JPS58129883A - Solid-state image pickup device - Google Patents

Solid-state image pickup device

Info

Publication number
JPS58129883A
JPS58129883A JP58007219A JP721983A JPS58129883A JP S58129883 A JPS58129883 A JP S58129883A JP 58007219 A JP58007219 A JP 58007219A JP 721983 A JP721983 A JP 721983A JP S58129883 A JPS58129883 A JP S58129883A
Authority
JP
Japan
Prior art keywords
gate
reset
turned
phis
signal line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58007219A
Other languages
Japanese (ja)
Inventor
Masakazu Aoki
久保征治
Kayao Takemoto
青木正和
Shinya Oba
大場信彌
Seiji Kubo
竹本一八男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58007219A priority Critical patent/JPS58129883A/en
Publication of JPS58129883A publication Critical patent/JPS58129883A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers

Abstract

PURPOSE:To make signal processing easy and to increase the sensitivity, by providing a transfer gate and a storage capacitor between a horizontal switch MOS transistor (TR) and a vertical signal line and connecting a connecting point between the gate and the TR to a reset gate. CONSTITUTION:Before signals stored in a photodiode 11, pulses phit, phis, phiR are sequentially turned on, a virtual signal is picked up from a reset TR17, and the potential under the storage capacitor 16 is reset to a voltage VR. Further, pulses phiv, phit, phis, phix are sequentially turned on and signals are sent to a CTD storage gate 13. When the pulse Ot is turned on, the voltage VR is set so as to flow charges to a vertical signal line 14, the potential of the line 14 is decreased and the transfer gate is in a sufficiently conductive state. Succeedingly, when the pulse phis is turned on, the charges flowing before and the signal charges are shifted to the gate 16 in a short time. Thus, through the simple signal processing, the device having high sensitivity is formed.

Description

【発明の詳細な説明】 本発明は受光部にダイオードアレーを設け、読み出しレ
ジスタとして電荷移送素子(ChargeTransf
er Device ;以下CTDと略す)を設けた二
次元固体撮借装置(以下単にホトセ/すと略す)に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a diode array in the light receiving section and uses a charge transfer element (ChargeTransf) as a readout register.
The present invention relates to a two-dimensional solid-state imaging device (hereinafter simply abbreviated as HOTOSE/SU) equipped with a CTD (hereinafter abbreviated as CTD).

ホトセンサには従来MO8方式とCCD方式の2種類が
知られている。前者は後者と比ベチップサイズに対する
利用率は高く感度も高いが、出力信号が小さく信号処理
が難かしいなど、それぞれ一長一短を有しており、実用
レベルの裡能誓こ&言今−歩欠けるところがあった。
Two types of photosensors are conventionally known: MO8 type and CCD type. Compared to the latter, the former has a higher utilization rate for the chip size and higher sensitivity, but each has its own advantages and disadvantages, such as the output signal is small and signal processing is difficult. However, there was something.

これを解決するホトセンサとして、第1図(こ示すよう
な、受光部にMO8方式を、読み出しレジスタにCCD
方式を用いたホトセ/4)−が提案されている。
As a photo sensor to solve this problem, as shown in Fig. 1, an MO8 method is used for the light receiving part and a CCD is used for the readout register.
A method using the method 4) has been proposed.

第1図は受光部にダイオードアレーを、読み出しレジス
タにCTDを設けたホトセンサの従来例を示すもので、
用中lはp−n接合から成るホトダイオードアレー、2
は垂直スイッチ用MOSトランジスタ(vMO8Tと略
す)、3は、:のMOSトランジスタをクロックφ7で
順次スイッチングするスキャナ、4は垂直の信号線、5
は水平スイ、チ用Molランジスタ(以下HMO8Tと
略すX6は水平読み出し用CTD、7はCTD6Gこ接
続するプリアンプであり、スキャナ3からの)くルスφ
 に同期してVMO8Tを介して垂直信号線4(こ読み
出された信号電荷は、パルスφx4こ同期してHMO8
T 5を介してCTD6へ送られ、ブリアンブ7から順
次読み出される。
Figure 1 shows a conventional example of a photosensor that has a diode array in the light receiving section and a CTD in the readout register.
In use, l is a photodiode array consisting of a p-n junction, 2
is a vertical switch MOS transistor (abbreviated as vMO8T); 3 is a scanner that sequentially switches the MOS transistors of : with clock φ7; 4 is a vertical signal line; 5 is a vertical switch MOS transistor;
is a Mol transistor for horizontal switch (hereinafter abbreviated as HMO8T).
The signal charges read out from the vertical signal line 4 are sent to the HMO8 through the VMO8T in synchronization with the pulse φx4.
It is sent to the CTD 6 via the T5 and read out sequentially from the Brian 7.

