JPH0589414A - Magnetic head and production thereof - Google Patents

Magnetic head and production thereof

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Publication number
JPH0589414A
JPH0589414A JP24746991A JP24746991A JPH0589414A JP H0589414 A JPH0589414 A JP H0589414A JP 24746991 A JP24746991 A JP 24746991A JP 24746991 A JP24746991 A JP 24746991A JP H0589414 A JPH0589414 A JP H0589414A
Authority
JP
Japan
Prior art keywords
thin film
magnetic material
soft magnetic
magnetic head
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24746991A
Other languages
Japanese (ja)
Other versions
JP2648057B2 (en
Inventor
Toshiyuki Fujine
俊之 藤根
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP3247469A priority Critical patent/JP2648057B2/en
Publication of JPH0589414A publication Critical patent/JPH0589414A/en
Application granted granted Critical
Publication of JP2648057B2 publication Critical patent/JP2648057B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Magnetic Heads (AREA)

Abstract

PURPOSE:To obtain the magnetic head having high reproducing efficiency by forming the soft magnetic material thin film on the rear gap side opposite from the tape-sliding surface of the magnetic head to the thickness larger than the thickness of the thin film on the tape-sliding surface side. CONSTITUTION:Grooves are formed on substrates 1 consisting of a nonmagnetic material, such as crystallized glass or ceramics and the soft magnetic material thin films 2, such as FeAlSi alloy thin films, are provided by a vapor deposition method along the side walls of the grooves. The soft magnetic material thin film 2 on the rear gap side opposite from the tape-sliding surface of the magnetic head is formed to the thickness larger than the thickness of the soft magnetic material thin film 2 on the tape-sliding surface side and, therefore, the magnetic resistance over the entire part of the head core is lowered and the reproduction efficiency is improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、非磁性材料からなる基
板上にFeAlSi合金薄膜等の軟磁性材料薄膜を設け
た薄膜積層ヘッドとして構成される磁気ヘッド及びその
製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head constructed as a thin film laminated head in which a soft magnetic material thin film such as a FeAlSi alloy thin film is provided on a substrate made of a non-magnetic material, and a method of manufacturing the same.

【0002】[0002]

【従来の技術】近年、磁気記録媒体の高密度化にともな
いメタルテープのような高保磁力媒体が主流となって来
ている。このため磁気ヘッドに使用されるコア材料も高
い飽和磁束密度を有するものが要求されている。そこ
で、例えば図12に示すように高い飽和磁束密度を有す
るFeAlSi合金薄膜等による軟磁性材料薄膜15,
15を非磁性材料からなる基板16,16上に直接設け
た構成の薄膜積層磁気ヘッドが提案されている。17,
17は磁気ヘッドコア接合用のガラスである。図13図
は参考までに図12に示した従来の磁気ヘッドの軟磁性
材料薄膜15,15の部分を抜き出して描いたものであ
る。
2. Description of the Related Art In recent years, high coercive force media such as metal tapes have become mainstream as the density of magnetic recording media has increased. Therefore, the core material used for the magnetic head is required to have a high saturation magnetic flux density. Therefore, for example, as shown in FIG. 12, a soft magnetic material thin film 15, such as a FeAlSi alloy thin film having a high saturation magnetic flux density,
A thin film laminated magnetic head having a structure in which 15 is directly provided on substrates 16 made of a non-magnetic material has been proposed. 17,
Reference numeral 17 is glass for joining the magnetic head core. FIG. 13 shows, for reference, the soft magnetic material thin films 15, 15 of the conventional magnetic head shown in FIG.

