JPS58156522A - ジシランの製造方法 - Google Patents

ジシランの製造方法

Info

Publication number
JPS58156522A
JPS58156522A JP3723982A JP3723982A JPS58156522A JP S58156522 A JPS58156522 A JP S58156522A JP 3723982 A JP3723982 A JP 3723982A JP 3723982 A JP3723982 A JP 3723982A JP S58156522 A JPS58156522 A JP S58156522A
Authority
JP
Japan
Prior art keywords
disilane
solvent
reaction
autoclave
inert gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3723982A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0218286B2 (enrdf_load_stackoverflow
Inventor
Tetsuya Iwao
岩尾　徹也
Yoshiaki Toyoda
豊田　芳昭
Osamu Kido
木戸　修
Yoshinori Ashida
芦田　芳徳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP3723982A priority Critical patent/JPS58156522A/ja
Publication of JPS58156522A publication Critical patent/JPS58156522A/ja
Publication of JPH0218286B2 publication Critical patent/JPH0218286B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
JP3723982A 1982-03-11 1982-03-11 ジシランの製造方法 Granted JPS58156522A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3723982A JPS58156522A (ja) 1982-03-11 1982-03-11 ジシランの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3723982A JPS58156522A (ja) 1982-03-11 1982-03-11 ジシランの製造方法

Publications (2)

Publication Number Publication Date
JPS58156522A true JPS58156522A (ja) 1983-09-17
JPH0218286B2 JPH0218286B2 (enrdf_load_stackoverflow) 1990-04-25

Family

ID=12492055

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3723982A Granted JPS58156522A (ja) 1982-03-11 1982-03-11 ジシランの製造方法

Country Status (1)

Country Link
JP (1) JPS58156522A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4639361A (en) * 1984-02-21 1987-01-27 Central Glass Company, Limited Process of preparing disilane by reduction of hexachlorodisilane
DE102009056731A1 (de) 2009-12-04 2011-06-09 Rev Renewable Energy Ventures, Inc. Halogenierte Polysilane und Polygermane
CN106115718A (zh) * 2016-06-25 2016-11-16 浙江迅鼎半导体材料科技有限公司 一种乙硅烷生产装置
CN106145119A (zh) * 2016-06-25 2016-11-23 浙江迅鼎半导体材料科技有限公司 一种乙硅烷反应釜
CN112158847A (zh) * 2020-11-14 2021-01-01 深圳市博纯半导体材料有限公司 乙硅烷的生产提纯工艺

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4639361A (en) * 1984-02-21 1987-01-27 Central Glass Company, Limited Process of preparing disilane by reduction of hexachlorodisilane
DE102009056731A1 (de) 2009-12-04 2011-06-09 Rev Renewable Energy Ventures, Inc. Halogenierte Polysilane und Polygermane
US9040009B2 (en) 2009-12-04 2015-05-26 Spawnt Private S.à.r.1. Kinetically stable chlorinated polysilanes and production thereof
US9139702B2 (en) 2009-12-04 2015-09-22 Spawnt Private S.A.R.L. Method for producing halogenated polysilanes
US9458294B2 (en) 2009-12-04 2016-10-04 Spawnt Private S.À.R.L. Method for removing impurities from silicon
CN106115718A (zh) * 2016-06-25 2016-11-16 浙江迅鼎半导体材料科技有限公司 一种乙硅烷生产装置
CN106145119A (zh) * 2016-06-25 2016-11-23 浙江迅鼎半导体材料科技有限公司 一种乙硅烷反应釜
CN112158847A (zh) * 2020-11-14 2021-01-01 深圳市博纯半导体材料有限公司 乙硅烷的生产提纯工艺

Also Published As

Publication number Publication date
JPH0218286B2 (enrdf_load_stackoverflow) 1990-04-25

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