JPS58158439U - エピタキシヤル成長装置のコイル支え装置 - Google Patents

エピタキシヤル成長装置のコイル支え装置

Info

Publication number
JPS58158439U
JPS58158439U JP5526982U JP5526982U JPS58158439U JP S58158439 U JPS58158439 U JP S58158439U JP 5526982 U JP5526982 U JP 5526982U JP 5526982 U JP5526982 U JP 5526982U JP S58158439 U JPS58158439 U JP S58158439U
Authority
JP
Japan
Prior art keywords
coil
epitaxial growth
growth apparatus
frequency heating
coil support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5526982U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0356043Y2 (cg-RX-API-DMAC7.html
Inventor
吉三 小宮山
宮崎 美彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Machine Co Ltd
Original Assignee
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Machine Co Ltd filed Critical Toshiba Machine Co Ltd
Priority to JP5526982U priority Critical patent/JPS58158439U/ja
Publication of JPS58158439U publication Critical patent/JPS58158439U/ja
Application granted granted Critical
Publication of JPH0356043Y2 publication Critical patent/JPH0356043Y2/ja
Granted legal-status Critical Current

Links

JP5526982U 1982-04-16 1982-04-16 エピタキシヤル成長装置のコイル支え装置 Granted JPS58158439U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5526982U JPS58158439U (ja) 1982-04-16 1982-04-16 エピタキシヤル成長装置のコイル支え装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5526982U JPS58158439U (ja) 1982-04-16 1982-04-16 エピタキシヤル成長装置のコイル支え装置

Publications (2)

Publication Number Publication Date
JPS58158439U true JPS58158439U (ja) 1983-10-22
JPH0356043Y2 JPH0356043Y2 (cg-RX-API-DMAC7.html) 1991-12-16

Family

ID=30065855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5526982U Granted JPS58158439U (ja) 1982-04-16 1982-04-16 エピタキシヤル成長装置のコイル支え装置

Country Status (1)

Country Link
JP (1) JPS58158439U (cg-RX-API-DMAC7.html)

Also Published As

Publication number Publication date
JPH0356043Y2 (cg-RX-API-DMAC7.html) 1991-12-16

Similar Documents

Publication Publication Date Title
US5044943A (en) Spoked susceptor support for enhanced thermal uniformity of susceptor in semiconductor wafer processing apparatus
TW526521B (en) Electrostatic chuck with porous regions
TWI779206B (zh) 晶圓支撐台
US5362228A (en) Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method using the apparatus
JP2016536803A (ja) 温度プロファイル制御装置を有する加熱基板支持体
JP2018123348A (ja) ウエハ支持台
US3980854A (en) Graphite susceptor structure for inductively heating semiconductor wafers
TW466666B (en) Method and apparatus for fabricating a wafer spacing mask on a substrate support chuck
JPH0746437Y2 (ja) 静電チャック
EP0600516A1 (en) Diffusion furnace boat assembly and wafer support
TW583725B (en) Substrate processing apparatus and method for manufacturing semiconductor device
JPS58158439U (ja) エピタキシヤル成長装置のコイル支え装置
JPH01125819A (ja) 気相成長装置
JPS58158438U (ja) エピタキシヤル成長装置のコイル保持装置
JPH06163440A (ja) 半導体縦型拡散炉用治具
JPH01205076A (ja) 炭化珪素被膜のコーテイング装置
JP3757066B2 (ja) 熱処理装置用断熱部材
JPS63174435U (cg-RX-API-DMAC7.html)
JPS6324121Y2 (cg-RX-API-DMAC7.html)
JP2023169797A (ja) 電極埋設部材、および基板保持部材
KR20120062572A (ko) 진공 열처리 장치
JPS62219913A (ja) バレル型気相成長装置
JPH0461117A (ja) 枚葉式cvd装置
JPH03291916A (ja) サセプタ
JP2021086925A (ja) 基板保持部材及び真空吸着装置