JPS58179924A - Production of magnetic head - Google Patents
Production of magnetic headInfo
- Publication number
- JPS58179924A JPS58179924A JP6239882A JP6239882A JPS58179924A JP S58179924 A JPS58179924 A JP S58179924A JP 6239882 A JP6239882 A JP 6239882A JP 6239882 A JP6239882 A JP 6239882A JP S58179924 A JPS58179924 A JP S58179924A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- channel
- soft magnetic
- magnetic film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
Abstract
Description
【発明の詳細な説明】
本発明は狭ギヤツプ長磁気ヘッドの製造方法に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a narrow gap length magnetic head.
これまでの機械的突き合わせ方式のギャップ形成法では
短波長記録に適した規定のアジマス角をもった狭トラツ
ク幅狭ギヤツプ長ヘッドの量産には難点があることから
、第1図に示したような非磁性基板l上に付着せしめた
第1rvi目の軟磁性膜2に形成した#l13の一方の
斜面4を動作ギャップ面として用いる磁気ヘッドが提案
されている。Conventional mechanical butt-type gap forming methods have difficulties in mass producing narrow track width, narrow gap length heads with a specified azimuth angle suitable for short wavelength recording. A magnetic head has been proposed in which one slope 4 of #l13 formed on the first rvi-th soft magnetic film 2 adhered on a non-magnetic substrate l is used as an operating gap surface.
上述の発明では非磁性基板lに直接膜厚IQgg++を
以上の第二層軟磁性膜2を何事させる際に上記軟磁性膜
内部に蓄積された応力によシ基板1がひずむ。骸基板ひ
ずみ番は超高硬度切削バイト5での上記軟磁性膜2に対
する溝形成切削加工の際に切削深さの制御を不正確なも
のとし、基板位置によっては非磁性基板にまで切削バイ
ト5が達する。その結果生ずる非磁性基板切削・小片が
動作ギャップ面となる溝斜面番にすり傷11を発生させ
てしまう。(第1図D)また、アジマス角となる基板表
面法線方向と溝斜面4となす角θ2が基板位置によって
変動するという問題を抱えている(第1図E)。In the above-mentioned invention, when the second layer soft magnetic film 2 having a film thickness of IQgg++ or more is applied directly to the non-magnetic substrate 1, the substrate 1 is distorted due to the stress accumulated inside the soft magnetic film. The skeleton substrate strain number makes the control of the cutting depth inaccurate when cutting grooves on the soft magnetic film 2 with the ultra-high hardness cutting tool 5, and depending on the substrate position, the cutting tool 5 can even reach the non-magnetic substrate. reaches. As a result, the resulting non-magnetic substrate is cut into small pieces, which causes scratches 11 on the groove slope plate serving as the operating gap surface. (FIG. 1D) Furthermore, there is a problem in that the angle θ2 between the substrate surface normal direction and the groove slope 4, which is the azimuth angle, varies depending on the substrate position (FIG. 1E).
第2図のごとく非磁性基板1と第二層軟磁性膜2の間に
SUS 310のような非磁性金属膜12をスパッタリ
ング岬の薄膜作成技術で形成させ、上記問題の解決を図
る試みも上記非磁性金属膜12の膜厚が6μm以上でや
っとすり傷11の発生を抑えることができただけで(第
2図D)上述の問題点が全て十分に解決はされていない
。Attempts have also been made to solve the above problem by forming a nonmagnetic metal film 12 such as SUS 310 between the nonmagnetic substrate 1 and the second layer soft magnetic film 2 using sputtering cape thin film formation technology as shown in Figure 2. Although the occurrence of scratches 11 could only be suppressed when the thickness of the nonmagnetic metal film 12 was 6 μm or more (FIG. 2D), all of the above-mentioned problems have not been sufficiently solved.
本発明の目的は上記従来技術の問題点を解決し、精度良
くアジマス角トラック幅、ギャップ長を規制したヘッド
を量産する技術を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems of the prior art and to provide a technology for mass-producing heads in which the azimuthal track width and gap length are precisely regulated.
本発明では少なくとも第1層軟磁性農2を非磁性基板l
の表面全面にではなく、各ヘッドチップを構成する部分
にのみ格子模様状に付着させて、該基板lのひずみを低
減させるととによって上記従来技術の問題点の解決を図
った。In the present invention, at least the first soft magnetic layer 2 is formed on a non-magnetic substrate l.
The problem of the prior art described above was solved by attaching it in a checkered pattern only to the parts constituting each head chip, rather than to the entire surface of the substrate l, thereby reducing the distortion of the substrate l.
