JPS58142576A - Dual gate mos-fet - Google Patents

Dual gate mos-fet

Info

Publication number
JPS58142576A
JPS58142576A JP2440282A JP2440282A JPS58142576A JP S58142576 A JPS58142576 A JP S58142576A JP 2440282 A JP2440282 A JP 2440282A JP 2440282 A JP2440282 A JP 2440282A JP S58142576 A JPS58142576 A JP S58142576A
Authority
JP
Japan
Prior art keywords
lead
gate
chip
leads
drain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2440282A
Other languages
Japanese (ja)
Inventor
Kiyomichi Hotta
堀田 清通
Akira Masuda
章 増田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2440282A priority Critical patent/JPS58142576A/en
Publication of JPS58142576A publication Critical patent/JPS58142576A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)

Abstract

PURPOSE:To reduce case capacitance by extending a shield segment part between the gate and the inner end of lead of source mutually adjacent to the chip mounting area. CONSTITUTION:The leads 5 of gate G1 and gate G2 are provided on the line extending from the leads 1, 4 of source and drain, while the internal end is extended in the vicinity of chip mounting part 2 in the resin package 7. The internal end of each lead is connected 6 with the chip 3. A pair of shield segments 8 are projected from the chip mounting portion 2 and respectively extending between the internal ends of two gate leads 5 and between the internal ends of gate lead 5 and drain lead. In this structure, shielding is realized due to existence of projected segment 8, case capacitance is reduced, and thereby a high frequency dual gate MOSFET having a small amount of feedback to the input side from the output side can be obtained.

Description

【発明の詳細な説明】 本発明はA11l波用のデエアルゲー)MOS−ν1テ
(Metal OxlLsssmtconauotor
形電界効米トランジヌタ)K関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention is a metal oxide MOS-ν1 TE (Metal OxlLsssmtconautor) for A11l waves.
Concerning field effect (transinuta) K.

敏−の超小IIIのレジンパッケージに麹人されたデエ
アルゲー)MOS−11?(4111MO!1−FII
T )として%jlEi図に示すように1プロエレクト
ロン標準外形(got−1421)か知られている。こ
のMOS−FITは、ソースリード1の内端−mK矩形
のチップ取付viB2を有し、このチップ取付lIZ上
にチップ3に固定した構造となっている。マタ、ソース
リードlと平行にドレインリード4が配設され、その内
me−チツプ付mWの周辺に臨ませている。さらに、ソ
ースリード!およびドレインリード4に対面させて2本
のゲートリード51配般している。2本のゲートリード
50内端もドレインリード4と同様にその内端【チップ
取付部20周辺に臨ませている。そして、各リードの内
端とこれに対応するチップ3の各電極(図示せず)とt
導i16で接続するとともに、各リードの内端部、チッ
プ3.ワイヤ6【数■の大IIさのレジンパッケージ7
で豪っている。
MOS-11? (4111MO!1-FII
T ) as %jlEi is known as 1 proelectron standard outline (got-1421) as shown in the diagram. This MOS-FIT has a rectangular chip attachment viB2 at the inner end of the source lead 1 -mK, and is fixed to the chip 3 on this chip attachment lIZ. A drain lead 4 is arranged parallel to the source lead 1, and is exposed to the periphery of the me-chip mW. Plus, source leads! Two gate leads 51 are disposed facing the drain lead 4. Similarly to the drain lead 4, the inner ends of the two gate leads 50 are also exposed to the periphery of the chip mounting portion 20. Then, the inner end of each lead and each electrode (not shown) of the chip 3 corresponding thereto and t
The inner end of each lead, chip 3. Wire 6 [Number of large size resin package 7]
It's luxurious.

しかし、この構造のMOS−11Tは低周波で使用する
場合には特に支障はないか、UBIF以上の高周波で使
用する場合には、レジンパッケージを形作るレジンが誘
電体として働くためゲート−ドレイン間のケース容量に
よって出力−から入力−への帰積量が大l〈な)、特性
の安定性か悪くなるおそれかめる。
However, when using MOS-11T with this structure at low frequencies, there is no problem in particular, and when using at high frequencies higher than UBIF, the resin that forms the resin package acts as a dielectric, so there is no problem between the gate and drain. Due to the case capacitance, the amount of feedback from the output to the input is large, and the stability of the characteristics may deteriorate.

したがって、本発明の目的はケース容量か小さく、出力
−から入力貴への帰曹量の小さい高局波菅用に適するデ
エアルゲートMOat−FITlil供することKTo
る。
Therefore, an object of the present invention is to provide a deal gate MOat-FITliil suitable for high-frequency wave channels with a small case capacity and a small amount of return from the output to the input.
Ru.

