JPS58191435A - レジスト像の製造方法 - Google Patents

レジスト像の製造方法

Info

Publication number
JPS58191435A
JPS58191435A JP57074895A JP7489582A JPS58191435A JP S58191435 A JPS58191435 A JP S58191435A JP 57074895 A JP57074895 A JP 57074895A JP 7489582 A JP7489582 A JP 7489582A JP S58191435 A JPS58191435 A JP S58191435A
Authority
JP
Japan
Prior art keywords
resist
material containing
image
vinylnaphthalene
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57074895A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0160816B2 (OSRAM
Inventor
Yoshitake Onishi
大西　良武
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57074895A priority Critical patent/JPS58191435A/ja
Publication of JPS58191435A publication Critical patent/JPS58191435A/ja
Publication of JPH0160816B2 publication Critical patent/JPH0160816B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57074895A 1982-05-04 1982-05-04 レジスト像の製造方法 Granted JPS58191435A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57074895A JPS58191435A (ja) 1982-05-04 1982-05-04 レジスト像の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57074895A JPS58191435A (ja) 1982-05-04 1982-05-04 レジスト像の製造方法

Publications (2)

Publication Number Publication Date
JPS58191435A true JPS58191435A (ja) 1983-11-08
JPH0160816B2 JPH0160816B2 (OSRAM) 1989-12-26

Family

ID=13560575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57074895A Granted JPS58191435A (ja) 1982-05-04 1982-05-04 レジスト像の製造方法

Country Status (1)

Country Link
JP (1) JPS58191435A (OSRAM)

Also Published As

Publication number Publication date
JPH0160816B2 (OSRAM) 1989-12-26

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