JPS58146345U - Charged particle beam device - Google Patents

Charged particle beam device

Info

Publication number
JPS58146345U
JPS58146345U JP4299482U JP4299482U JPS58146345U JP S58146345 U JPS58146345 U JP S58146345U JP 4299482 U JP4299482 U JP 4299482U JP 4299482 U JP4299482 U JP 4299482U JP S58146345 U JPS58146345 U JP S58146345U
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
holding table
beam device
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4299482U
Other languages
Japanese (ja)
Inventor
穴沢　紀道
Original Assignee
日本電子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電子株式会社 filed Critical 日本電子株式会社
Priority to JP4299482U priority Critical patent/JPS58146345U/en
Publication of JPS58146345U publication Critical patent/JPS58146345U/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

添付図面は本考案の一実施例の構成を示す図である。 １：被加工材料、２：保持台、３：移動機構、４：荷電
粒子線、５：検出器、６：捕集電極、７：シールド板。The accompanying drawings are diagrams showing the configuration of an embodiment of the present invention. 1: Material to be processed, 2: Holding table, 3: Moving mechanism, 4: Charged particle beam, 5: Detector, 6: Collection electrode, 7: Shield plate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 荷電粒子源と、該荷電粒子源で生成された荷電粒子線が
照射される材料を保持す、る保持台と、該保持台を移動
させる移動機構と、上記材料から発生した２次電子を検
出するために試料上方に配置された電子検出器を備えた
荷電粒子線装置において、前記保持台の移動範囲をカバ
ーする大きさを持ち且つ荷電粒子線通過口を有するシー
ルド板を上記保持台に近接して設置したことを特徴とす
る荷電粒子線装置。A charged particle source, a holding table for holding a material to be irradiated with a charged particle beam generated by the charged particle source, a moving mechanism for moving the holding table, and detecting secondary electrons generated from the material. In a charged particle beam apparatus equipped with an electron detector placed above the sample in order to detect the sample, a shield plate having a size that covers the movement range of the holding table and having a charged particle beam passage port is placed close to the holding table. A charged particle beam device characterized in that it is installed as follows.
JP4299482U 1982-03-26 1982-03-26 Charged particle beam device Pending JPS58146345U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4299482U JPS58146345U (en) 1982-03-26 1982-03-26 Charged particle beam device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4299482U JPS58146345U (en) 1982-03-26 1982-03-26 Charged particle beam device

Publications (1)

Publication Number Publication Date
JPS58146345U true JPS58146345U (en) 1983-10-01

Family

ID=30054090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4299482U Pending JPS58146345U (en) 1982-03-26 1982-03-26 Charged particle beam device

Country Status (1)

Country Link
JP (1) JPS58146345U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6433838A (en) * 1987-07-28 1989-02-03 Nissin Electric Co Ltd Surface analyzer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6433838A (en) * 1987-07-28 1989-02-03 Nissin Electric Co Ltd Surface analyzer

Similar Documents

Publication Publication Date Title
JPS58146345U (en) Charged particle beam device
JPS531593A (en) Charged particle energy analyzer
JPS59148064U (en) Ion beam sputtering equipment
JPS60140764U (en) plasma processing equipment
JPS6132954U (en) Charged particle beam analyzer
JPS58174856U (en) electronic microscope
JPS6119774U (en) Potential measurement device using a scanning electron microscope
JPS5941856U (en) Sample surface etching device for analysis equipment, etc.
JPS6013740U (en) Sample holding device
JPS58173161U (en) Low speed electron beam prevention slit
JPS5971158U (en) Augier electron spectrometer
JPS6037163U (en) scanning electron microscope
JPS5431677A (en) Method of and apparatus for electrically collecting dust
JPS5945849U (en) ion implanter
JPS58172864U (en) Sample chamber for ion microanalyzer
JPS60184259U (en) analytical electron microscope
JPS5274799A (en) Multistepped accelerating tube
JPS5226287A (en) Sample analyzing apparatus by detection of secondary electrons
JPS5947857U (en) Gas introduction sample device for sample analysis devices, etc.
JPS619761U (en) electron beam equipment
JPS59181573U (en) Sample chamber exhaust system in charged particle beam equipment
JPS5823161U (en) Charged particle analyzer
JPS5252562A (en) Electron beam scanning type sample image pick-up device
JPS5989275U (en) Surface dose rate measuring device
JPS5985573U (en) mass spectrometer