このような目的を達成するために本発明は、チップを固
定するチップ取付部と、このチップ取付部から延在する
ソースリードと、前記チップ取付部の周辺に内端t*出
させる2本のゲートリードおよび1本のドレインリード
と、各リードの内端とこれに対応するチップの電極とt
それぞれ繋ぐ導−と、各リードの内mt含み、チップ・
導ait−豪うレジンパッケージとからなるデュアルゲ
ートMOa−FITにおいて、前記チップ取付部には相
互に隣徴するゲートおよびソースのリードの内端間に延
在するシールド片部分が設けられてなるものであって、
以下111IIAiPIlによ)本発I!Iit貌明す
る。
In order to achieve such an object, the present invention provides a chip attaching part for fixing a chip, a source lead extending from the chip attaching part, and two wires whose inner ends t* extend around the chip attaching part. A gate lead and one drain lead, and the inner end of each lead and the corresponding electrode of the chip.
The leads to be connected, each lead includes mt, and the chip.
In a dual-gate MOa-FIT comprising a conductor and a strong resin package, the chip mounting portion is provided with a shield piece portion extending between inner ends of mutually adjacent gate and source leads. There it is,
The following is from 111IIAiPIl) This issue I! It's clear.

第2図は本発明の一実施例による高周波用のデ具アルゲ
ー)MO8−FITt示す平面図である。
FIG. 2 is a plan view showing a high frequency device MO8-FITt according to an embodiment of the present invention.

同図に示すように、このデ^アルゲー)MOlil−I
FITは数謹の大きさのレジンパッケージ7の中央に矩
形のチップ取付IS2か配設されている。このチップ取
付部2の一端からは太いソースリード!(ソース;S)
か延在している。このソースリードlFiレジンパッケ
ージ7の外に突出している。
As shown in the same figure, this de^alge) MOLil-I
In the FIT, a rectangular chip mounting IS2 is arranged in the center of a resin package 7 of several sizes. There is a thick source lead from one end of this chip mounting part 2! (Source; S)
Or extended. This source lead protrudes outside the IFi resin package 7.

′tた、こ゛のソースリードlと平行に延在してドレイ
ンリード4(ドレイン;D)か配設されている。
In addition, a drain lead 4 (drain; D) is provided extending parallel to the source lead 1.

ドレインリード4の内端はソースリード1か延在するチ
ップ取付ss分の反対縁に臨み、内端はレジンパッケー
ジ7内に入り、外端はレジンパッケージ7外に突出して
いる。壕t1 ソース・ドレインリード1,4の延長上
にはゲー)1(Gt)。
The inner end of the drain lead 4 faces the opposite edge of the extended chip attachment ss of the source lead 1, the inner end enters the resin package 7, and the outer end projects outside the resin package 7. Trench t1 On the extension of source/drain leads 1 and 4 is Gt1 (Gt).

ゲート2(Gl)となる2本のゲートリード5か配設さ
れ、内端をレジンパッケージ7内のチップ取付部2の鳩
辺に延在させ、外端tレジンパッケージ7外に延在させ
ている。また、各リードの内端は導1II6′III!
:介してチップ取付部2上に固定したチップ3の各電1
i(図示せず)KIIk続されている。
Two gate leads 5 serving as the gate 2 (Gl) are arranged, with the inner end extending to the dovetail of the chip mounting portion 2 inside the resin package 7, and the outer end extending outside the resin package 7. There is. Also, the inner end of each lead is conductor 1II6'III!
:Each electric wire 1 of the chip 3 fixed on the chip mounting part 2 through
i (not shown) is connected to KIIk.

さらに1チツプ取付部20周縁からは2本のシールド片
部分8か突出し、相互に隣シ合うG、lG。
Furthermore, two shield pieces 8 protrude from the periphery of the 1-chip mounting portion 20, and are adjacent to each other, G and 1G.

からなる2本のゲートリード50内端部関およびGlの
ゲートリード5とドレインリード番の内端部間にそれぞ
れ延在している。なお、ゲート11−ド5およびドレイ
ンリード番はソースリード1よりも細くなシ、各リード
の識別かできるように配慮されている。17t、各リー
ドはデュアルゲートMo1−PIITの段階では枠部を
介して一体となっていて、薄い金属板からなるリードフ
レームとなっている。
The two gate leads 50 each extend between the inner ends of the gate leads 5 and the drain leads of Gl. Note that the gate 11-domain 5 and drain lead number are thinner than the source lead 1, so that each lead can be identified. 17t, each lead is integrated through a frame portion at the stage of dual gate Mo1-PIIT, forming a lead frame made of a thin metal plate.

