPS58202449A publication Critical patent/JPS58202449A/ja
Publication of JPH0328809B2 publication Critical patent/JPH0328809B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57084787A 1982-05-21 1982-05-21 縮小投影露光装置 Granted JPS58202449A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57084787A JPS58202449A (ja) 1982-05-21 1982-05-21 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57084787A JPS58202449A (ja) 1982-05-21 1982-05-21 縮小投影露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP4054756A Division JPH0712019B2 (ja) 1992-03-13 1992-03-13 投影露光方法及び投影露光装置

Publications (2)

Publication Number Publication Date
JPS58202449A JPS58202449A (ja) 1983-11-25
JPH0328809B2 true JPH0328809B2 (enrdf_load_stackoverflow) 1991-04-22

Family

ID=13840403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57084787A Granted JPS58202449A (ja) 1982-05-21 1982-05-21 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS58202449A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2516194B2 (ja) * 1984-06-11 1996-07-10 株式会社日立製作所 投影露光方法
JPS63164212A (ja) * 1986-12-26 1988-07-07 Hitachi Ltd 縮小投影露光装置
JPS6442820A (en) * 1987-08-10 1989-02-15 Nec Corp Manufacture of semiconductor integrated circuit
JP2555274B2 (ja) * 1994-07-13 1996-11-20 株式会社日立製作所 投影露光装置
JP5404216B2 (ja) * 2009-07-02 2014-01-29 キヤノン株式会社 露光方法、露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
JPS58202449A (ja) 1983-11-25

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