JPS58169150A - フオトマスクの製造方法 - Google Patents

フオトマスクの製造方法

Info

Publication number
JPS58169150A
JPS58169150A JP57052070A JP5207082A JPS58169150A JP S58169150 A JPS58169150 A JP S58169150A JP 57052070 A JP57052070 A JP 57052070A JP 5207082 A JP5207082 A JP 5207082A JP S58169150 A JPS58169150 A JP S58169150A
Authority
JP
Japan
Prior art keywords
film
etching
tungsten
plasma
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57052070A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6227384B2 (enrdf_load_stackoverflow
Inventor
Katsuyuki Arii
有井　勝之
Shinya Kato
真也 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57052070A priority Critical patent/JPS58169150A/ja
Publication of JPS58169150A publication Critical patent/JPS58169150A/ja
Publication of JPS6227384B2 publication Critical patent/JPS6227384B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57052070A 1982-03-30 1982-03-30 フオトマスクの製造方法 Granted JPS58169150A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57052070A JPS58169150A (ja) 1982-03-30 1982-03-30 フオトマスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57052070A JPS58169150A (ja) 1982-03-30 1982-03-30 フオトマスクの製造方法

Publications (2)

Publication Number Publication Date
JPS58169150A true JPS58169150A (ja) 1983-10-05
JPS6227384B2 JPS6227384B2 (enrdf_load_stackoverflow) 1987-06-15

Family

ID=12904554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57052070A Granted JPS58169150A (ja) 1982-03-30 1982-03-30 フオトマスクの製造方法

Country Status (1)

Country Link
JP (1) JPS58169150A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019194145A1 (ja) * 2018-04-05 2019-10-10 ミネベアミツミ株式会社 ひずみゲージ及びその製造方法
US11454488B2 (en) 2017-09-29 2022-09-27 Minebea Mitsumi Inc. Strain gauge with improved stability
US11543308B2 (en) 2017-09-29 2023-01-03 Minebea Mitsumi Inc. Strain gauge
US11543309B2 (en) 2017-12-22 2023-01-03 Minebea Mitsumi Inc. Strain gauge and sensor module
US11542590B2 (en) 2017-09-29 2023-01-03 Minebea Mitsumi Inc. Strain gauge
US11692806B2 (en) 2017-09-29 2023-07-04 Minebea Mitsumi Inc. Strain gauge with improved stability
US11774303B2 (en) 2018-10-23 2023-10-03 Minebea Mitsumi Inc. Accelerator, steering wheel, six-axis sensor, engine, bumper and the like

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50109672A (enrdf_load_stackoverflow) * 1974-02-02 1975-08-28
JPS53108285A (en) * 1977-03-03 1978-09-20 Hattori Isao Photomask original plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50109672A (enrdf_load_stackoverflow) * 1974-02-02 1975-08-28
JPS53108285A (en) * 1977-03-03 1978-09-20 Hattori Isao Photomask original plate

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11542590B2 (en) 2017-09-29 2023-01-03 Minebea Mitsumi Inc. Strain gauge
US11454488B2 (en) 2017-09-29 2022-09-27 Minebea Mitsumi Inc. Strain gauge with improved stability
US11543308B2 (en) 2017-09-29 2023-01-03 Minebea Mitsumi Inc. Strain gauge
US11692806B2 (en) 2017-09-29 2023-07-04 Minebea Mitsumi Inc. Strain gauge with improved stability
US11702730B2 (en) 2017-09-29 2023-07-18 Minebea Mitsumi Inc. Strain gauge
US11543309B2 (en) 2017-12-22 2023-01-03 Minebea Mitsumi Inc. Strain gauge and sensor module
JP2019184344A (ja) * 2018-04-05 2019-10-24 ミネベアミツミ株式会社 ひずみゲージ及びその製造方法
CN111919083A (zh) * 2018-04-05 2020-11-10 美蓓亚三美株式会社 应变片及其制造方法
WO2019194145A1 (ja) * 2018-04-05 2019-10-10 ミネベアミツミ株式会社 ひずみゲージ及びその製造方法
CN111919083B (zh) * 2018-04-05 2023-08-22 美蓓亚三美株式会社 应变片及其制造方法
US11747225B2 (en) 2018-04-05 2023-09-05 Minebea Mitsumi Inc. Strain gauge with improved stability and stress reduction
JP2023138685A (ja) * 2018-04-05 2023-10-02 ミネベアミツミ株式会社 ひずみゲージ及びその製造方法
US11774303B2 (en) 2018-10-23 2023-10-03 Minebea Mitsumi Inc. Accelerator, steering wheel, six-axis sensor, engine, bumper and the like

Also Published As

Publication number Publication date
JPS6227384B2 (enrdf_load_stackoverflow) 1987-06-15

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