このような実施fIIVcよれば、2本のゲートリード
Sv内端藝関および1本のゲートリードSとドレインリ
ード4の内ms間等相互に隣接する間には、ンーヌII
勉となって電位が零となるチップ取付部2かも突出する
シールド片部分8か介在していることから、シールドか
行なえケース容量の低下【v!IAることかでlる。こ
の結末、ケース(レジンパッケージ)を介する出力−か
ら入力−への帰環童を少なくすることかできるため、た
とえば200MHgt−越え、900MHsaljfK
達する高周波域での使用においても、特性は安定する。
According to such implementation fIIVc, between the two gate leads Sv inner end and one gate lead S and the drain lead 4, between adjacent ones, etc.
Since there is also a protruding shield piece part 8 intervening in the chip mounting part 2 where the potential becomes zero due to the electric potential, the case capacitance decreases due to shielding. It's about IA. As a result, it is possible to reduce the number of return cycles from the output to the input via the case (resin package), so for example over 200MHgt, 900MHsaljfK
The characteristics remain stable even when used in high frequency ranges.

なお、本発明は前記実施的に限定されない。また、本発
明はチップとしてはGaAa F IC?であってもよ
い。
Note that the present invention is not limited to the above-mentioned implementation. Moreover, the present invention uses GaAa F IC as a chip. It may be.

以上のよう罠、本発明によれば、帰壌量か小さく特性の
安定したデュアルゲートMos−FITkm供すること
かできる。
As described above, according to the present invention, it is possible to provide a dual gate Mos-FITkm with a small return amount and stable characteristics.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来?Il¥r、f82図は本発明ガtそれぞ
れ示すデュアルゲートMoS−1ETの平面図である。 l・・・ソースリード、2・・・チップ取付部、3・・
・チップ、4・・・ドレインリード、5・・・ゲートリ
ード、6・・・$11!、7・・・レジンパッケージ、
8・・・シールド片部分。 代理人 *m士 薄 1)利 辛η鍼
Is Figure 1 conventional? Figures Il\r and f82 are plan views of the dual gate MoS-1ET shown in the present invention, respectively. l...Source lead, 2...Chip mounting part, 3...
・Chip, 4...Drain lead, 5...Gate lead, 6...$11! , 7...resin package,
8... Shield piece part. Agent *M Shi Bo 1) Li Xin η Acupuncture

Claims (1)

【特許請求の範囲】 1、  +ツブに固定するチップ取付部と、このチップ
取付部から延在するソースリードと、前記チップ取付部
の周辺に内*に9!出させる2本のゲートリードおよび
1本のドレインリードと、各リードの内端とこれに対応
するチップの電−とt+れぞれ繋ぐ導麿と、各リードの
内端【含み、チップ。 導瞭を豪うレジンパッケージとからなるデエアルゲー)
MOS−FITにおいて、ll1lr配チツプ権付11
には相互に隣接するゲートおよびソースの17−ドの内
端間に延在するシールド片部分か設けられていることt
W黴とするデエアルゲー)MOlii−Plテ。
[Claims] 1. +A chip attachment portion fixed to the prong, a source lead extending from the chip attachment portion, and a 9! Two gate leads and one drain lead, a conductive wire connecting the inner end of each lead to the corresponding chip's voltage and t+, and the inner end of each lead (including the chip). A game consisting of a highly transparent resin package)
In MOS-FIT, 11 with ll1lr chip distribution rights
A shield piece portion extending between the inner ends of the mutually adjacent gate and source nodes is provided.
W mold and air game) MOlii-Plte.
JP2440282A 1982-02-19 1982-02-19 Dual gate mos-fet Pending JPS58142576A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2440282A JPS58142576A (en) 1982-02-19 1982-02-19 Dual gate mos-fet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2440282A JPS58142576A (en) 1982-02-19 1982-02-19 Dual gate mos-fet

Publications (1)

Publication Number Publication Date
JPS58142576A true JPS58142576A (en) 1983-08-24

Family

ID=12137165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2440282A Pending JPS58142576A (en) 1982-02-19 1982-02-19 Dual gate mos-fet

Country Status (1)

Country Link
JP (1) JPS58142576A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0439656B1 (en) * 1990-01-31 2001-05-16 Infineon Technologies AG Chip support for a microwave semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0439656B1 (en) * 1990-01-31 2001-05-16 Infineon Technologies AG Chip support for a microwave semiconductor device

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