JPS58169855A - イオン銃 - Google Patents

イオン銃

Info

Publication number
JPS58169855A
JPS58169855A JP57052552A JP5255282A JPS58169855A JP S58169855 A JPS58169855 A JP S58169855A JP 57052552 A JP57052552 A JP 57052552A JP 5255282 A JP5255282 A JP 5255282A JP S58169855 A JPS58169855 A JP S58169855A
Authority
JP
Japan
Prior art keywords
ion
ion beam
electrode
emitter
ion gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57052552A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0317177B2 (enEXAMPLES
Inventor
Ryuzo Aihara
相原　龍三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP57052552A priority Critical patent/JPS58169855A/ja
Publication of JPS58169855A publication Critical patent/JPS58169855A/ja
Publication of JPH0317177B2 publication Critical patent/JPH0317177B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
JP57052552A 1982-03-31 1982-03-31 イオン銃 Granted JPS58169855A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57052552A JPS58169855A (ja) 1982-03-31 1982-03-31 イオン銃

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57052552A JPS58169855A (ja) 1982-03-31 1982-03-31 イオン銃

Publications (2)

Publication Number Publication Date
JPS58169855A true JPS58169855A (ja) 1983-10-06
JPH0317177B2 JPH0317177B2 (enEXAMPLES) 1991-03-07

Family

ID=12917964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57052552A Granted JPS58169855A (ja) 1982-03-31 1982-03-31 イオン銃

Country Status (1)

Country Link
JP (1) JPS58169855A (enEXAMPLES)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4829368A (enEXAMPLES) * 1971-08-16 1973-04-18
JPS54118066U (enEXAMPLES) * 1978-02-08 1979-08-18

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4829368A (enEXAMPLES) * 1971-08-16 1973-04-18
JPS54118066U (enEXAMPLES) * 1978-02-08 1979-08-18

Also Published As

Publication number Publication date
JPH0317177B2 (enEXAMPLES) 1991-03-07

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