JPS58178358A - 感光性材料塗布装置 - Google Patents

感光性材料塗布装置

Info

Publication number
JPS58178358A
JPS58178358A JP6302282A JP6302282A JPS58178358A JP S58178358 A JPS58178358 A JP S58178358A JP 6302282 A JP6302282 A JP 6302282A JP 6302282 A JP6302282 A JP 6302282A JP S58178358 A JPS58178358 A JP S58178358A
Authority
JP
Japan
Prior art keywords
photosensitive material
bottom plate
substrate
side wall
positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6302282A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0314171B2 (enrdf_load_stackoverflow
Inventor
Muneo Hatta
八田　宗生
Hayaaki Fukumoto
福本　隼明
Masahiro Yoneda
昌弘 米田
Kazuo Mizuguchi
一男 水口
Wataru Wakamiya
若宮　亙
Junichi Mihashi
三橋　順一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP6302282A priority Critical patent/JPS58178358A/ja
Publication of JPS58178358A publication Critical patent/JPS58178358A/ja
Publication of JPH0314171B2 publication Critical patent/JPH0314171B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6302282A 1982-04-13 1982-04-13 感光性材料塗布装置 Granted JPS58178358A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6302282A JPS58178358A (ja) 1982-04-13 1982-04-13 感光性材料塗布装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6302282A JPS58178358A (ja) 1982-04-13 1982-04-13 感光性材料塗布装置

Publications (2)

Publication Number Publication Date
JPS58178358A true JPS58178358A (ja) 1983-10-19
JPH0314171B2 JPH0314171B2 (enrdf_load_stackoverflow) 1991-02-26

Family

ID=13217275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6302282A Granted JPS58178358A (ja) 1982-04-13 1982-04-13 感光性材料塗布装置

Country Status (1)

Country Link
JP (1) JPS58178358A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6096822U (ja) * 1983-12-09 1985-07-02 沖電気工業株式会社 スピナ−ヘツド

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5214249B2 (ja) 2006-11-09 2013-06-19 三菱レイヨン株式会社 ベタインの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6096822U (ja) * 1983-12-09 1985-07-02 沖電気工業株式会社 スピナ−ヘツド

Also Published As

Publication number Publication date
JPH0314171B2 (enrdf_load_stackoverflow) 1991-02-26

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