JPH0512616A - Production of magnetic head - Google Patents

Abstract

PURPOSE:To more drastically reduce the time for forming and working laminated soft magnetic thin films as compared with the forming and working of these films by dry etching since the forming and forming of the laminated soft magnetic thin films are executed by dicing using a blade. CONSTITUTION:Grooves 2 are formed on a substrate 1 consisting of a nonmagnetic material and the laminated soft magnetic thin films 5 are formed along the side walls 3a of these grooves 2; thereafter, the laminated soft magnetic thin films 5 are ground by the dicing using the blade 6 so as to reduce the thickness of the thin films toward the peak parts from the neighborhood of the peak parts of the side walls 2a.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a magnetic head having a soft magnetic thin film provided on a substrate made of a non-magnetic material, which is a thin film laminated head.

[0002]

2. Description of the Related Art Conventionally, high coercive force media such as metal tapes have become mainstream as the density of magnetic recording media has increased, so that the material of the magnetic core used in the magnetic head has a high saturation magnetic flux density. What you have is required. Therefore, for example, as shown in FIG. 10, a soft magnetic thin film 21 made of FeAlSi alloy having a high saturation magnetic flux density is used as a magnetic core.
There is known a thin film laminated magnetic head chip 20 in which is provided on a substrate 22 made of a non-magnetic material.

In recent years, the track width has become narrower to accommodate long-time recording, but in the magnetic head chip 20 as described above, the thickness of the soft magnetic thin film 21 is set to correspond to the track width. If the thickness is reduced, the magnetic cross-sectional area of the magnetic core is reduced, the magnetic resistance is increased, and the recording / reproducing, particularly the reproducing efficiency is deteriorated.

Therefore, in order to avoid the above problem, FIG.
As shown in FIG. 1, the soft magnetic thin film 21 in the vicinity of the gap 23 is formed thin, that is, narrowed down to correspond to a narrow track width, while increasing the thickness of the soft magnetic thin film 21 other than in the vicinity of the gap 23. A magnetic head chip 20 having a reduced magnetic resistance has been proposed.

A method of manufacturing the above magnetic head chip 20 will be described below. First, as shown in FIG. 12, a substantially rectangular parallelepiped substrate 22 made of a non-magnetic material such as crystallized glass is continuously formed with a groove 24 having a substantially V-shaped cross section by dicing, and then shown in FIG. Thus, the soft magnetic thin film 21 and the insulating layer 25 made of a non-magnetic material such as SiO ₂ are provided along one side wall 24a of each of the grooves 24 ...
The soft magnetic laminated thin film 26 having a predetermined thickness is formed by alternately laminating a predetermined number of layers by vacuum vapor deposition. The laminated structure of the soft magnetic laminated thin film 26 will be simplified and illustrated below.

Next, as shown in FIG. 14, in order to remove the soft magnetic laminated thin film 26 from the vicinity of the apex of the side wall 24a to the apex by a predetermined thickness by dry etching such as ion milling, the substrate 22 is irradiated in the ion incident direction. Lean against
Dry etching is applied to a desired soft magnetic laminated thin film portion 26 where the ions hit. At this time, how to tilt the substrate 22 is
Ions hit the vicinity of the peaks of the peaks 22a on the soft magnetic laminated thin film 26 by the peaks 22a formed between the grooves 24,
Try to create a shadow that does not hit the ions on other parts.

Thereafter, as shown in FIG. 15, a substrate 22 is produced in which the thickness of the track width thin film 26a, which is the soft magnetic laminated thin film 26 portion thinned by dry etching, is set to a thickness corresponding to the track width. Subsequently, as shown in FIG. 16, in order to prevent an undesired reaction between the soft magnetic laminated thin film 26 and a low melting point glass described later, a reaction preventive film such as SiO ₂ is formed, and further, the reaction preventive film is formed. On top of that, a composite film 27 is formed by forming an active metal film of chromium or the like by a sputtering method or the like in order to improve the wetting with the low melting point glass.

After the above steps, as shown in FIG. 17, after filling the groove 24 with the low melting point glass 28, as shown in FIG. 18, it is lowered to the plane connecting the ridge lines of the respective mountain portions 22a. The one-sided substrate block 3 is formed by grinding the surface of the melting point glass 28 and forming grooves 29, 29 for coil winding on the ground surface and the opposite surface thereof, respectively, as shown in FIG.
0, and then a pair of one-sided substrate blocks 30.
0s are bonded to each other with a non-magnetic gap material (not shown) sandwiched therebetween and then cut into a predetermined width to obtain a magnetic head chip 20 as shown in FIG.

As described above, in the above magnetic head chip 20, in order to accurately cope with a narrow track width, the thickness of the soft magnetic laminated thin film 26 in the gap 23 and in the vicinity thereof is reduced by dry etching, while the thickness of the magnetic head is reduced. In order to significantly improve recording / playback, especially playback efficiency,
The magnetic resistance is reduced by increasing the thickness of the soft magnetic laminated thin film 26 portion which is the magnetic core portion other than the gap 23 and the vicinity thereof to manufacture a magnetic head having a narrow track width and high reproducing efficiency. .

