JPS58166930A - 中和されたイオン・ビ−ムを発生させる装置 - Google Patents

中和されたイオン・ビ−ムを発生させる装置

Info

Publication number
JPS58166930A
JPS58166930A JP57222199A JP22219982A JPS58166930A JP S58166930 A JPS58166930 A JP S58166930A JP 57222199 A JP57222199 A JP 57222199A JP 22219982 A JP22219982 A JP 22219982A JP S58166930 A JPS58166930 A JP S58166930A
Authority
JP
Japan
Prior art keywords
electrons
ion
ion beam
grid
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57222199A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6367744B2 (enExample
Inventor
ジエ−ムズ・マツケル・エドウイン・ハ−パ−
モ−デハイ・ハイブラム
ハロルド・リチヤ−ド・カウフマン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS58166930A publication Critical patent/JPS58166930A/ja
Publication of JPS6367744B2 publication Critical patent/JPS6367744B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
JP57222199A 1982-03-05 1982-12-20 中和されたイオン・ビ−ムを発生させる装置 Granted JPS58166930A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/355,067 US4419203A (en) 1982-03-05 1982-03-05 Apparatus and method for neutralizing ion beams
US355067 1994-12-13

Publications (2)

Publication Number Publication Date
JPS58166930A true JPS58166930A (ja) 1983-10-03
JPS6367744B2 JPS6367744B2 (enExample) 1988-12-27

Family

ID=23396109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57222199A Granted JPS58166930A (ja) 1982-03-05 1982-12-20 中和されたイオン・ビ−ムを発生させる装置

Country Status (4)

Country Link
US (1) US4419203A (enExample)
EP (1) EP0093831B1 (enExample)
JP (1) JPS58166930A (enExample)
DE (1) DE3377602D1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5988820A (ja) * 1982-11-15 1984-05-22 Ulvac Corp シ−トプラズマを利用した化合物半導体薄膜製造装置
JPS61248346A (ja) * 1985-04-24 1986-11-05 マイクリオン・コーポレイション 集束イオンビーム処理装置
JPH01105331A (ja) * 1987-04-15 1989-04-21 Sanyo Electric Co Ltd 薄膜形成方法
US5089710A (en) * 1989-09-04 1992-02-18 Tokyo Electron Limited Ion implantation equipment

