JPS5819551Y2 - photo mask - Google Patents
photo maskInfo
- Publication number
- JPS5819551Y2 JPS5819551Y2 JP1978136539U JP13653978U JPS5819551Y2 JP S5819551 Y2 JPS5819551 Y2 JP S5819551Y2 JP 1978136539 U JP1978136539 U JP 1978136539U JP 13653978 U JP13653978 U JP 13653978U JP S5819551 Y2 JPS5819551 Y2 JP S5819551Y2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- photomask
- inspection device
- defects
- inspection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Description
【考案の詳細な説明】
本考案は一部にチェック用パターンを有するフォトマス
クに関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photomask having a check pattern in part.
このフォトマスクは、現在様々の回路形成に使用されて
おり、例えば、プリント板等にも使用されている。This photomask is currently used for forming various circuits, for example, for printed boards.
一般にプリント板はフォトレジストを施した銅張基板に
プリント板パターンを有するフォトマスクを密着露光し
た後、エツチング処理を経て完成する。Generally, a printed board is completed by closely exposing a photomask having a printed board pattern to a copper-clad substrate coated with a photoresist, and then performing an etching process.
従って、１枚のフォトマスクを基に多数のプリント板が
作製される場合もあり、完成したフォトマスクが所定の
パターン形状およびパターン幅を有しているか否かを検
査する作業は重要である。Therefore, a large number of printed boards may be manufactured based on one photomask, and it is important to inspect whether the completed photomask has a predetermined pattern shape and pattern width.
従来は、このようなフォトマスクの検査は顕微鏡等を用
いて人手による方法で行っているが、最近フォトマスク
パターン面を光により走査してメモリ等に記憶し、この
記憶されたパターン情報を読み出し自動的にパターンを
検査するパターン検査装置が開発されている。Conventionally, such photomask inspections have been performed manually using a microscope, etc., but recently the photomask pattern surface is scanned with light, stored in a memory, etc., and this stored pattern information is read out. Pattern inspection devices that automatically inspect patterns have been developed.
この検査装置は被検査フォトマスクをセットすると自動
的に欠陥パターン部分を指摘するものである。This inspection device automatically points out defective pattern portions when a photomask to be inspected is set.
しかしながら、被検査フォトマスクの検査開始に当り、
検査装置が正常に動作し、確実にパターン欠陥を判別で
きる状態になっているか否か確認することができない。However, when starting the inspection of the photomask to be inspected,
It is not possible to confirm whether the inspection device is operating normally and is in a state where it can reliably identify pattern defects.
本考案の目的は、上記問題点を解決するためのフォトマ
スクを提供するもので、フォトマスクのパターン欠陥を
検査するパターン検査装置に使用され、検査開始に当り
、該パターン検査装置のパターン欠陥判別能力を調べる
ための欠陥パターンとして、被検査フォトマスクの一部
に判別すべき複数種類の欠陥パターンであり、かつ、順
次大きさの異なる欠陥を有するパターンを設けてなるフ
ォトマスクを要旨としている。The purpose of the present invention is to provide a photomask for solving the above-mentioned problems, which is used in a pattern inspection device for inspecting pattern defects on a photomask, and is used to detect pattern defects in the pattern inspection device when starting an inspection. The gist of this paper is a photomask in which a part of the photomask to be inspected is provided with a plurality of types of defect patterns to be discriminated, and patterns having defects of sequentially different sizes are provided as defect patterns for checking the performance.
次に図面により本考案の詳細を説明する。Next, details of the present invention will be explained with reference to the drawings.
第１図は本考案の一実施例によるプリント服用フォトマ
スクで、フォトマスク面の一部にチェック用パターン３
を設けである。Figure 1 shows a printed photomask according to an embodiment of the present invention, with a check pattern 3 on a part of the photomask surface.
This is provided.
第２図は第１図におけるチェック用パターン２の詳細図
を示すもので、検査装置で自動的に判定すべき欠陥パタ
ーンのサンプルが描かれている。FIG. 2 shows a detailed view of the check pattern 2 in FIG. 1, and depicts a sample of a defective pattern to be automatically determined by the inspection device.