第1図に示すホトセンサは、Mos方式、CCD方式の
長所を組合わせた装置として秀れた特性が期待されたが
、実際には次のような理由から極めて不十分な性能しか
得られていない。
The photosensor shown in Figure 1 was expected to have excellent characteristics as a device that combines the advantages of the Mos method and the CCD method, but in reality, it has achieved extremely inadequate performance for the following reasons. .

第2図は第1図に示したホトセンサの問題点を説明する
回路図で、図中10はVMO8Tの1つを取り出したも
の、llは対応するホトダイオード、12はHMO8T
の1つ、13は水平レジスタであるCTDの1蓄積電極
を各々模式的に示したものである。
FIG. 2 is a circuit diagram explaining the problem of the photo sensor shown in FIG.
13 schematically shows one storage electrode of the CTD, which is a horizontal register.

第2図に示したホトダイオード11.垂直信号線14、
CTDの蓄積電極13の各々の容量をcP、 cv、及
びCcとすると、通例Cv> C,、Cc−、(1) となる。垂直信号線に取出された信号電荷。・7の内C
TDへ取込まれる量Qcは であるのでQc<Qv、となりて、信号電荷を十分CT
Dへ取込むことができない。さらに手直信号線14に取
出された電荷Qvによる電位変化Δvv  ・鵜、ホト
ダイオード部における光信号による電位変化ΔvPに比
べ と非常に小さいので、HMO8T12  はパルスφ工
がオン状態になりても十分導通状態にならず、電荷の転
送時間は非常に長く、十分な移送が行なえない。
Photodiode 11 shown in FIG. vertical signal line 14,
If the capacitances of the storage electrodes 13 of the CTD are cP, cv, and Cc, then Cv>C, Cc-, (1) is generally satisfied. Signal charge taken out to the vertical signal line.・C out of 7
Since the amount Qc taken into TD is, Qc<Qv, and the signal charge can be sufficiently CT
It cannot be imported into D. Furthermore, the potential change Δvv due to the charge Qv taken out to the control signal line 14 is very small compared to the potential change ΔvP due to the optical signal in the photodiode section, so HMO8T12 is sufficiently conductive even when the pulse φ switch is turned on. state, the charge transfer time is very long, and sufficient transfer cannot be performed.

第3図は上記問題を解決した本発明の詳細な説明する等
価回路図である。図中10,14は第2図におけると同
一である。第3図では垂直信号線14とHMO8T12
との間に、転送ゲート15、蓄積電1i16、リセット
トランジスタ゛17が設けられている。
FIG. 3 is an equivalent circuit diagram illustrating in detail the present invention that solves the above problem. 10 and 14 in the figure are the same as in FIG. In Figure 3, the vertical signal line 14 and HMO8T12
A transfer gate 15, a storage voltage 1i16, and a reset transistor 17 are provided between the two.

第4図は本発明になるホトセンサの駆動パルスのタイミ
ングの一例を、示す図であって矢印30に示す方向がオ
ン状態である。以下第4図のタイミングを用いて第3図
の回路の動作を説明する。
FIG. 4 is a diagram showing an example of the timing of the drive pulse of the photosensor according to the present invention, and the direction shown by the arrow 30 is the ON state. The operation of the circuit shown in FIG. 3 will be explained below using the timing shown in FIG. 4.

まずホトダイオード11に蓄積した信号を読み出す前に
φ1 、φ、、φ、を22,23.24に示すように順
次オン状態にして水平読み出し時間tH(29)中に蓄
積した暗電流などによる擬信号をリセットトランジスタ
17がら取出し、蓄積容量16下の電位をVBにリセッ
トする。次にφ。
First, before reading out the signal accumulated in the photodiode 11, φ1, φ, φ are turned on sequentially as shown in 22, 23, and 24 to generate a pseudo signal due to dark current accumulated during the horizontal readout time tH (29). is extracted from the reset transistor 17, and the potential under the storage capacitor 16 is reset to VB. Next is φ.