【0003】次に上記のような従来の磁気ヘッドの製造
方法について以下に説明する。図14図及び図15に示
すように、例えば結晶化ガラス等の非磁性材料からなる
基板16に、ダイシング加工によって断面略V字状の連
続した溝18,18‥‥を形成し、この溝18の側壁上
に真空蒸着法によりFeAlSi合金薄膜等の軟磁性材
料薄膜15を形成する。その後、所定の層数だけSiO
2 等の非磁性材料薄膜19とFeAlSi合金薄膜等の
軟磁性材料薄膜15とを交互に積層蒸着して、所定の厚
さの軟磁性積層薄膜を形成する。尚、図面ではこの積層
薄膜は簡略化して3層構造で示している。
Next, a conventional method for manufacturing the above magnetic head will be described below. As shown in FIGS. 14 and 15, continuous grooves 18, 18 having a substantially V-shaped cross section are formed on a substrate 16 made of a non-magnetic material such as crystallized glass by a dicing process. A soft magnetic material thin film 15 such as a FeAlSi alloy thin film is formed on the side wall of the substrate by a vacuum evaporation method. After that, a predetermined number of layers of SiO
Nonmagnetic material thin films 19 such as 2 and soft magnetic material thin films 15 such as FeAlSi alloy thin films are alternately laminated and deposited to form a soft magnetic laminated thin film having a predetermined thickness. In the drawings, this laminated thin film is simplified and shown as a three-layer structure.

【0004】次に、図16に示すように各溝18,18
‥‥上に低融点ガラス17を充填した後に、図17に示
すように各山頂部の稜線を結んだ平面まで低融点ガラス
17の表面研削を行うと共に、コイル巻線用溝20、2
1の掘削加工を行って図18に示すように、片側コアブ
ロックを形成し、次いで図19に示すように片側コアブ
ロック同士を非磁性ギャップ材を挟んで相互に接合した
後、切断位置22,22に沿って所定の幅Gを以って切
断することで図12に示すような磁気ヘッドチップを得
ている。
Next, as shown in FIG. 16, each groove 18, 18
After the low-melting glass 17 is filled on the upper surface, the surface of the low-melting glass 17 is ground to the plane connecting the ridgelines of the peaks as shown in FIG.
1 is performed to form one-sided core blocks as shown in FIG. 18, and then the one-sided core blocks are joined to each other with a non-magnetic gap material interposed therebetween as shown in FIG. A magnetic head chip as shown in FIG. 12 is obtained by cutting along 22 with a predetermined width G.

【0005】[0005]

【発明が解決しようとする課題】上記のような従来の方
法で得られる磁気ヘッドにおいては、軟磁性材料薄膜の
透磁率が1MHzにおいては約2000であるが、透磁
率が3000〜5000ないと高い再生効率が得られな
い。この軟磁性材料薄膜の透磁率を3000〜5000
にするのは非常に困難であり、結局、上記の従来方法で
得られる磁気ヘッドにおいては再生効率が低いという問
題点があった。
In the magnetic head obtained by the conventional method as described above, the magnetic permeability of the soft magnetic material thin film is about 2000 at 1 MHz, but the magnetic permeability is as high as 3000 to 5000. Regeneration efficiency cannot be obtained. The magnetic permeability of this soft magnetic material thin film is 3000 to 5000.
It is very difficult to achieve this, and the magnetic head obtained by the above-mentioned conventional method has a problem that the reproducing efficiency is low.

【0006】[0006]

【課題を解決するための手段】本発明の磁気ヘッドは、
結晶化ガラス、セラミックス等の非磁性材料からなる基
板に溝を形成し、この溝の側壁に沿ってFeAlSi合
金薄膜等の軟磁性材料薄膜を蒸着法により設けてなる磁
気ヘッドおいて、磁気ヘッドコアのテープ摺動面とは反
対の後部ギャップ側の軟磁性材料薄膜の厚みがテープ摺
動面側の軟磁性材料薄膜の厚みよりも厚く形成したもの
である。
The magnetic head of the present invention comprises:
In a magnetic head in which a groove is formed on a substrate made of a non-magnetic material such as crystallized glass or ceramics and a soft magnetic material thin film such as a FeAlSi alloy thin film is provided along the side wall of the groove by a vapor deposition method, The thickness of the soft magnetic material thin film on the rear gap side opposite to the tape sliding surface is made thicker than the thickness of the soft magnetic material thin film on the tape sliding surface side.

