JPS58147538A - スパツタ非晶質磁性材料及びその製造方法 - Google Patents
スパツタ非晶質磁性材料及びその製造方法Info
- Publication number
- JPS58147538A JPS58147538A JP57028064A JP2806482A JPS58147538A JP S58147538 A JPS58147538 A JP S58147538A JP 57028064 A JP57028064 A JP 57028064A JP 2806482 A JP2806482 A JP 2806482A JP S58147538 A JPS58147538 A JP S58147538A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic material
- amorphous magnetic
- niobium
- amorphous
- sputtered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000696 magnetic material Substances 0.000 title claims abstract description 152
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 45
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 7
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 6
- 239000010955 niobium Substances 0.000 claims description 50
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 44
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 26
- 238000010438 heat treatment Methods 0.000 claims description 24
- 229910017052 cobalt Inorganic materials 0.000 claims description 20
- 239000010941 cobalt Substances 0.000 claims description 20
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 20
- 229910052742 iron Inorganic materials 0.000 claims description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 11
- 239000011572 manganese Substances 0.000 claims description 10
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 7
- 229910052796 boron Inorganic materials 0.000 claims description 7
- 229910052748 manganese Inorganic materials 0.000 claims description 7
- 239000010936 titanium Substances 0.000 claims description 7
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052735 hafnium Inorganic materials 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 229910052715 tantalum Inorganic materials 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052785 arsenic Inorganic materials 0.000 claims description 4
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 4
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 239000011574 phosphorus Substances 0.000 claims description 4
- 239000004859 Copal Substances 0.000 claims description 3
- 241000782205 Guibourtia conjugata Species 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 239000004071 soot Substances 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 241000894007 species Species 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 2
- 239000006185 dispersion Substances 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 41
- 230000004907 flux Effects 0.000 abstract description 32
- 238000002425 crystallisation Methods 0.000 abstract description 11
- 230000008025 crystallization Effects 0.000 abstract description 11
- 239000000758 substrate Substances 0.000 abstract description 11
- 238000004544 sputter deposition Methods 0.000 abstract description 7
- 239000000470 constituent Substances 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 description 22
- 238000000034 method Methods 0.000 description 16
- 230000005415 magnetization Effects 0.000 description 15
- 238000005260 corrosion Methods 0.000 description 14
- 230000007797 corrosion Effects 0.000 description 14
- 230000005389 magnetism Effects 0.000 description 8
- 229910052721 tungsten Inorganic materials 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- -1 panazicum Chemical compound 0.000 description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 5
- 239000010937 tungsten Substances 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 229910052752 metalloid Inorganic materials 0.000 description 4
- 238000010791 quenching Methods 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910002056 binary alloy Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229910020517 Co—Ti Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000007545 Vickers hardness test Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000004455 differential thermal analysis Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000007710 freezing Methods 0.000 description 2
- 230000008014 freezing Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000010583 slow cooling Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910020515 Co—W Inorganic materials 0.000 description 1
- 241000238631 Hexapoda Species 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 235000003976 Ruta Nutrition 0.000 description 1
- 240000005746 Ruta graveolens Species 0.000 description 1
- 241000269821 Scombridae Species 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 235000020640 mackerel Nutrition 0.000 description 1
- 239000002075 main ingredient Substances 0.000 description 1
- 230000003340 mental effect Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000012958 reprocessing Methods 0.000 description 1