φ1.φ1.φ8 を25.26,27.28に示すよ
うに順次オン状態にして信号をCTD蓄積ゲ−)13へ
移送する。ここで・φ1がオン状態になったとき蓄積ゲ
ー)16下をソースとしてここから電荷が垂直信号線1
4側へ流入するようにv8を設定しておくと、垂直信号
線14の電位を下げることができ、転送ゲートは十分な
導通状態になる。このため続いてφ、がオン状態になっ
て蓄積ゲー)16下が逆に、ドレイン側になったとき、
手直信号線14側から、さきに流入した電荷と信号電荷
とを短かい時間に蓄積ゲート16側へ移すことができる
。すなわち一定量の電荷をリセットゲート17側から垂
直信号線14へ送り込み、これをダイオードアレー11
側から送られてきた信号電荷と共に蓄積容量16側へ逆
流させ、さらにCTDへ移すことにより、短時間の内に
大部分の信号電荷なCTDへ送り込むことが可能になる
φ1. φ1. φ8 is sequentially turned on as shown at 25.26 and 27.28, and the signal is transferred to the CTD storage gate 13. Here, when φ1 turns on, the storage gate) 16 below is used as the source, and the charge is transferred from here to the vertical signal line 1.
By setting v8 so that it flows into the 4th side, the potential of the vertical signal line 14 can be lowered, and the transfer gate becomes sufficiently conductive. Therefore, φ is turned on and the storage gate) 16 is reversely turned to the drain side.
The charges and signal charges that previously flowed in can be transferred from the manual signal line 14 side to the storage gate 16 side in a short time. That is, a certain amount of charge is sent from the reset gate 17 side to the vertical signal line 14, and this is sent to the diode array 11.
By causing the signal charge sent from the side to flow back to the storage capacitor 16 side and further transferring it to the CTD, it becomes possible to send most of the signal charge to the CTD within a short time.

(なお以上の転送動作は水平帰線期間1B(第4図21
)の中ですべて行なわれる。) ここでリセットゲー)17は、これを例えば手直信号線
14に直接接続することも考えられる。
(The above transfer operation is performed during the horizontal retrace period 1B (Fig. 4, 21)
) is all done within. ) Here, it is also possible to connect the reset game ) 17 directly to the manual signal line 14, for example.

しかしそのような接続ではCv> C,・、 Cc、 
C8であることから、VBのわずかの変化でも電荷量の
変化は大きくなり、蓄積容量16、CTD蓄積ゲート1
3における電位変化は大きなものになるので、vlの厳
密な制御が必要となり実際には十分な特性が得にくい。
However, in such a connection, Cv>C,・, Cc,
Since it is C8, even a slight change in VB causes a large change in the amount of charge.
Since the potential change at 3 is large, strict control of vl is required, and in reality it is difficult to obtain sufficient characteristics.

このためリセットゲート17を転送ゲート15とHMO
8T12の間に設けることは極めて重要である。
Therefore, the reset gate 17 is connected to the transfer gate 15 and the HMO
It is extremely important to provide between 8T12.

第5図は上記−原理による本発明の実施例を示した図で
あって、1〜7は第1図に示したと同じであり、41は
転送ゲート、42は蓄積容量、43はリセットゲートで
ある。
FIG. 5 is a diagram showing an embodiment of the present invention based on the above-mentioned principle, in which 1 to 7 are the same as shown in FIG. 1, 41 is a transfer gate, 42 is a storage capacitor, and 43 is a reset gate. be.

第6図は本発明の実施例の断面図の一例を示したもので
ある。図中61はp形S1基板、62〜64はn膨拡散
層、65はn形S1層、66はSiO2なこの絶縁膜、
67.69〜72は多結晶Sl  などの電極、68は
A/などの導電体による配線であり、62はホトダイオ
ード、67はVMO8T、68 は垂直信号線、69は
転送ゲート、70は蓄積容量、71 ViHMO8T 
、 72はCTDの蓄積ゲートをそれぞれ形成する。こ
こでCTDとしては、水平レジスタが5〜lOMHzの
高速動作を必要とするため、B CD (Bulk C
harge−transfer Device : M
、Kubo、Proc、6th Conbon 5ol
id 5tate Devlces、Tokyo、p1
73(Jan。
FIG. 6 shows an example of a sectional view of an embodiment of the present invention. In the figure, 61 is a p-type S1 substrate, 62 to 64 are n-swelled diffusion layers, 65 is an n-type S1 layer, 66 is an insulating film such as SiO2,
67. 69 to 72 are electrodes such as polycrystalline Sl, 68 is wiring made of a conductor such as A/, 62 is a photodiode, 67 is VMO8T, 68 is a vertical signal line, 69 is a transfer gate, 70 is a storage capacitor, 71 ViHMO8T
, 72 form storage gates of the CTD, respectively. Here, as a CTD, since the horizontal register requires high-speed operation of 5 to 10 MHz, B CD (Bulk C
Harge-transfer Device: M
, Kubo, Proc, 6th Combon 5ol
id 5tate Devlces, Tokyo, p1
73 (Jan.