【0007】さらにまた本発明の磁気ヘッドの製造方法
では、結晶化ガラス、セラミックス等からなる基板に所
定の溝を形成した後、この溝の側壁に沿ってFeAlS
i合金薄膜等の軟磁性材料薄膜を蒸着法により形成し、
次いで前記溝と直角方向にマスクをし、再びこの溝の側
壁に沿ってFeAlSi合金薄膜等の軟磁性材料を蒸着
することにより、テープ摺動面側の軟磁性材料薄膜の膜
厚の薄い部分と、テープ摺動面とは反対の後部ギャップ
側の軟磁性材料薄膜の膜厚の厚い部分を得ることを特徴
とするものである。
Furthermore, according to the method of manufacturing a magnetic head of the present invention, after a predetermined groove is formed on a substrate made of crystallized glass, ceramics or the like, FeAlS is formed along the side wall of the groove.
A soft magnetic material thin film such as an i alloy thin film is formed by a vapor deposition method,
Then, a mask is formed in the direction perpendicular to the groove, and a soft magnetic material such as a FeAlSi alloy thin film is vapor-deposited again along the side wall of the groove to form a thin portion of the soft magnetic material thin film on the tape sliding surface side. , A thick portion of the soft magnetic material thin film on the rear gap side opposite to the tape sliding surface is obtained.

【0008】[0008]

【作用】上記の方法により作製される磁気ヘッドによれ
ば、磁気ヘッドコア後部の軟磁性材料薄膜の厚みが従来
の磁気ヘッドに比べ厚くなるため(コア断面積が大きく
なるため)、磁気ヘッドコアの全体の磁気抵抗が低下し
再生効率が向上する。
According to the magnetic head manufactured by the above method, the thickness of the soft magnetic material thin film at the rear part of the magnetic head core is thicker than that of the conventional magnetic head (because the core cross-sectional area is large), so that the entire magnetic head core is formed. Magnetic reluctance is reduced and reproduction efficiency is improved.

【0009】[0009]

【実施例】以下本発明の磁気ヘッドの1実施例を図1及
び図2に基づいて説明する。まず、図1に示す磁気ヘッ
ドでは、既述した従来例の場合と同様に、結晶化ガラ
ス、セラミックス等の非磁性材料からなる基板1に溝を
形成し、この溝の側壁に沿ってFeAlSi合金薄膜等
の軟磁性材料薄膜2,2‥‥を蒸着法により設け、さら
にこの溝に磁気コア接合用として低融点ガラス3を充填
してなる構成となっている。特にここで磁気ヘッドの軟
磁性材料薄膜2,2‥‥の部分は、図2に取り出して示
すように、磁気ヘッドのテープ摺動面近傍の膜厚は所定
のトラック幅を得るのに必要な膜厚Aとなっている。一
方、磁気ヘッドの後部は、図2に示すように膜厚Aより
も厚い膜厚Bとなっている。特にこの膜厚AとBの比B
/Aが2以上にした場合、磁気ヘッドの再生効率を上げ
るという点で極めて有効である。なお図面に示す実施例
では簡略化のためB/Aは2となっている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the magnetic head of the present invention will be described below with reference to FIGS. First, in the magnetic head shown in FIG. 1, a groove is formed in the substrate 1 made of a non-magnetic material such as crystallized glass or ceramics, and the FeAlSi alloy is formed along the side wall of the groove, as in the case of the conventional example described above. .. are provided by a vapor deposition method, and the groove is filled with a low melting point glass 3 for bonding a magnetic core. Particularly, in the soft magnetic material thin films 2, 2 ... Of the magnetic head, as shown in FIG. 2, the film thickness in the vicinity of the tape sliding surface of the magnetic head is necessary for obtaining a predetermined track width. The film thickness is A. On the other hand, the thickness of the rear part of the magnetic head is thicker than the thickness A as shown in FIG. Especially the ratio B of this film thickness A and B
When / A is 2 or more, it is extremely effective in improving the reproducing efficiency of the magnetic head. In the embodiment shown in the drawings, B / A is 2 for simplification.

