JPS58137947A - 電子光学鏡筒 - Google Patents
電子光学鏡筒Info
- Publication number
- JPS58137947A JPS58137947A JP57020143A JP2014382A JPS58137947A JP S58137947 A JPS58137947 A JP S58137947A JP 57020143 A JP57020143 A JP 57020143A JP 2014382 A JP2014382 A JP 2014382A JP S58137947 A JPS58137947 A JP S58137947A
- Authority
- JP
- Japan
- Prior art keywords
- deflector
- blanking
- electron
- deflection
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57020143A JPS58137947A (ja) | 1982-02-10 | 1982-02-10 | 電子光学鏡筒 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57020143A JPS58137947A (ja) | 1982-02-10 | 1982-02-10 | 電子光学鏡筒 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58137947A true JPS58137947A (ja) | 1983-08-16 |
| JPH0568847B2 JPH0568847B2 (enExample) | 1993-09-29 |
Family
ID=12018918
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57020143A Granted JPS58137947A (ja) | 1982-02-10 | 1982-02-10 | 電子光学鏡筒 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58137947A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6089051A (ja) * | 1983-10-21 | 1985-05-18 | Jeol Ltd | イオンビ−ム装置 |
| US20160071682A1 (en) * | 2013-01-18 | 2016-03-10 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5322375A (en) * | 1976-08-13 | 1978-03-01 | Jeol Ltd | Beam blanking device |
| JPS5596636A (en) * | 1979-01-19 | 1980-07-23 | Zeiss Jena Veb Carl | Method of and device for controlling formed electron beam cutting machine |
| JPS57122518A (en) * | 1981-01-22 | 1982-07-30 | Toshiba Corp | Electro-optical body tube |
-
1982
- 1982-02-10 JP JP57020143A patent/JPS58137947A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5322375A (en) * | 1976-08-13 | 1978-03-01 | Jeol Ltd | Beam blanking device |
| JPS5596636A (en) * | 1979-01-19 | 1980-07-23 | Zeiss Jena Veb Carl | Method of and device for controlling formed electron beam cutting machine |
| JPS57122518A (en) * | 1981-01-22 | 1982-07-30 | Toshiba Corp | Electro-optical body tube |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6089051A (ja) * | 1983-10-21 | 1985-05-18 | Jeol Ltd | イオンビ−ム装置 |
| US20160071682A1 (en) * | 2013-01-18 | 2016-03-10 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
| US9824849B2 (en) * | 2013-01-18 | 2017-11-21 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
| US10192712B2 (en) | 2013-01-18 | 2019-01-29 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
| US11145483B2 (en) | 2013-01-18 | 2021-10-12 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0568847B2 (enExample) | 1993-09-29 |
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