第２図において３はピンホール部、４は断線部。In Fig. 2, 3 is a pinhole part and 4 is a broken wire part.
５は黒点部、６は突起部、７は欠は部、８はショート部
を示し、いずれもパターンの欠陥部分である。5 is a black dot, 6 is a protrusion, 7 is a chip, and 8 is a short, all of which are defective portions of the pattern.
各種欠陥部は一定単位で小さい欠陥から大きい欠陥１で
順に並べである。The various defective parts are arranged in fixed units in order from the smallest defect to the largest defect 1.
フォトマスクの一部にチェック用パターンが設けられて
いるのでパターン検査装置で検査開始に当り、１ずフォ
トマスクのチェック用パターン部分を走査して判定させ
、検査装置の欠陥パターン判別機能が正常か否か、また
、どの程度の欠陥１で測定できるか等を事前に把握する
ことができる。Since a check pattern is provided on a part of the photomask, when starting the inspection with a pattern inspection device, first scan the check pattern portion of the photomask and determine whether the defect pattern discrimination function of the inspection device is normal. It is possible to know in advance whether the measurement is possible or not, and how many defects 1 can be measured.
従って常にパターン検査装置の正常性をチェックしてフ
ォトマスクの検査ができる。Therefore, the photomask can be inspected by constantly checking the normality of the pattern inspection device.
以上説明した如く、本考案のフォトマスクを使用すると
、常にパターン検査装置の正常性をチェックしてから検
査を進めることができ、検査精度の向上が図れる。As explained above, when the photomask of the present invention is used, it is possible to always check the normality of the pattern inspection device before proceeding with the inspection, thereby improving inspection accuracy.
第１図は本考案の実施例によるフォトマスク、第２図は
第１図におけるチェック用パターンの詳細図を示す。FIG. 1 shows a photomask according to an embodiment of the present invention, and FIG. 2 shows a detailed view of the check pattern in FIG. 1.
Claims (1)
置に使用され、検査開始に当り、該パターン検査装置の
パターン欠陥判別能力を調べるためノ欠陥ハターンとし
て、被検査フォトマスクの一部に判別すべき複数種類の
欠陥パターンであり、かつ、順次大きさの異なる欠陥を
有するパターンを設けて成るフォトマスク。It is used in a pattern inspection device that inspects pattern defects on a photomask, and at the start of inspection, multiple types of defects to be determined on a part of the photomask to be inspected are used to check the pattern defect discrimination ability of the pattern inspection device. A photomask comprising a pattern of defects having sequentially different sizes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1978136539U JPS5819551Y2 (en) | 1978-10-04 | 1978-10-04 | photo mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1978136539U JPS5819551Y2 (en) | 1978-10-04 | 1978-10-04 | photo mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5552143U JPS5552143U (en) | 1980-04-07 |
| JPS5819551Y2 true JPS5819551Y2 (en) | 1983-04-22 |
Family
ID=29107857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1978136539U Expired JPS5819551Y2 (en) | 1978-10-04 | 1978-10-04 | photo mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5819551Y2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57184768A (en) * | 1981-05-02 | 1982-11-13 | Ckd Corp | Manually operating valve for safety |
| JPS59105647A (en) * | 1982-12-09 | 1984-06-19 | Mitsubishi Electric Corp | Photomask |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4866374A (en) * | 1971-12-08 | 1973-09-11 | ||
| JPS5116878A (en) * | 1974-08-01 | 1976-02-10 | Fujitsu Ltd | Hoto masukuno seizohoho |
-
1978
- 1978-10-04 JP JP1978136539U patent/JPS5819551Y2/en not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4866374A (en) * | 1971-12-08 | 1973-09-11 | ||
| JPS5116878A (en) * | 1974-08-01 | 1976-02-10 | Fujitsu Ltd | Hoto masukuno seizohoho |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5552143U (en) | 1980-04-07 |
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