【0010】次に、本発明の磁気ヘッドの製造方法の1
実施例について説明する。まず、図3に示すように、例
えば結晶化ガラス等の非磁性材料からなる基板1の表面
に所定のピッチ寸法Eで、ダイシング加工により断面略
V字状の溝4,4‥‥を連続して形成する。その後、図
4に示すように、各溝4,4‥‥の一方の側壁面5,5
‥‥に真空蒸着法等によりFeAlSi合金薄膜等の軟
磁性材料薄膜2,2‥‥とSiO2 等の非磁性薄膜6,
6‥‥を所定の層数(所定のトラック幅を得るのに必要
な膜厚)だけ交互に積層蒸着して積層薄膜を形成する。
なお、図面ではこの積層薄膜は簡略化して3層構造で示
している。
Next, a method 1 for manufacturing a magnetic head of the present invention will be described.
Examples will be described. First, as shown in FIG. 3, grooves 4 having a substantially V-shaped cross section are continuously formed on a surface of a substrate 1 made of a non-magnetic material such as crystallized glass at a predetermined pitch dimension E by a dicing process. To form. After that, as shown in FIG. 4, one side wall surface 5, 5 of each groove 4, 4 ...
... and soft magnetic material thin films 2 and 2 such as FeAlSi alloy thin films and non-magnetic thin films 6 such as SiO 2 by vacuum vapor deposition.
.. are alternately laminated and vapor-deposited by a prescribed number of layers (thickness required to obtain a prescribed track width) to form a laminated thin film.
In the drawings, this laminated thin film is simplified and shown as a three-layer structure.

【0011】次に、図5に示すように前記溝5,5‥‥
と直角方向にマスク7を溝5,5‥‥の一部を覆うよう
に載置し、再び各溝4,4‥‥の側壁面5,5‥‥に真
空蒸着法等によりFeAlSi合金薄膜等の軟磁性材料
薄膜2,2‥‥とSiO2 等の非磁性薄膜6,6‥‥を
所定の層数だけ交互に積層蒸着する。図6はマスク7で
覆われなかった部分の拡大図、図7はマスク7で覆われ
た部分の拡大図を示すす。この際、最初に蒸着するFe
AlSi合金積層薄膜の膜厚Cと後に蒸着したFeAl
Si合金積層薄膜の膜厚Dの比D/Cが2以上になるよ
うに膜厚Dを設定した場合、磁気ヘの再生効率を上げる
という点で極めて有効となる。
Next, as shown in FIG. 5, the grooves 5, 5 ...
A mask 7 is placed at a right angle to the grooves 5 and 5 so as to cover a part thereof, and again on the side wall surfaces 5 and 5 of the grooves 4 and 4 by a vacuum vapor deposition method or the like. alternately stacked depositing of the soft magnetic material thin film 2, 2 ‥‥ and SiO 2 nonmagnetic thin 6,6 ‥‥ such predetermined number of layers only. FIG. 6 is an enlarged view of a portion not covered with the mask 7, and FIG. 7 is an enlarged view of a portion covered with the mask 7. At this time, Fe to be vapor-deposited first
Film thickness C of AlSi alloy laminated thin film and FeAl deposited later
When the film thickness D is set so that the ratio D / C of the film thickness D of the Si alloy laminated thin film is 2 or more, it is extremely effective in improving the reproduction efficiency to the magnetic field.

【0012】次に、図8に示すように、基板1の断面略
V字状の溝部に低融点ガラス8を充填する。その後、図
9に示すように各山頂部の稜線を結んだ平面まで低融点
ガラス17の表面研削を行い、前記低融点ガラス8の充
填部の表面を前記基板1の底面と平行になるように平面
状に研磨してコアブロックを作製する。次に、図10に
示すように前記コアブロックにコイル巻線用の溝8,9
を掘削加工する。この際、FeAlSi合金積層薄膜の
形成面側のコイル巻線用溝8の先端10が、マスク7に
より覆われた箇所の積層薄膜部、すなわち厚さCを保っ
ている領域に来るよう配慮する必要がある。さらに前記
V字状溝4,4‥‥を形成した面(ギャップ面11)側
に所定のギャップとなるようSiO2 等の非磁性材料1
2をスパッタリング法等により形成する。
Next, as shown in FIG. 8, the low melting point glass 8 is filled in the groove portion of the substrate 1 having a substantially V-shaped cross section. After that, as shown in FIG. 9, the surface of the low-melting glass 17 is ground to a plane connecting the ridges of the respective peaks so that the surface of the filling portion of the low-melting glass 8 becomes parallel to the bottom surface of the substrate 1. The core block is manufactured by polishing it into a flat surface. Next, as shown in FIG. 10, coil winding grooves 8 and 9 are formed in the core block.
Excavate. At this time, it is necessary to make sure that the tip 10 of the coil winding groove 8 on the side where the FeAlSi alloy laminated thin film is formed is located in the laminated thin film portion covered with the mask 7, that is, the region where the thickness C is maintained. There is. Further, a non-magnetic material 1 such as SiO 2 is formed so that a predetermined gap is formed on the surface (gap surface 11) side on which the V-shaped grooves 4, 4 ... Are formed.
2 is formed by a sputtering method or the like.

