JPS61187278A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS61187278A JPS61187278A JP2706985A JP2706985A JPS61187278A JP S61187278 A JPS61187278 A JP S61187278A JP 2706985 A JP2706985 A JP 2706985A JP 2706985 A JP2706985 A JP 2706985A JP S61187278 A JPS61187278 A JP S61187278A
- Authority
- JP
- Japan
- Prior art keywords
- main surface
- inductance
- dielectric
- gaas
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体装置に係シ、特に位相整合等に使用する
コンデンサをチップ内に有するG aA s電界効果ト
ランジスタ及びGaAs ICに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to semiconductor devices, and more particularly to a GaAs field effect transistor and a GaAs IC having a capacitor used for phase matching or the like in the chip.
従来のこの種のコンデンサの一例としては、第2図(a
)、第2図り)に示すように、チップ15の主表面に第
1の電極12と第2の電極13とからなる二つの容量c
、、C4が形成される。この二つの容量C8,C4を互
いに接続する配線電極14の部分と、この電極14とア
ース面に接続する引き出し電極11との部分には、それ
ぞれインダクタンスL2.L3が存在する。An example of a conventional capacitor of this type is shown in Figure 2 (a).
), second diagram), two capacitors c consisting of a first electrode 12 and a second electrode 13 are formed on the main surface of the chip 15.
, , C4 are formed. Inductance L2. L3 exists.
また、従来のこの種のコンデンサの他側としては、第3
図(a)、第3図(b)K示すように、チップ25の主
表面に第1の電極22と第2の電極23とこの間の誘電
体26とからなる二つの容量C5゜C6が形成される。Also, on the other side of the conventional capacitor of this type, the third
As shown in Figures (a) and 3(b), two capacitances C5 and C6 are formed on the main surface of the chip 25, consisting of the first electrode 22, the second electrode 23, and the dielectric 26 between them. be done.
この二つの容量Cs、Coを互いに接続する配線電極2
4の部分と、この電極14とアース面に接続する引き出
し電極21との部分には、それぞれインダクタンスL5
.L、が存在する。Wiring electrode 2 that connects these two capacitances Cs and Co to each other
4 and a portion of the extraction electrode 21 that connects this electrode 14 to the ground plane, each has an inductance L5.
.. L exists.
前述の従来のコンデンサの構成は、容量C3゜C4(又
は容量Cs、C5)K直列に、インダクタンスL3.L
4(又はインダクタンスL5.L6)が直列に入ってか
ら、アースに接続されるという問題がある。実際、容量
C3の実効容1kCs’、及び容量C4の実効容量C4
/は、次式のようになる。The configuration of the conventional capacitor described above includes a capacitance C3°C4 (or a capacitance Cs, C5) K in series, an inductance L3. L
4 (or inductance L5, L6) are entered in series and then connected to ground. In fact, the effective capacity of capacity C3 is 1kCs', and the effective capacity of capacity C4 is C4
/ becomes as shown in the following formula.
従って、実効容量C3/ 、 C,/が小さくなる。Therefore, the effective capacitance C3/, C, / becomes small.
同時に、インダクタンスの大きさによって、実効容量が
変化するため、多数の容量を同一チップ内に入れる設計
は、非常に煩雑になる。また、アースに接続するために
配線が必要なことはいうまでもない。At the same time, since the effective capacitance changes depending on the size of the inductance, designing a large number of capacitors into the same chip becomes extremely complicated. Also, needless to say, wiring is required to connect to ground.
本発明の目的は、前記問題を改善し、インダクタンスが
小さく、実効容量が低下しないようにしたコンデンサを
有する半導体装置を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to solve the above problems and provide a semiconductor device having a capacitor with small inductance and no reduction in effective capacitance.
本発明の半導体装置の構成はs Ga A s電界効果
トランジスタを含むペレットに、−主表面の電極パター
ンとこのパターンに誘電体を介して設けた他主表面の金
属とで形成されるコンデンサを設けたことを特徴とする
。The structure of the semiconductor device of the present invention is such that a pellet containing an sGaAs field effect transistor is provided with a capacitor formed of an electrode pattern on the main surface and a metal on the other main surface provided to this pattern via a dielectric. It is characterized by:
次に本発明について図面を参照しながら詳細に説明する
。Next, the present invention will be explained in detail with reference to the drawings.
第1図(a)、及び第1図伽)は、本発明の一実施例の
半導体装置の平面図及びA−A’線矢視断面図である。FIGS. 1(a) and 1(a) are a plan view and a sectional view taken along the line AA' of a semiconductor device according to an embodiment of the present invention.
