JPS5814839A - 投影露光装置 - Google Patents
投影露光装置Info
- Publication number
- JPS5814839A JPS5814839A JP56113310A JP11331081A JPS5814839A JP S5814839 A JPS5814839 A JP S5814839A JP 56113310 A JP56113310 A JP 56113310A JP 11331081 A JP11331081 A JP 11331081A JP S5814839 A JPS5814839 A JP S5814839A
- Authority
- JP
- Japan
- Prior art keywords
- film
- exposure
- exposed
- holes
- point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Projection-Type Copiers In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56113310A JPS5814839A (ja) | 1981-07-20 | 1981-07-20 | 投影露光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56113310A JPS5814839A (ja) | 1981-07-20 | 1981-07-20 | 投影露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5814839A true JPS5814839A (ja) | 1983-01-27 |
JPH0428099B2 JPH0428099B2 (enrdf_load_html_response) | 1992-05-13 |
Family
ID=14608989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56113310A Granted JPS5814839A (ja) | 1981-07-20 | 1981-07-20 | 投影露光装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5814839A (enrdf_load_html_response) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6490099A (en) * | 1987-10-01 | 1989-04-05 | Kaneyuki Suzuki | Night soil treating device |
JPH0724837B2 (ja) * | 1984-09-13 | 1995-03-22 | アクセルロッド、バ−トン | 廃棄物の処理方法および装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4720843U (enrdf_load_html_response) * | 1971-03-18 | 1972-11-09 | ||
JPS51942U (enrdf_load_html_response) * | 1974-03-30 | 1976-01-07 | ||
JPS513621A (en) * | 1974-06-28 | 1976-01-13 | Shigeru Usami | Reriifusakuseihoho |
JPS5636179U (enrdf_load_html_response) * | 1979-08-28 | 1981-04-07 | ||
JPS5667984A (en) * | 1979-11-09 | 1981-06-08 | Fujitsu Ltd | Method of printing printed board |
-
1981
- 1981-07-20 JP JP56113310A patent/JPS5814839A/ja active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4720843U (enrdf_load_html_response) * | 1971-03-18 | 1972-11-09 | ||
JPS51942U (enrdf_load_html_response) * | 1974-03-30 | 1976-01-07 | ||
JPS513621A (en) * | 1974-06-28 | 1976-01-13 | Shigeru Usami | Reriifusakuseihoho |
JPS5636179U (enrdf_load_html_response) * | 1979-08-28 | 1981-04-07 | ||
JPS5667984A (en) * | 1979-11-09 | 1981-06-08 | Fujitsu Ltd | Method of printing printed board |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0724837B2 (ja) * | 1984-09-13 | 1995-03-22 | アクセルロッド、バ−トン | 廃棄物の処理方法および装置 |
JPS6490099A (en) * | 1987-10-01 | 1989-04-05 | Kaneyuki Suzuki | Night soil treating device |
Also Published As
Publication number | Publication date |
---|---|
JPH0428099B2 (enrdf_load_html_response) | 1992-05-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6033811A (en) | Optical proximity correction mask for semiconductor device fabrication | |
US6841315B2 (en) | Graytone mask and manufacturing method thereof | |
US9423687B2 (en) | Mask plate, method for fabricating array substrate using the same, and array substrate | |
WO2007049640A1 (ja) | 露光方法及び露光装置 | |
CN105093813A (zh) | 光掩模板和曝光系统 | |
CN116344511B (zh) | 对准标记版图及其操作方法 | |
JPS5814839A (ja) | 投影露光装置 | |
JP4736277B2 (ja) | カラーフィルターの着色画素の形成方法及びカラーフィルターのブラックマトリックスの形成方法 | |
JP2008003543A (ja) | フォトマスク、カラーフィルタ、及び液晶表示装置 | |
US10739930B2 (en) | Mask plate, display substrate, method for manufacturing display substrate, and display device | |
TWI252346B (en) | Liquid crystal device with electrode arrangement to prevent shorting and electronic equipment incorporating the same | |
CN109491191A (zh) | 一种掩模板及其制作方法 | |
EP0459737A2 (en) | Reticle for a reduced projection exposure apparatus | |
US20190278168A1 (en) | Functional film layer pattern, display substrate, method for manufacturing display substrate, and display device | |
CN113805425B (zh) | 掩膜板、膜层的制作方法、显示基板及显示装置 | |
JP2912505B2 (ja) | 半導体装置の製造方法 | |
US20130157176A1 (en) | Photomask | |
JPH04311025A (ja) | 露光方法 | |
JP2005084492A (ja) | カラーフィルタ用フォトマスク及びそれを用いたカラーフィルタの製造方法 | |
US20060019202A1 (en) | Method and system for contiguous proximity correction for semiconductor masks | |
JP3898772B2 (ja) | 半導体装置の製造方法 | |
CN111983889B (zh) | 掩膜板装置、显示器、曝光机 | |
JPH0438354Y2 (enrdf_load_html_response) | ||
CN110967920A (zh) | 双光掩膜和曝光方法 | |
JPS59192248A (ja) | レテイクル |