【0013】次に、上記のように形成された一対のコア
ブロックを、図11に示すようにギャップ面を互いに対
向するように位置合わせした後、加圧固定を行って接合
し、一対のコアブロック13を一体的に形成する。次
に、こうして接合されたコアブロック13から磁気ヘッ
ドチップを切り出す。これは図11に示すように所望の
厚みEを以った切断位置14,14に沿ってコアブロッ
ク13を切断し、こうして図1に示すような磁気ヘッド
チップを得る。
Next, the pair of core blocks formed as described above are aligned so that the gap surfaces face each other as shown in FIG. The block 13 is integrally formed. Next, the magnetic head chip is cut out from the core block 13 thus joined. As shown in FIG. 11, this cuts the core block 13 along the cutting positions 14, 14 with the desired thickness E, thus obtaining the magnetic head chip as shown in FIG.

【0014】上述のようにして得られた磁気ヘッドチッ
プを用い、ベース板への接着固定、コイル巻き線、テー
プ研磨等を施し、磁気ヘッドを完成する。
Using the magnetic head chip obtained as described above, adhesive fixing to a base plate, coil winding, tape polishing, etc. are performed to complete the magnetic head.

【0015】[0015]

【効果】本発明の磁気ヘッドは、上記のように、磁気ヘ
ッドコアのテープ摺動面とは反対の後部ギャップ側の軟
磁性材料薄膜の厚みがテープ摺動面側の軟磁性材料薄膜
の厚みよりも厚く形成したものであり、磁気ヘッドコア
後部の軟磁性材料薄膜の厚みが従来の磁気ヘッドに比べ
厚くなるため(コア断面積が大きくなるため)、磁気ヘッ
ドコアの全体の磁気抵抗が低下し再生効率の高い磁気ヘ
ッドが得られる。また本発明の磁気ヘッドの製造方法に
よれば、結晶化ガラス、セラミックス等からなる基板に
所定の溝を形成した後、この溝の側壁に沿ってFeAl
Si合金薄膜等の軟磁性材料薄膜を蒸着法により形成
し、次いで前記溝と直角方向にマスクを施し、再びこの
溝の側壁に沿ってFeAlSi合金薄膜等の軟磁性材料
を蒸着するという比較的簡易な方法で、上述したような
良好な特性を有する磁気ヘッドを製造することができ、
量産性に適したものとなる。
As described above, in the magnetic head of the present invention, the thickness of the soft magnetic material thin film on the rear gap side opposite to the tape sliding surface of the magnetic head core is smaller than the thickness of the soft magnetic material thin film on the tape sliding surface side. Since the thickness of the soft magnetic material thin film behind the magnetic head core is thicker than that of the conventional magnetic head (because the core cross-sectional area is large), the magnetic resistance of the magnetic head core as a whole is reduced and the reproduction efficiency is reduced. A high magnetic head can be obtained. Further, according to the method of manufacturing a magnetic head of the present invention, after forming a predetermined groove on a substrate made of crystallized glass, ceramics or the like, FeAl is formed along the side wall of the groove.
A relatively simple method of forming a soft magnetic material thin film such as a Si alloy thin film by a vapor deposition method, applying a mask in a direction perpendicular to the groove, and again depositing a soft magnetic material such as a FeAlSi alloy thin film along the side wall of the groove. A magnetic head having good characteristics as described above,
It is suitable for mass production.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の磁気ヘッドの1実施例に係る磁気ヘッ
ドチップの斜視図である。
FIG. 1 is a perspective view of a magnetic head chip according to an embodiment of a magnetic head of the present invention.

【図2】同磁気ヘッドチップにおいて、軟磁性材料薄膜
の部分のみを抜き出して示した斜視図である。
FIG. 2 is a perspective view showing, in the magnetic head chip, only a soft magnetic material thin film portion.