これら図において、本チップは、 GaAs3を含む主
表面上の上部電極1と、裏面電極2と、間の誘電体4と
を含み構成される。GaA sはエツチングしてあシ、
この構成で、容量C1,C2を形成している。ここで、
裏面電極2は、すべてアース面に同電位で接続されてい
るので、配線電極は必要ない。また、同時にこの同電位
であることから、容量CI+ 02間に直列に入るイン
ダクタンスは#1とんどない。In these figures, the chip includes an upper electrode 1 on the main surface containing GaAs 3, a back electrode 2, and a dielectric 4 therebetween. GaAs is etched,
This configuration forms capacitors C1 and C2. here,
Since the back electrodes 2 are all connected to the ground plane at the same potential, no wiring electrodes are required. Furthermore, since they are at the same potential, there is almost no inductance #1 that enters in series between the capacitor CI+02.
以上説明したように、本発明によれば、 GaAsをエ
ツチングして裏面電極と表面電極との間でコンデンサを
形成しているため、直列に入るシースインダクタンスが
ほとんど無視でき、実効容量が誘電体の厚さと電極幅の
みで設計でき、配線が不要になるという効果が得られる
。As explained above, according to the present invention, since the capacitor is formed between the back electrode and the front electrode by etching GaAs, the sheath inductance connected in series can be almost ignored, and the effective capacitance is equal to that of the dielectric material. It can be designed using only the thickness and electrode width, and has the advantage of eliminating the need for wiring.
第1図(a)は本発明の実施例の半導体装置を示す平面
図、第1図(b)は第1図(a)のA−A’線に沿って
切断して見た断面図、第2図(a)は従来のコンデンサ
の一例を示す平面図、第2図9))は第2図(a)のB
−B/線に沿って切断して見た断面図、第3図(a)は
従来のコンデンサの他側を示す平面図、第3図Φ)は第
3図(a)のC−C/線に沿って切断して見た断面図で
ある。
面図において、1,12.22・・・・・・第1の電極
、2、 13.23−・−・・・第2の電極、3”−”
GaAs。
4、26・・・・・・誘電体、15.25・・・・・・
チップ、L2゜L3.L5.L6・・・・・・インダク
タンスs c、、 C4*C,、C,・・・・・・
容量。FIG. 1(a) is a plan view showing a semiconductor device according to an embodiment of the present invention, FIG. 1(b) is a cross-sectional view taken along line AA' in FIG. 1(a), Figure 2 (a) is a plan view showing an example of a conventional capacitor, and Figure 2 (9)) is B in Figure 2 (a).
3(a) is a plan view showing the other side of the conventional capacitor, and FIG. 3(Φ) is a cross-sectional view taken along line C-C/ of FIG. FIG. 2 is a cross-sectional view taken along a line. In the top view, 1, 12.22...first electrode, 2, 13.23-...second electrode, 3"-"
GaAs. 4, 26...dielectric, 15.25...
Chip, L2゜L3. L5. L6...Inductance s c,, C4*C,, C,...
capacity.
Claims (1)
主表面の電極パターンとこのパターンに誘電体を介して
設けた他主表面の金属とで形成されるコンデンサを設け
たことを特徴とする半導体装置。A semiconductor device characterized in that a pellet including a GaAs field effect transistor is provided with a capacitor formed of an electrode pattern on one main surface and a metal on the other main surface provided to this pattern via a dielectric.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2706985A JPS61187278A (en) | 1985-02-14 | 1985-02-14 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2706985A JPS61187278A (en) | 1985-02-14 | 1985-02-14 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61187278A true JPS61187278A (en) | 1986-08-20 |
Family
ID=12210778
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2706985A Pending JPS61187278A (en) | 1985-02-14 | 1985-02-14 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61187278A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0361900A2 (en) * | 1988-09-30 | 1990-04-04 | Fujitsu Limited | Semiconductor device having a built-in capacitor and manufacturing method thereof |
US4996572A (en) * | 1987-03-13 | 1991-02-26 | Kabushiki Kaisha Toshiba | Semiconductor memory device |
US5210599A (en) * | 1988-09-30 | 1993-05-11 | Fujitsu Limited | Semiconductor device having a built-in capacitor and manufacturing method thereof |
-
1985
- 1985-02-14 JP JP2706985A patent/JPS61187278A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4996572A (en) * | 1987-03-13 | 1991-02-26 | Kabushiki Kaisha Toshiba | Semiconductor memory device |
EP0361900A2 (en) * | 1988-09-30 | 1990-04-04 | Fujitsu Limited | Semiconductor device having a built-in capacitor and manufacturing method thereof |
US5210599A (en) * | 1988-09-30 | 1993-05-11 | Fujitsu Limited | Semiconductor device having a built-in capacitor and manufacturing method thereof |
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