[0010]

However, in the above method, since the removal rate of the soft magnetic laminated thin film 26 by dry etching such as ion milling is several hundred Å / min, the required film thickness (narrowing amount) can be obtained. It takes a very long time to remove the soft magnetic laminated thin film 26, which causes a problem that productivity of the magnetic head is poor.

[0011]

In order to solve the above-mentioned problems, the method of manufacturing a magnetic head according to the present invention forms a groove in a substrate made of a non-magnetic material such as crystallized glass and the side wall of the groove. Along the way, in a method of manufacturing a magnetic head formed by forming a soft magnetic thin film made of, for example, an FeAlSi alloy, the soft magnetic thin film is diced by a blade so that the thickness thereof decreases from near the apex of the side wall toward the apex. It is characterized by being ground by processing.

[0012]

According to the above method, since the grinding process for thinning the thickness of the soft magnetic thin film from the vicinity of the apex of the side wall toward the apex is performed by the dicing process using a blade, In addition, compared with the forming process of the soft magnetic thin film by dry etching such as ion milling, the forming process time can be significantly shortened.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The following will describe one embodiment of the present invention with reference to FIGS. First, as shown in FIG. 2, a dicing process (grinding speed) using a blade having a substantially V-shaped cross-section with a pitch dimension A on the surface of a substantially rectangular parallelepiped substrate 1 made of a non-magnetic material such as crystallized glass. , Several mm / sec) to form the grooves 2 having a substantially V-shaped cross section in parallel with each other. At this time, the grooves 2 are formed substantially symmetrically with respect to a normal line extending upward from the bottom of the groove 2 in the substrate 1.

After that, as shown in FIG. 3, a soft magnetic thin film 3 of FeAlSi alloy or the like is formed along one side wall 2a of the groove 2 by a vacuum deposition method or a sputtering method. continue,
A non-magnetic thin film 4 made of a non-magnetic material such as SiO _{2 is} formed on the soft magnetic thin film 3 by a vacuum deposition method or the like, and the soft magnetic thin film 3 is formed thereon by the same method as described above. By alternately laminating a predetermined number of films, a soft magnetic laminated thin film 5 having a predetermined thickness is formed. In the figure, the laminated state of the soft magnetic laminated thin film 5 is shown in a simplified manner.

Next, as shown in FIG. 1, adjacent grooves 2
The soft magnetic laminated thin film 5 is used with a blade 6 having a V-shaped cross section so that the thickness of the soft magnetic laminated thin film 5 decreases from the vicinity of the apex of the mountain-shaped portion 1a formed between the two toward the apex. Grinding with the same dicing process (grinding speed, several mm / sec). At this time, the thickness of the soft magnetic laminated thin film 5 on the apex side of the mountain-shaped portion 1a is a thickness corresponding to the track width.

In the dicing process, the normal line from the bottom of the groove 2 and one side wall 2a as an index showing the shape of the groove 2 are used.
The blade 6 having a cutting edge angle C equal to or greater than the angle B with respect to the angle B
By aligning one of the blade edge wall surfaces 6a of the blade edge with the normal line, the soft magnetic laminated thin film 5 can be precisely ground.

Subsequently, as shown in FIG. 4, in order to prevent an undesired reaction between the soft magnetic laminated thin film 5 and the low melting point glass described later, a reaction preventive film such as SiO ₂ is formed on the soft magnetic laminated thin film 5. Then, on the reaction preventive film, an active metal film such as chromium is formed by a sputtering method or the like in order to improve the wetting with the low melting point glass, and the reaction preventive film and the active metal film are formed. The laminated composite film 7 is formed.

Thereafter, as shown in FIG. 5, the above-mentioned low-melting glass 8 is filled on each groove 2 ... Then, as shown in FIG. Polishing is performed to a flat surface that connects the ridge lines of each mountain portion 1a. At this time, the soft magnetic laminated thin film 5 is exposed at the gap surface 9 which is the polished surface so that the soft magnetic laminated thin film 5 has almost the track width.

After this, as shown in FIG. 7, the gap surface 9
A gap space material (not shown) made of a non-magnetic material such as SiO _{2 is} formed on the substrate 1 by a sputtering method or the like so as to have a predetermined gap length. The winding grooves 10 and 10 are respectively formed to manufacture the one-sided substrate block 11.

Next, as shown in FIG. 8, the pair of one-sided substrate blocks 11 and 11 are positioned so that the gap surfaces 9 are opposed to each other and the soft magnetic laminated thin films 5 are linear to form the gap 12. The substrates are bonded together, fixed under pressure, and bonded by the low melting point glass 8 ... Then, the bonded substrate block 13 is cut out at a predetermined pitch D to obtain a magnetic head chip 14 as shown in FIG.

Although not shown below, the magnetic head chip 14 obtained as described above is adhesively fixed to a base plate,
The magnetic winding is completed by polishing the coil winding and tape sliding surface.