【図3】本発明の製造方法により溝の形成された基板の
斜視図である。
FIG. 3 is a perspective view of a substrate having a groove formed by the manufacturing method of the present invention.

【図4】上記溝に軟磁性積層薄膜が形成された基板の要
部正面図である。
FIG. 4 is a front view of an essential part of a substrate in which a soft magnetic laminated thin film is formed in the groove.

【図5】本発明の製造方法において上記溝に軟磁性積層
薄膜が形成される状態を示す斜視図である。
FIG. 5 is a perspective view showing a state in which a soft magnetic laminated thin film is formed in the groove in the manufacturing method of the present invention.

【図6】上記溝に軟磁性積層薄膜が形成された基板の要
部正面図である。
FIG. 6 is a front view of an essential part of a substrate in which a soft magnetic laminated thin film is formed in the groove.

【図7】上記溝に軟磁性積層薄膜が形成された基板の要
部正面図である。
FIG. 7 is a front view of an essential part of a substrate in which a soft magnetic laminated thin film is formed in the groove.

【図8】上記溝に低融点ガラスが充填された上記基板の
要部正面図である。
FIG. 8 is a front view of the main part of the substrate in which the groove is filled with low melting point glass.

【図9】上記低融点ガラスの表面が研削された基板の要
部正面図である。
FIG. 9 is a front view of an essential part of a substrate in which the surface of the low melting point glass is ground.

【図10】本発明の製造方法により作製された片側コア
ブロックの斜視図である。
FIG. 10 is a perspective view of a one-sided core block manufactured by the manufacturing method of the present invention.

【図11】本発明の製造方法により作製された上記2つ
の片側コアブロックを接合した状態を示す斜視図であ
る。
FIG. 11 is a perspective view showing a state in which the two one-sided core blocks produced by the production method of the present invention are joined.

【図12】従来の磁気ヘッドチップの斜視図である。FIG. 12 is a perspective view of a conventional magnetic head chip.

【図13】上記従来の磁気ヘッドチップにおいて、軟磁
性材料薄膜の部分のみを抜き出して示した斜視図であ
る。
FIG. 13 is a perspective view showing only the soft magnetic material thin film portion of the conventional magnetic head chip.

【図14】上記従来の製造方法において、溝の形成され
た基板の斜視図である。
FIG. 14 is a perspective view of a substrate in which grooves are formed in the conventional manufacturing method.

【図15】上記溝に軟磁性積層薄膜が形成された基板の
要部正面図である。
FIG. 15 is a front view of an essential part of a substrate in which a soft magnetic laminated thin film is formed in the groove.

【図16】上記溝に低融点ガラスが充填された上記基板
の要部正面図である。
FIG. 16 is a front view of a main part of the substrate in which the groove is filled with a low melting point glass.

【図17】上記低融点ガラスの表面が研磨された上記基
板の要部正面図である。
FIG. 17 is a front view of the main part of the substrate where the surface of the low melting point glass is polished.

【図18】上記従来の製造方法により作製された片側コ
アブロックの斜視図である。
FIG. 18 is a perspective view of a one-sided core block manufactured by the conventional manufacturing method.

【図19】上記従来の製造方法により作製された2つの
片側コアブロックを接合した状態を示す斜視図である。
FIG. 19 is a perspective view showing a state in which two one-sided core blocks manufactured by the conventional manufacturing method are joined.

【符号の説明】[Explanation of symbols]

1 基板 2 軟磁性材料薄膜 3 低融点ガラス 4 溝 5 溝の側壁面 6 非磁性薄膜 7 マスク 8 コイル巻線用溝 9 コイル巻線用溝 DESCRIPTION OF SYMBOLS 1 Substrate 2 Soft magnetic material thin film 3 Low melting point glass 4 Groove 5 Groove side wall surface 6 Non-magnetic thin film 7 Mask 8 Coil winding groove 9 Coil winding groove

