JPS58172864U - Sample chamber for ion microanalyzer - Google Patents
Sample chamber for ion microanalyzerInfo
- Publication number
- JPS58172864U JPS58172864U JP6946382U JP6946382U JPS58172864U JP S58172864 U JPS58172864 U JP S58172864U JP 6946382 U JP6946382 U JP 6946382U JP 6946382 U JP6946382 U JP 6946382U JP S58172864 U JPS58172864 U JP S58172864U
- Authority
- JP
- Japan
- Prior art keywords
- sample chamber
- sample
- ion microanalyzer
- ion
- secondary charged
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は本考案の一実施例を示す路線図である。
1・・・・・・イオン源、2・・・・・・−次イオンビ
ーム、3・・・・・・コンデンサレンズ、4・・・・・
・対物絞り、5・・・・・・対物レンズ、6・・・・・
・試料、7・・・・・・中性粒子、8・・・・・・二次
荷電粒子、9・・・・・・二次イオン引出電極、10・
・・・・・二次イオン質量分析計、11・・・・・・偏
向電極、12・・・・・・観察用CRT、13・・・・
・・二次荷電粒子検出器、14・・・・・・シールド板
、15・・・・・・二次荷電粒子検出器、検出部、16
・・・・・・シールド板駆動機構、17・・・・・・試
料室、18・・・・・・観察用CRT電源部、19・・
・・・・増幅器、20・・・・・・シールド板駆動制御
部。FIG. 1 is a route map showing an embodiment of the present invention. 1...Ion source, 2...-Next ion beam, 3...Condenser lens, 4...
・Objective aperture, 5...Objective lens, 6...
- Sample, 7... Neutral particles, 8... Secondary charged particles, 9... Secondary ion extraction electrode, 10.
...Secondary ion mass spectrometer, 11...Deflection electrode, 12...CRT for observation, 13...
...Secondary charged particle detector, 14...Shield plate, 15...Secondary charged particle detector, detection unit, 16
... Shield plate drive mechanism, 17 ... Sample chamber, 18 ... Observation CRT power supply section, 19 ...
...Amplifier, 20... Shield plate drive control section.
Claims (1)
試料から飛散するスパッタ粒子が二次荷電粒子検出器に
付着するのを防止するスパッタ粒子遮蔽機能を備えたこ
とを特徴とするイオンマイ′クロアナライザー用試料室
。In the sample chamber consisting of a sample stage and a secondary charged particle detector,
A sample chamber for an ion microanalyzer, characterized by having a sputter particle shielding function that prevents sputter particles scattered from a sample from adhering to a secondary charged particle detector.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6946382U JPS58172864U (en) | 1982-05-14 | 1982-05-14 | Sample chamber for ion microanalyzer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6946382U JPS58172864U (en) | 1982-05-14 | 1982-05-14 | Sample chamber for ion microanalyzer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58172864U true JPS58172864U (en) | 1983-11-18 |
Family
ID=30079191
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6946382U Pending JPS58172864U (en) | 1982-05-14 | 1982-05-14 | Sample chamber for ion microanalyzer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58172864U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017174504A (en) * | 2016-03-18 | 2017-09-28 | 株式会社日立ハイテクサイエンス | Composite charged particle beam device |
-
1982
- 1982-05-14 JP JP6946382U patent/JPS58172864U/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017174504A (en) * | 2016-03-18 | 2017-09-28 | 株式会社日立ハイテクサイエンス | Composite charged particle beam device |
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