JPS58172864U - Sample chamber for ion microanalyzer - Google Patents

Sample chamber for ion microanalyzer

Info

Publication number
JPS58172864U
JPS58172864U JP6946382U JP6946382U JPS58172864U JP S58172864 U JPS58172864 U JP S58172864U JP 6946382 U JP6946382 U JP 6946382U JP 6946382 U JP6946382 U JP 6946382U JP S58172864 U JPS58172864 U JP S58172864U
Authority
JP
Japan
Prior art keywords
sample chamber
sample
ion microanalyzer
ion
secondary charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6946382U
Other languages
Japanese (ja)
Inventor
問田 博
小又 厚
安田 昭善
Original Assignee
株式会社日立製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社日立製作所 filed Critical 株式会社日立製作所
Priority to JP6946382U priority Critical patent/JPS58172864U/en
Publication of JPS58172864U publication Critical patent/JPS58172864U/en
Pending legal-status Critical Current

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  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例を示す路線図である。 1・・・・・・イオン源、2・・・・・・−次イオンビ
ーム、3・・・・・・コンデンサレンズ、4・・・・・
・対物絞り、5・・・・・・対物レンズ、6・・・・・
・試料、7・・・・・・中性粒子、8・・・・・・二次
荷電粒子、9・・・・・・二次イオン引出電極、10・
・・・・・二次イオン質量分析計、11・・・・・・偏
向電極、12・・・・・・観察用CRT、13・・・・
・・二次荷電粒子検出器、14・・・・・・シールド板
、15・・・・・・二次荷電粒子検出器、検出部、16
・・・・・・シールド板駆動機構、17・・・・・・試
料室、18・・・・・・観察用CRT電源部、19・・
・・・・増幅器、20・・・・・・シールド板駆動制御
部。
FIG. 1 is a route map showing an embodiment of the present invention. 1...Ion source, 2...-Next ion beam, 3...Condenser lens, 4...
・Objective aperture, 5...Objective lens, 6...
- Sample, 7... Neutral particles, 8... Secondary charged particles, 9... Secondary ion extraction electrode, 10.
...Secondary ion mass spectrometer, 11...Deflection electrode, 12...CRT for observation, 13...
...Secondary charged particle detector, 14...Shield plate, 15...Secondary charged particle detector, detection unit, 16
... Shield plate drive mechanism, 17 ... Sample chamber, 18 ... Observation CRT power supply section, 19 ...
...Amplifier, 20... Shield plate drive control section.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 試料台、二次荷電粒子検出器からなる試料室において、
試料から飛散するスパッタ粒子が二次荷電粒子検出器に
付着するのを防止するスパッタ粒子遮蔽機能を備えたこ
とを特徴とするイオンマイ′クロアナライザー用試料室
In the sample chamber consisting of a sample stage and a secondary charged particle detector,
A sample chamber for an ion microanalyzer, characterized by having a sputter particle shielding function that prevents sputter particles scattered from a sample from adhering to a secondary charged particle detector.
JP6946382U 1982-05-14 1982-05-14 Sample chamber for ion microanalyzer Pending JPS58172864U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6946382U JPS58172864U (en) 1982-05-14 1982-05-14 Sample chamber for ion microanalyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6946382U JPS58172864U (en) 1982-05-14 1982-05-14 Sample chamber for ion microanalyzer

Publications (1)

Publication Number Publication Date
JPS58172864U true JPS58172864U (en) 1983-11-18

Family

ID=30079191

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6946382U Pending JPS58172864U (en) 1982-05-14 1982-05-14 Sample chamber for ion microanalyzer

Country Status (1)

Country Link
JP (1) JPS58172864U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017174504A (en) * 2016-03-18 2017-09-28 株式会社日立ハイテクサイエンス Composite charged particle beam device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017174504A (en) * 2016-03-18 2017-09-28 株式会社日立ハイテクサイエンス Composite charged particle beam device

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