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】非磁性材料からなる基板に溝を形成し、こ
の溝の側壁に沿って軟磁性材料薄膜を蒸着法により設け
てなる磁気ヘッドおいて、磁気ヘッドコアのテープ摺動
面とは反対の後部ギャップ側の軟磁性材料薄膜の厚みが
テープ摺動面側の軟磁性材料薄膜の厚みよりも厚く形成
したことを特徴とする磁気ヘッド。
1. A magnetic head having grooves formed in a substrate made of a non-magnetic material, and a thin film of a soft magnetic material provided along the side walls of the grooves by an evaporation method, which is opposite to a tape sliding surface of a magnetic head core. A magnetic head characterized in that the thickness of the soft magnetic material thin film on the rear gap side is thicker than the thickness of the soft magnetic material thin film on the tape sliding surface side.
【請求項2】前記請求項2記載の磁気ヘッドにおいて、
磁気ヘッドコアのテープ摺動面とは反対の後部ギャップ
側の軟磁性材料薄膜の厚みがテープ摺動面側の軟磁性材
料薄膜の厚みよりも2倍以上厚く形成したことを特徴と
する磁気ヘッド。
2. The magnetic head according to claim 2, wherein:
A magnetic head, wherein the thickness of the soft magnetic material thin film on the rear gap side of the magnetic head core opposite to the tape sliding surface is twice or more than the thickness of the soft magnetic material thin film on the tape sliding surface side.
【請求項3】非磁性材料からなる基板に所定の溝を形成
した後、この溝の側壁に沿って軟磁性材料薄膜を蒸着法
により形成し、次いで前記溝と直角方向にマスクを施
し、再びこの溝の側壁に沿って軟磁性材料を蒸着するこ
とにより、テープ摺動面側の軟磁性材料薄膜の膜厚の薄
い部分と、テープ摺動面とは反対の後部ギャップ側の軟
磁性材料薄膜の膜厚の厚い部分とを得ることを特徴とす
る磁気ヘッドの製造方法。
3. After forming a predetermined groove on a substrate made of a non-magnetic material, a soft magnetic material thin film is formed along the side wall of this groove by a vapor deposition method, and then a mask is applied in a direction perpendicular to the groove, and again. By depositing the soft magnetic material along the side walls of the groove, the thin portion of the soft magnetic material thin film on the tape sliding surface side and the soft magnetic material thin film on the rear gap side opposite to the tape sliding surface are formed. And a portion having a large film thickness are obtained.
JP3247469A 1991-09-26 1991-09-26 Manufacturing method of magnetic head Expired - Lifetime JP2648057B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3247469A JP2648057B2 (en) 1991-09-26 1991-09-26 Manufacturing method of magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3247469A JP2648057B2 (en) 1991-09-26 1991-09-26 Manufacturing method of magnetic head

Publications (2)

Publication Number Publication Date
JPH0589414A true JPH0589414A (en) 1993-04-09
JP2648057B2 JP2648057B2 (en) 1997-08-27

Family

ID=17163918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3247469A Expired - Lifetime JP2648057B2 (en) 1991-09-26 1991-09-26 Manufacturing method of magnetic head

Country Status (1)

Country Link
JP (1) JP2648057B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0578234A2 (en) * 1992-07-08 1994-01-12 Sharp Kabushiki Kaisha Magnetic head and method of manufacturing the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61250806A (en) * 1985-04-30 1986-11-07 Hitachi Ltd Magnetic head and its manufacture
JPS63302406A (en) * 1987-05-30 1988-12-09 Sony Corp Magnetic head
JPH03144904A (en) * 1989-10-31 1991-06-20 Matsushita Electric Ind Co Ltd Manufacture of laminate type magnetic head

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61250806A (en) * 1985-04-30 1986-11-07 Hitachi Ltd Magnetic head and its manufacture
JPS63302406A (en) * 1987-05-30 1988-12-09 Sony Corp Magnetic head
JPH03144904A (en) * 1989-10-31 1991-06-20 Matsushita Electric Ind Co Ltd Manufacture of laminate type magnetic head

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0578234A2 (en) * 1992-07-08 1994-01-12 Sharp Kabushiki Kaisha Magnetic head and method of manufacturing the same
EP0578234A3 (en) * 1992-07-08 1994-02-16 Sharp Kk
US5691866A (en) * 1992-07-08 1997-11-25 Sharp Kabushiki Kaisha Magnetic head and method of manufacturing the same

Also Published As

Publication number Publication date
JP2648057B2 (en) 1997-08-27

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