第3図に本発明の具体的実施例を示す。非磁性基板1上
に非磁性金属膜13、第1層軟磁性膜14の順にマスク
スパッタリング、マスク真空蒸着法等で所定の膜厚だけ
格子模様状に付着させる(第3図A)。しかる後断面形
状が2字形もしくは倒立台形で溝斜面の一方16が基板
表面の法線方向に対してアジマス角θなる角度をなすよ
うに所定形状のダイヤモンドバイト5 (その他の材質
の超高硬度切削バイトでも町)で上記軟磁性膜14に溝
入切削加工を施す。(第3図B)fIIl深さけ基板の
どの位置においても軟磁性膜o4膜厚以上で非磁性基鈑
1に達しないものとする。FIG. 3 shows a specific embodiment of the present invention. A nonmagnetic metal film 13 and a first layer soft magnetic film 14 are deposited on the nonmagnetic substrate 1 in this order by mask sputtering, mask vacuum evaporation, or the like to a predetermined film thickness in a grid pattern (FIG. 3A). A diamond cutting tool 5 (cutting ultra-high hardness of other materials) with a predetermined shape so that the rear cross-sectional shape is a two-letter shape or an inverted trapezoid, and one of the groove slopes 16 forms an azimuth angle θ with respect to the normal direction of the substrate surface. Groove cutting is performed on the soft magnetic film 14 using a cutting tool. (FIG. 3B) It is assumed that the thickness of the soft magnetic film o4 or more does not reach the nonmagnetic base plate 1 at any position on the fIIl depth substrate.
以上のよう忙溝15を形成したis斜面16の膜ルが動
作ギャップ長に等しくなるようにギャップスペーサ膜6
を付着させ、該ギャップスペーサ膜6を挾んでマスクス
パッタリング、マスク真空蒸着法等で第1層軟磁性膜1
4上に、&定の膜片の第2層軟磁性膜 z7を付着させ
る。次にトラック幅寸法を規定するために断面形状が倒
立台形となるようなダイヤモンドバイト18 (その他
の材質の超高硬度切削バイトでも可)で動作ギャップ1
9近傍の第1層軟磁性膜1γに溝入切削加工を施す(第
3図C)。トラック幅の寸法規制が終わったら、軟磁性
膜17を保護する膜厚10μm以上の耐摩耗性に優れた
非磁性物質の保護膜20を該軟磁性膜17上に形成し、
所定位儀に巻線用窓 9穴加工を施した後、上記軟磁性
膜の付着していない部分を切断しヘッドチップ化する(
第3図D)。As described above, the gap spacer film 6 is adjusted so that the film length of the IS slope 16 in which the busy groove 15 is formed is equal to the operating gap length.
The first layer soft magnetic film 1 is formed by mask sputtering, mask vacuum evaporation, etc. with the gap spacer film 6 in between.
4, a second layer soft magnetic film z7 of a constant film piece is attached. Next, in order to define the track width dimension, use a diamond cutting tool 18 (an ultra-high hardness cutting tool made of other materials is also possible) with an inverted trapezoidal cross section to determine the operating gap 1.
Groove cutting is performed on the first layer soft magnetic film 1γ near 9 (FIG. 3C). After the track width size has been regulated, a protective film 20 made of a non-magnetic material with excellent wear resistance and having a thickness of 10 μm or more is formed on the soft magnetic film 17 to protect the soft magnetic film 17.
After machining 9 holes for winding on the fixed positioning unit, cut off the part to which the soft magnetic film is not attached to form a head chip (
Figure 3D).
格子模様状の第1層軟磁性膜14の形成は基板・表面全
体に付着させた後、エツチング、電解研摩等の手法によ
り不要部分を除去して行ってもよい。The first layer soft magnetic film 14 having a lattice pattern may be formed by depositing it on the entire surface of the substrate and then removing unnecessary portions by etching, electrolytic polishing, or the like.
トラック幅寸法規制のため、第1層軟磁性膜17に施す
溝入れ加工はダイヤモンドバイトによる切削以外に1イ
オンミリング、エツチング、電解研摩、放電加工等の手
法を用いそもよい。In order to regulate the track width dimension, the first layer soft magnetic film 17 may be grooved by one-ion milling, etching, electrolytic polishing, electric discharge machining, etc. in addition to cutting with a diamond cutting tool.
本発明のごとく非磁性金jg 膜1s 、軟磁性膜14
1γを格子模様状に形成すれば、基板1の表面全面に上
記金属膜、軟磁性膜を形成した場合に比較して基板に誘
導されるひずみを低減できる。As in the present invention, non-magnetic gold film 1s, soft magnetic film 14
If 1γ is formed in a lattice pattern, the strain induced in the substrate can be reduced compared to the case where the metal film or soft magnetic film is formed over the entire surface of the substrate 1.