As described above, in the method of the above-described embodiment, the track width of the obtained magnetic head has a thickness of the soft magnetic laminated thin film 5 which becomes the gap 12 by the grinding process of the soft magnetic laminated thin film 5 by the dicing process. The width of the soft magnetic laminated thin film 5 as a magnetic core formed by a vacuum deposition method or the like is sufficient. The magnetic cross section can be secured and the thickness can be set to a predetermined value with a sufficiently small magnetic resistance.

By the way, conventionally, dry etching such as ion milling is used for forming the soft magnetic laminated thin film, and the removal rate of the soft magnetic laminated thin film is several hundred Å / mi.
Since it is n, it takes a very long time to remove the soft magnetic laminated thin film having a required film thickness (amount of narrowing down), and the productivity of magnetic head manufacturing is poor.

However, in the above method, the soft magnetic laminated thin film 5 is formed by thinning the thickness of the soft magnetic laminated thin film 5 from the vicinity of the apex of the side wall 2a toward the apex by grinding by dicing using a blade. Since it is performed, the forming and processing time of the soft magnetic laminated thin film can be significantly shortened as compared with the conventional forming and processing of the soft magnetic laminated thin film by dry etching such as ion milling.

Therefore, a narrow track width can be accommodated,
Moreover, a magnetic head having excellent characteristics of realizing low magnetic resistance and high recording / reproducing efficiency, particularly high reproducing efficiency,
The magnetic head can be manufactured in a shorter time than before, and the productivity of manufacturing the magnetic head can be improved.

[0026]

As described above, according to the method of manufacturing a magnetic head of the present invention, in order to cope with a narrow track width and to manufacture a magnetic head having a small magnetic resistance, the magnetic head in the vicinity of a gap in a soft magnetic thin film to be a magnetic core is manufactured. This is a method of performing a forming process for reducing the thickness by a dicing process using a blade.

Therefore, conventionally, the forming process for reducing the thickness of the soft magnetic thin film is performed by dry etching such as ion milling. Since the dry etching speed is slow, the forming process takes a long time and the magnetic head. However, in the above method, since the forming process of the soft magnetic thin film is performed by grinding by dicing process using a blade, the forming process time can be significantly shortened compared to the conventional method. You can

As a result, it is possible to efficiently manufacture a magnetic head which can cope with a narrow track width for a long time mode or the like and which has an increased magnetic cross-sectional area to improve recording / reproducing efficiency, particularly reproducing efficiency, in a short time. Thus, it is possible to improve the productivity in manufacturing the magnetic head.

[Brief description of drawings]

FIG. 1 is a front view of an essential part of a substrate on which a soft magnetic laminated thin film is formed by a dicing process in a method for manufacturing a magnetic head of the present invention.

FIG. 2 is a perspective view of a substrate in which a groove is formed in the above manufacturing method.

FIG. 3 is a front view of an essential part of a substrate in which a soft magnetic laminated thin film is formed in the groove.

FIG. 4 is a front view of an essential part of a substrate in which a composite layer is formed on the soft magnetic laminated thin film.

FIG. 5 is a front view of a main part of the substrate in which a groove is filled with a low melting point glass.

FIG. 6 is a front view of a main part of a substrate in which the surface of the low melting point glass is ground.

FIG. 7 is a perspective view of a one-sided substrate block in which a coil winding groove is formed on the substrate.

FIG. 8 is a perspective view of a substrate block obtained by joining a pair of the one-sided substrate blocks.

FIG. 9 is a perspective view of a magnetic head chip obtained by cutting the substrate block.

FIG. 10 is a perspective view of a conventional magnetic head chip.

FIG. 11 is a perspective view of another conventional magnetic head chip.

FIG. 12 is a method for manufacturing the above magnetic head chip,
It is a perspective view of the board | substrate with which the groove was formed.

FIG. 13 is a front view of an essential part of the substrate in which a soft magnetic laminated thin film is formed in a groove.

FIG. 14 is a front view of the substrate in which the soft magnetic laminated thin film is dry-etched.

FIG. 15 is a front view of a main part of the substrate, in which a part of the soft magnetic laminated thin film is dry-etched.

FIG. 16 is a front view of relevant parts of the substrate, in which a composite layer is formed on a laminated alloy thin film.

FIG. 17 is a front view of a main portion of the substrate filled with a low melting point glass.

FIG. 18 is a front view of a main part of the substrate in which the surface of the low melting point glass is polished.

FIG. 19 is a perspective view of a one-sided substrate block formed by forming coil winding grooves and the like on the substrate.

[Explanation of symbols]

 1 Substrate 2 Groove 2a Side Wall 5 Soft Magnetic Laminated Thin Film (Soft Magnetic Thin Film) 6 Blade

Claims (1)

Claims: 1. A groove is formed on a substrate made of a non-magnetic material,
In a method of manufacturing a magnetic head in which a soft magnetic thin film is formed along the side wall of this groove, a dicing is performed using a blade so that the thickness of the soft magnetic thin film becomes thinner from near the apex of the side wall toward the apex thereof. A method of manufacturing a magnetic head, characterized by being ground by processing.