JPS58187923A - 放射線感応性レジスト材を用いる微細加工法 - Google Patents
放射線感応性レジスト材を用いる微細加工法Info
- Publication number
- JPS58187923A JPS58187923A JP7048382A JP7048382A JPS58187923A JP S58187923 A JPS58187923 A JP S58187923A JP 7048382 A JP7048382 A JP 7048382A JP 7048382 A JP7048382 A JP 7048382A JP S58187923 A JPS58187923 A JP S58187923A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- resist material
- vinyltoluene
- resist
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7048382A JPS58187923A (ja) | 1982-04-28 | 1982-04-28 | 放射線感応性レジスト材を用いる微細加工法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7048382A JPS58187923A (ja) | 1982-04-28 | 1982-04-28 | 放射線感応性レジスト材を用いる微細加工法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58187923A true JPS58187923A (ja) | 1983-11-02 |
JPS6360894B2 JPS6360894B2 (enrdf_load_stackoverflow) | 1988-11-25 |
Family
ID=13432807
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7048382A Granted JPS58187923A (ja) | 1982-04-28 | 1982-04-28 | 放射線感応性レジスト材を用いる微細加工法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58187923A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5988733A (ja) * | 1982-11-13 | 1984-05-22 | Japan Synthetic Rubber Co Ltd | 電離放射線感応性材料の製法 |
JPS60212755A (ja) * | 1984-04-06 | 1985-10-25 | Toray Ind Inc | 感放射線材料 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5817105A (ja) * | 1981-07-24 | 1983-02-01 | Japan Synthetic Rubber Co Ltd | 電離放射線感応性材料 |
-
1982
- 1982-04-28 JP JP7048382A patent/JPS58187923A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5817105A (ja) * | 1981-07-24 | 1983-02-01 | Japan Synthetic Rubber Co Ltd | 電離放射線感応性材料 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5988733A (ja) * | 1982-11-13 | 1984-05-22 | Japan Synthetic Rubber Co Ltd | 電離放射線感応性材料の製法 |
JPS60212755A (ja) * | 1984-04-06 | 1985-10-25 | Toray Ind Inc | 感放射線材料 |
Also Published As
Publication number | Publication date |
---|---|
JPS6360894B2 (enrdf_load_stackoverflow) | 1988-11-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4507384A (en) | Pattern forming material and method for forming pattern therewith | |
US4405708A (en) | Method of applying a resist pattern on a substrate, and resist material mixture | |
US4286049A (en) | Method of forming a negative resist pattern | |
JPS58187923A (ja) | 放射線感応性レジスト材を用いる微細加工法 | |
JPS62240953A (ja) | レジスト | |
EP0051320B1 (en) | Radiation-sensitive negative resist | |
JPS61294433A (ja) | 高解像度感光性樹脂組成物およびこれを使用するサブミクロンパタ−ンの製造方法 | |
JPS5979247A (ja) | 遠紫外線または電子線感応用レジスト | |
JPS5817105A (ja) | 電離放射線感応性材料 | |
JPH052141B2 (enrdf_load_stackoverflow) | ||
JPS6260691B2 (enrdf_load_stackoverflow) | ||
JPS647375B2 (enrdf_load_stackoverflow) | ||
JPS6091350A (ja) | 電離放射線感応ネガ型レジスト | |
JPS6374050A (ja) | 放射線感応性レジスト材料および微細加工方法 | |
US4604305A (en) | Improvements in contrast of a positive polymer resist having a glass transition temperature through control of the molecular weight distribution and prebaked temperature | |
JPS5857734B2 (ja) | 皮膜形成方法法 | |
JPS59192245A (ja) | レジスト材料 | |
JPS6259950A (ja) | 電離放射線感応ポジ型レジスト | |
JPH0377986B2 (enrdf_load_stackoverflow) | ||
JPS6058462B2 (ja) | ネガ型レジスト材料 | |
JPH033214B2 (enrdf_load_stackoverflow) | ||
JPS6374049A (ja) | 放射線感応性レジスト材およびパタ−ン形成方法 | |
JPS61160742A (ja) | レジストの現像液 | |
JPS61149947A (ja) | レジスト材料 | |
JPS60212755A (ja) | 感放射線材料 |