従って従来方法では6μmという膜厚が必要であった非
磁性金属膜13の膜厚をダイヤモンドバイト5による溝
入れ加工の制御限界である2μ肩程度脣で薄くでき、製
造時間の短縮が図れる。Therefore, the thickness of the non-magnetic metal film 13, which was required to be 6 μm in the conventional method, can be reduced to about 2 μm, which is the control limit for grooving using the diamond cutting tool 5, and manufacturing time can be shortened.
捷だ基板に誘導されるひずみの低減により、従来は所望
のアジマス角のヘッドが基板の一部からしか得られなか
ったが、基板全体にわたるアジマス角の誤差を大きく低
減できるようになり、所望のアジマス角のヘッドを基板
の大部分から得ることを可能にできる。すなわち狭トラ
ツク幅狭ギヤツプ長ヘッド製造の歩留りを大幅に向上で
きる。By reducing the strain induced in a warped substrate, previously the head with the desired azimuth angle could only be obtained from a part of the substrate, but now it is possible to greatly reduce the error in the azimuth angle over the entire substrate, and the head with the desired azimuth angle can be obtained from only a part of the substrate. It may be possible to obtain an azimuthal head from a large portion of the substrate. In other words, the yield of manufacturing heads with narrow track widths and gap lengths can be greatly improved.
第1図は従来の軟磁性膜に形成した溝斜面を動作ギャッ
プとする磁気ヘッドの製造工程図、第2図は非磁性金属
膜を介した場合の従来例を示す工程図、第3図は本発明
による磁気ヘッドの製造方法の一奥施例の工程図である
。
l:非磁性基板、 2:第1層軟磁性膜、3:#、 4
:動作ギャップ面、 5:ダイヤモンドバイト、 6
:ギャップスペーサ膜、7=第2層軟磁性膜、 8:保
護膜、 9:巻線窓穴、 lO:動作ギャップ、11:
すり傷、12=非磁性金属膜、 13:非磁性金属膜、
14:第1層軟磁性膜、 15:#ll、 16:動
作ギャップ面、17:第2層軟磁性膜、18:ダイヤモ
ンドバイト、19:動作ギャップ、20:保護膜。Figure 1 is a manufacturing process diagram of a conventional magnetic head in which the operating gap is a groove slope formed in a soft magnetic film, Figure 2 is a process diagram showing a conventional example in which a non-magnetic metal film is used, and Figure 3 is FIG. 4 is a process diagram of a further embodiment of the method for manufacturing a magnetic head according to the present invention. l: non-magnetic substrate, 2: first layer soft magnetic film, 3: #, 4
: Operating gap surface, 5: Diamond bite, 6
: gap spacer film, 7=second layer soft magnetic film, 8: protective film, 9: winding window hole, lO: operating gap, 11:
Scratches, 12 = non-magnetic metal film, 13: non-magnetic metal film,
14: First layer soft magnetic film, 15: #ll, 16: Operating gap surface, 17: Second layer soft magnetic film, 18: Diamond bite, 19: Operating gap, 20: Protective film.
Claims (1)
度バイトにより切削形成した溝斜面の一方を動作ギャッ
プ面とし、該加工を施した上記第一層軟磁性膜と第二層
軟磁性膜とで基板面に平行でない動作ギャップを形成す
る磁気ヘッドを製造する工程において、少なくとも上記
第一層軟磁性膜が格子模様を形成することを%徴とする
磁気ヘッドの製造方法。1 One of the slopes of the groove formed by cutting the first layer soft magnetic film adhered on a non-magnetic substrate with a high-hardness cutting tool is used as the operating gap surface, and the first layer soft magnetic film subjected to the processing and the second layer soft magnetic film are A method for manufacturing a magnetic head, wherein at least the first layer soft magnetic film forms a lattice pattern in the step of manufacturing a magnetic head forming an operating gap that is not parallel to a substrate surface with a magnetic film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6239882A JPS58179924A (en) | 1982-04-16 | 1982-04-16 | Production of magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6239882A JPS58179924A (en) | 1982-04-16 | 1982-04-16 | Production of magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58179924A true JPS58179924A (en) | 1983-10-21 |
Family
ID=13198986
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6239882A Pending JPS58179924A (en) | 1982-04-16 | 1982-04-16 | Production of magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58179924A (en) |
-
1982
- 1982-04-16 JP JP6239882A patent/JPS58179924A/en active Pending
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