1975)参照)を用い、n層65を設けた。第6図に
はリセットゲートが示されていないが、これは電極70
に隣接し、図面と垂直方向に設けられている。
(1975)), an n-layer 65 was provided. Although the reset gate is not shown in FIG.
is located adjacent to and perpendicular to the drawing.

以上の実施例では主に信号電荷として電子を用いる装置
を示したがこれは正孔を用いる場合でも半導体の導電形
、電圧の正負を逆にすることなどにより同様に適用でき
ることは明らかであり、また第6図に示した構造及び物
質はこれに限らず他の同等の機能を持つもので置きかえ
てもよいことは明らかである。
In the above embodiments, a device that mainly uses electrons as the signal charge was shown, but it is clear that this can be applied in the same way even when holes are used by reversing the conductivity type of the semiconductor and the polarity of the voltage. Furthermore, it is clear that the structures and materials shown in FIG. 6 are not limited to these, and may be replaced with other structures having equivalent functions.

以上説明した如く本発明によれば、受光部にダイオード
アレー、読み出しレジスタに電荷移送素子を設けた二次
元固体撮偉装置において、水平スイッチMO8)ランジ
スタと垂直信号線との間に転送ゲート、蓄積容量を設け
、また転送ゲートと水平スイッチMO8)ランジスタの
間の点をリセットゲートに接続することにより、短時間
にほぼ完全に信号電荷を電荷移送素子へ転送することが
でき、これに伴ない信号処理が容易に感度が高い二次元
固体撮儂装置を実現することができる。
As explained above, according to the present invention, in a two-dimensional solid-state imaging device in which a diode array is provided in a light receiving section and a charge transfer element is provided in a readout register, a transfer gate is provided between a horizontal switch MO8) transistor and a vertical signal line. By providing a capacitor and connecting the point between the transfer gate and the horizontal switch MO8) transistor to the reset gate, it is possible to almost completely transfer the signal charge to the charge transfer element in a short period of time, and the signal charge accordingly A two-dimensional solid-state imaging device that is easy to process and has high sensitivity can be realized.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は従来の固体撮傷装置を示す図、第3図
、第4図−1第5図、第6図は本発明の実施例を示す図
である。 41・・・転送ゲート、4・2・・・蓄積容量、43・
・・リセットゲート。 代理人 弁理士 高 橋 明 夫 ■ 2 図 ψ1 ψX  ψcr 稟 仝 国 閉 5 ロ
1 and 2 are diagrams showing a conventional solid-state imaging device, and FIGS. 3 and 4-1, FIG. 5, and FIG. 6 are diagrams showing an embodiment of the present invention. 41... Transfer gate, 4.2... Storage capacity, 43.
...Reset gate. Agent Patent Attorney Akio Takahashi ■ 2 Figure ψ1 ψ

Claims (1)

【特許請求の範囲】 1、複数の光ダイオードからの光信号電荷を、電荷転送
素子に伝達して読み出す固体撮像装置において、垂直信
号線と水平スイッチMO8)クンジスタとの間に、転送
ゲート、蓄積容量な設Cす。 さらに転送ゲートと水平スイッチMO8)ランジスタの
間の接続点をリセットゲートを介してリセット電圧源に
接続してなることを特徴とする固体撮像装置。
[Claims] 1. In a solid-state imaging device that transmits optical signal charges from a plurality of photodiodes to a charge transfer element and reads them out, a transfer gate, an accumulation Capacity setting C. Furthermore, a solid-state imaging device characterized in that a connection point between the transfer gate and the horizontal switch MO8) transistor is connected to a reset voltage source via a reset gate.
JP58007219A 1983-01-21 1983-01-21 Solid-state image pickup device Pending JPS58129883A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58007219A JPS58129883A (en) 1983-01-21 1983-01-21 Solid-state image pickup device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58007219A JPS58129883A (en) 1983-01-21 1983-01-21 Solid-state image pickup device

Publications (1)

Publication Number Publication Date
JPS58129883A true JPS58129883A (en) 1983-08-03

Family

ID=11659882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58007219A Pending JPS58129883A (en) 1983-01-21 1983-01-21 Solid-state image pickup device

Country Status (1)

Country Link
JP (1) JPS58129883A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4857996A (en) * 1985-11-06 1989-08-15 Canon Kabushiki Kaisha Image pickup device with reduced fixed pattern noise

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5385187A (en) * 1977-01-03 1978-07-27 Reticon Corp Photodiode array

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5385187A (en) * 1977-01-03 1978-07-27 Reticon Corp Photodiode array

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4857996A (en) * 1985-11-06 1989-08-15 Canon Kabushiki Kaisha Image pickup device with reduced fixed pattern noise

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