- 235000005806 ruta Nutrition 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0433—Nickel- or cobalt-based alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
- H01F1/147—Alloys characterised by their composition
- H01F1/153—Amorphous metallic alloys, e.g. glassy metals
- H01F1/15358—Making agglomerates therefrom, e.g. by pressing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Dispersion Chemistry (AREA)
- Power Engineering (AREA)
- Soft Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57028064A JPS58147538A (ja) | 1982-02-25 | 1982-02-25 | スパツタ非晶質磁性材料及びその製造方法 |
| FR8303001A FR2522188B1 (fr) | 1982-02-25 | 1983-02-24 | Materiau magnetique amorphe par procede de pulverisation et procede pour sa fabrication |
| NL8300695A NL8300695A (nl) | 1982-02-25 | 1983-02-24 | Sputterproces amorf magnetisch materiaal en werkwijze voor het bereiden daarvan. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57028064A JPS58147538A (ja) | 1982-02-25 | 1982-02-25 | スパツタ非晶質磁性材料及びその製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58147538A true JPS58147538A (ja) | 1983-09-02 |
Family
ID=12238329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57028064A Pending JPS58147538A (ja) | 1982-02-25 | 1982-02-25 | スパツタ非晶質磁性材料及びその製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS58147538A (fr) |
| FR (1) | FR2522188B1 (fr) |
| NL (1) | NL8300695A (fr) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62210607A (ja) * | 1986-03-12 | 1987-09-16 | Matsushita Electric Ind Co Ltd | 軟磁性合金膜及びその形成法 |
| CN102649162A (zh) * | 2012-04-26 | 2012-08-29 | 中山大学 | 贵金属纳米材料或过渡金属氧化物纳米材料的制备方法 |
| CN104451467A (zh) * | 2014-12-15 | 2015-03-25 | 郑州大学 | 一种钴基块体非晶合金及其制备方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59193235A (ja) * | 1983-04-15 | 1984-11-01 | Hitachi Ltd | 複合型磁気ヘッド |
| US20160160331A1 (en) * | 2013-07-12 | 2016-06-09 | Hewlett-Packard Development Company, L.P. | Amorphous thin metal film |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE7511398L (sv) * | 1974-10-21 | 1976-04-22 | Western Electric Co | Magnetisk anordning |
| US4056411A (en) * | 1976-05-14 | 1977-11-01 | Ho Sou Chen | Method of making magnetic devices including amorphous alloys |
| WO1981000861A1 (fr) * | 1979-09-21 | 1981-04-02 | Hitachi Metals Ltd | Alliages amorphes |
| JPS5789450A (en) * | 1980-11-21 | 1982-06-03 | Matsushita Electric Ind Co Ltd | Amorphous magnetic alloy |
-
1982
- 1982-02-25 JP JP57028064A patent/JPS58147538A/ja active Pending
-
1983
- 1983-02-24 FR FR8303001A patent/FR2522188B1/fr not_active Expired
- 1983-02-24 NL NL8300695A patent/NL8300695A/nl not_active Application Discontinuation
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62210607A (ja) * | 1986-03-12 | 1987-09-16 | Matsushita Electric Ind Co Ltd | 軟磁性合金膜及びその形成法 |
| JPH0573242B2 (fr) * | 1986-03-12 | 1993-10-14 | Matsushita Electric Ind Co Ltd | |
| CN102649162A (zh) * | 2012-04-26 | 2012-08-29 | 中山大学 | 贵金属纳米材料或过渡金属氧化物纳米材料的制备方法 |
| CN104451467A (zh) * | 2014-12-15 | 2015-03-25 | 郑州大学 | 一种钴基块体非晶合金及其制备方法 |
| CN104451467B (zh) * | 2014-12-15 | 2016-04-27 | 郑州大学 | 一种钴基块体非晶合金及其制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| NL8300695A (nl) | 1983-09-16 |
| FR2522188A1 (fr) | 1983-08-26 |
| FR2522188B1 (fr) | 1988-06-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4236946A (en) | Amorphous magnetic thin films with highly stable easy axis | |
| JPS5827941A (ja) | 非晶質薄膜の製造方法 | |
| CN107614715A (zh) | 含有l10型铁镍规则相的铁镍合金组成物、含有l10型铁镍规则相的铁镍合金组成物的制造方法、以非晶作为主相的铁镍合金组成物、非晶材的母合金、非晶材、磁性材料以及磁性材料的制造方法 | |
| JP2004171606A (ja) | 高密度磁気記録媒体用ナノコンポジット薄膜の製造 | |
| JPH0533461B2 (fr) | ||
| JPS60157715A (ja) | 磁気記録媒体 | |
| US6350323B1 (en) | High permeability metal glassy alloy for high frequencies | |
| JPS58147538A (ja) | スパツタ非晶質磁性材料及びその製造方法 | |
| JPS60220914A (ja) | 磁性薄膜 | |
| Miyazaki et al. | Giant magnetoresistance in Co–Cu granular alloy films and nanowires prepared by pulsed-electrodeposition | |
| Ma et al. | A study of sputtering process for nanocrystalline FeAlN soft magnetic thin films | |
| JP2000503169A (ja) | 分布ギャップ電気チョーク | |
| KR940007048B1 (ko) | 연자성 합금막 | |
| Fukumiya et al. | Thermal stability and hardness of metastable Co–C composite alloy films | |
| CN108251799B (zh) | 基于非晶SmCo的磁电耦合异质结结构及其制备方法和应用 | |
| EP0007755B1 (fr) | Procédé pour la fabrication de moyen d'enregistrement magnétique et un moyen d'enregistrement magnétique ainsi fabriqué | |
| Nadzri et al. | A review of iron nitride based thin films development | |
| JP2710441B2 (ja) | 軟磁性積層膜 | |
| JPS6039157A (ja) | 非晶質磁性合金の製造方法 | |
| JP3075332B2 (ja) | 高電気比抵抗磁性薄膜 | |
| Sánchez | Magnetic properties of NiTi/(Ni, Co) heterostructures | |
| Kitada | Annealing behaviour and magnetic properties of Co/Pt and Fe/Pt bilayer thin films | |
| JPS6289312A (ja) | 軟磁性薄膜 | |
| JPS5975610A (ja) | 鉄基磁性合金薄膜およびその製造方法 | |
| Richards | Some Recent Developments in Magnetic Alloys |