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59168652A (ja) * 1983-03-16 1984-09-22 Hitachi Ltd 素子修正方法及びその装置
US4664769A (en) * 1985-10-28 1987-05-12 International Business Machines Corporation Photoelectric enhanced plasma glow discharge system and method including radiation means
JPH0610348B2 (ja) * 1986-07-28 1994-02-09 三菱電機株式会社 イオン注入装置
JPH01220350A (ja) * 1988-02-26 1989-09-04 Hitachi Ltd 帯電抑制方法及びその装置を用いた粒子線照射装置
US4925542A (en) * 1988-12-08 1990-05-15 Trw Inc. Plasma plating apparatus and method
EP0390692A3 (en) * 1989-03-29 1991-10-02 Terumo Kabushiki Kaisha Method of forming thin film, apparatus for forming thin film and sensor
US4985657A (en) * 1989-04-11 1991-01-15 Lk Technologies, Inc. High flux ion gun apparatus and method for enhancing ion flux therefrom
JPH0724240B2 (ja) * 1991-03-05 1995-03-15 株式会社荏原製作所 高速原子線源
US5466929A (en) * 1992-02-21 1995-11-14 Hitachi, Ltd. Apparatus and method for suppressing electrification of sample in charged beam irradiation apparatus
US5300891A (en) * 1992-05-01 1994-04-05 Genus, Inc. Ion accelerator
US5357116A (en) * 1992-11-23 1994-10-18 Schlumberger Technologies, Inc. Focused ion beam processing with charge control
WO1995027570A1 (en) * 1994-04-08 1995-10-19 Ray Mark A Selective plasma deposition
US5468955A (en) * 1994-12-20 1995-11-21 International Business Machines Corporation Neutral beam apparatus for in-situ production of reactants and kinetic energy transfer
US6184532B1 (en) 1997-12-01 2001-02-06 Ebara Corporation Ion source
US6271529B1 (en) 1997-12-01 2001-08-07 Ebara Corporation Ion implantation with charge neutralization
US6329650B1 (en) * 1997-12-01 2001-12-11 Ebara Corporation Space charge neutralization of an ion beam
US6359286B1 (en) * 1998-07-10 2002-03-19 Applied Materials, Inc. Method and apparatus for neutralizing space charge in an ion beam
JP3414380B2 (ja) * 2000-11-14 2003-06-09 日新電機株式会社 イオンビーム照射方法ならびに関連の方法および装置
CN104498898B (zh) 2008-08-04 2017-10-24 北美Agc平板玻璃公司 通过等离子体增强的化学气相沉积形成涂层的方法
CN103816871A (zh) * 2014-02-28 2014-05-28 吴从兵 采用低能粒子改性粉煤灰的方法
JP6508746B2 (ja) 2014-12-05 2019-05-08 エージーシー フラット グラス ノース アメリカ，インコーポレイテッドＡｇｃ Ｆｌａｔ Ｇｌａｓｓ Ｎｏｒｔｈ Ａｍｅｒｉｃａ，Ｉｎｃ． マクロ粒子低減コーティングを利用したプラズマ源ならびにマクロ粒子低減コーティングを用いたプラズマ源を薄膜コーティングおよび表面改質に使用する方法
ES2883288T3 (es) 2014-12-05 2021-12-07 Agc Glass Europe Sa Fuente de plasma de cátodo hueco
US9721764B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Method of producing plasma by multiple-phase alternating or pulsed electrical current
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
BR112018012413A2 (pt) * 2015-12-18 2018-12-18 Agc Flat Glass Na Inc fonte de íons de catodo oco e método de extração e aceleração de íons
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3050652A (en) * 1960-08-12 1962-08-21 Gen Electric Methods and apparatus for developing forces with ion beams
US3156090A (en) * 1961-09-18 1964-11-10 Harold R Kaufman Ion rocket
US3308621A (en) * 1963-12-30 1967-03-14 United Aircraft Corp Oscillating-electron ion engine
US3354644A (en) * 1965-06-08 1967-11-28 Electro Optical Systems Inc Liquid protection of electrodes
US3523210A (en) * 1966-05-20 1970-08-04 Xerox Corp Gas discharge neutralizer including a charged particle source
US3408283A (en) * 1966-09-15 1968-10-29 Kennecott Copper Corp High current duoplasmatron having an apertured anode positioned in the low pressure region
US3387176A (en) * 1967-01-05 1968-06-04 Hughes Aircraft Co Apparatus for passing charged particles through a field free region and neutralizingsaid particles during transit
US3515932A (en) * 1967-04-27 1970-06-02 Hughes Aircraft Co Hollow cathode plasma generator
US3523211A (en) * 1968-12-12 1970-08-04 Kazuo Oishi Condenser-discharge ignition system with a silicon control rectifier
US3697793A (en) * 1970-02-09 1972-10-10 Hughes Aircraft Co Ion beam deflection system
US3913320A (en) * 1974-11-13 1975-10-21 Ion Tech Inc Electron-bombardment ion sources
US3956666A (en) * 1975-01-27 1976-05-11 Ion Tech, Inc. Electron-bombardment ion sources
JPS5275341A (en) * 1975-12-19 1977-06-24 Rikagaku Kenkyusho Method of producing echelette grating
JPS5288900A (en) * 1976-01-19 1977-07-25 Matsushita Electric Ind Co Ltd Ion beam machine tool
US4088926A (en) * 1976-05-10 1978-05-09 Nasa Plasma cleaning device
US4313791A (en) * 1977-05-06 1982-02-02 The Babcock & Wilcox Company Method for locating defective nuclear fuel elements
US4151589A (en) * 1978-02-03 1979-04-24 Leeds & Northrup Company Decoupled cascade control system
US4172020A (en) * 1978-05-24 1979-10-23 Gould Inc. Method and apparatus for monitoring and controlling sputter deposition processes
US4201654A (en) * 1978-10-06 1980-05-06 The United States Of America As Represented By The Secretary Of The Air Force Anode assisted sputter etch and deposition apparatus
US4250009A (en) * 1979-05-18 1981-02-10 International Business Machines Corporation Energetic particle beam deposition system
US4264813A (en) * 1979-06-29 1981-04-28 International Business Machines Corportion High intensity ion source using ionic conductors
EP0040081B1 (en) * 1980-05-12 1984-09-12 Fujitsu Limited Method and apparatus for plasma etching
US4309267A (en) * 1980-07-21 1982-01-05 Bell Telephone Laboratories, Incorporated Reactive sputter etching apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5988820A (ja) * 1982-11-15 1984-05-22 Ulvac Corp シ−トプラズマを利用した化合物半導体薄膜製造装置
JPS61248346A (ja) * 1985-04-24 1986-11-05 マイクリオン・コーポレイション 集束イオンビーム処理装置
JPH01105331A (ja) * 1987-04-15 1989-04-21 Sanyo Electric Co Ltd 薄膜形成方法
US5089710A (en) * 1989-09-04 1992-02-18 Tokyo Electron Limited Ion implantation equipment

Also Published As

Publication number Publication date
EP0093831B1 (en) 1988-08-03
EP0093831A2 (en) 1983-11-16
EP0093831A3 (en) 1984-10-03
DE3377602D1 (en) 1988-09-08
US4419203A (en) 1983-12-06
JPS6367744B2 (enExample) 1988-12-27

Similar Documents

Publication Publication Date Title
JPS58166930A (ja) 中和されたイオン・ビ−ムを発生させる装置
US4684848A (en) Broad-beam electron source
KR101194652B1 (ko) 고전류 디시 양성자 가속기
US5365070A (en) Negative ion beam injection apparatus with magnetic shield and electron removal means
US4463255A (en) Apparatus for enhanced neutralization of positively charged ion beam
US3956666A (en) Electron-bombardment ion sources
JPS59139539A (ja) 空間変調密度を有する粒子ビ−ムを得るための方法および装置
US6985553B2 (en) Ultra-short ion and neutron pulse production
US4541890A (en) Hall ion generator for working surfaces with a low energy high intensity ion beam
Harris A tutorial on vacuum surface flashover
EP0094473B1 (en) Apparatus and method for producing a stream of ions
US4447761A (en) Negative ion generator
Probyn A low-energy ion source for the deposition of chromium
GB2084792A (en) Apparatus for enhanced neutralization of positively charged ion beam
Welch et al. Effects of preneutralization on heavy ion fusion chamber transport
JP3064214B2 (ja) 高速原子線源
JPS59113175A (ja) 負イオン源
US8610379B1 (en) Systems and methods for the magnetic insulation of accelerator electrodes in electrostatic accelerators
Belchenko et al. Studies of surface-plasma negative ion sources at Novosibirsk
US11991814B1 (en) Pulsed ion beam to pulsed neutral particle beam slow wave converter device and method for use thereof
EP0095879B1 (en) Apparatus and method for working surfaces with a low energy high intensity ion beam
Rej et al. Plasma and ion beam processing at Los Alamos
JPH0227432B2 (enExample)
Schwirzke Plasma jets emitted by unipolar arcing from spherical laser targets
Arkhipov et al. Processes in a dense long-pulse electron beam focused on a solid target