JPS58126534A - Photomask preparation device - Google Patents

Abstract

PURPOSE:To reduce attachment of dust of a mask and defects of the mask, and to enhance yield of mask preparation, labor saving and manufacturing efficiency, by conveying the mask mechanically and automatically between respective processing sections. CONSTITUTION:A photomask preparation device is composed, as a whole, of a pretreatment device 1 and a posttreatment device 2, and the mask is conveyed from the left to the right to process it in each section. The device 1 is provided with a scrubber 3, a paper dryer 4, a coater 5, a baker 6, and a storage section 7, and the mask is automatically conveyed between respective sections. A mask plate is coated with a photoresist with the device 1, and it is exposed to a prescribed optical pattern with an exposing device, and then, it is developed with the device 2 to complete the mask. It is automatically conveyed between a developing and etching section 29 and a stripping section 31 and also between this section 31 and a washing section 32, and all the conveyances except the exposing process executed between the devices 1 and 2 are automatically operated.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photomask manufacturing device, and the present invention relates to a photomask manufacturing device.
The present invention relates to a photomask manufacturing apparatus that can achieve the same speed as above in seconds.

Photomasks used in the manufacture of semiconductor devices undergo pre-processing processes such as mask plate cleaning, photoresist coating, baling, and storage, and post-processing processes such as photolithographic etching, peeling, cleaning, and storage. The details are shown in Figure IIII. By the way, manufacturing equipment equipped with the pre-treatment and post-treatment equipment mentioned above has been automated for a long time, and most of the work such as cleaning, photoresist coating, baling, dipping, and peeling is done. It is said that it is possible to automate processing without human involvement.

However, with conventional equipment, K has not been achieved until the task of transporting the mask plate between each section such as cleaning, photoresist coating, and beta processing has been automated. Workers must manually move the mask plate between application, application and storage, as well as during post-processing, peeling, peeling and cleaning, and storage. For this reason, I wear a mask every time I do manual work)ti! ! The mask is drawn out from inside the bale rack of the lt shop 11 into the outside air, and dust adheres to the mask plate, causing mask defects and lowering yield. 60,911 ri of conventional mask defects arise from dust adhesion in pre-processing, and 40 ri arise from dust adhesion in post-processing. Furthermore, when moving the mask plate manually as described in 1 above, there is a problem in that the number of personnel attending the apparatus becomes competitive.

In addition, even with conventional traps, some clinics have L5 models that automatically move the mask plate, but this is a pneumatic conveyance system rather than a mechanical one, so the air flow can move the surrounding area. There is a problem in that it raises dust and tends to adhere to the mask VcJ1%.

17 Therefore, an object of the present invention is to automatically transport masks between processing sections by a mechanical method, thereby preventing dust from adhering to masks, reducing mask defects, and increasing the yield of mask manufacturing. At the same time, it is an object of the present invention to provide a photomask manufacturing apparatus that eliminates the need for manual labor by workers and achieves labor savings and improved manufacturing efficiency.

Hereinafter, the apparatus of the present invention will be explained based on the drawings.

No. Sa is an overall configuration diagram of the apparatus of the present invention, where l is a pre-processing device and 2 is a post-processing device. It is a place. Each process is performed while the mask is being transported from the left side to the right side as shown in the diagram.
A photoresist is coated on the pre-processing device 16cJc remask plate, and a predetermined pattern is exposed to light using a photosensitive device (not shown). After that, processing is carried out in the post-processing device SK to complete the mask.

The pretreatment device 1 includes a scrub cleaning section 8, a baking drying section 15 shown in FIG. 8, and a baking drying section 4. Coating s5.1-one @6. A storage section s7 is provided, and the masks are mechanically and automatically transported between the sections. In addition, especially in this example, there is a problem with providing a buffer cassette, such as cleaning, drying, coating, etc.
It is designed so that it can be used independently for baking and storage. That is, in the values of this embodiment, first, the cassette 8 containing a plurality of mask plates M is loaded into the loader ls9Kmill. The loader section 9 is configured to be fed in steps in the downward direction, and the plates M are transferred one by one by vacuum suction.
'C is transported to the Ell loader IO in an adsorbed state. The vacuum suction plate of the transfer is equipped with a normal reciprocating mechanism and an up-and-down movement mechanism, and is transferred at a position above the BIl loader lOL. ℃ It will be lowered by the loader section.
A residual transfer of the mask plate is performed. Of course, the vacuum will turn off just before that. The Ell loader 1O also has a normal reciprocating mechanism and a vertical movement mechanism, and the cleaning section 80 rotates and the spinner 110 transports the mask plate at a higher position and lowers it using the spinner 11, thereby transferring the remaining mask plate. It will be done. The rotary spinner 11 is equipped with a normal up-and-down mechanism, and when it is lowered, it enters the cleaning tank 11 and performs cleaning while spraying cleaning liquid with the rotary brush 1B. After cleaning is completed, the rotary spinner 11 rises and the same E-type loader lO
Plate holder 1 for discarding and vapor drying at the tip of
4Vcf)J. In order to clean both sides of the mask plate, the plate is reversed 180° on a rotary spinner 11 while being vacuum-adsorbed by a plate 180° reversing mechanism 15. This plate 180° reversal mechanism also performs a reciprocating motion, and the plate holder 14 performs a 90' reversal, an up and down movement, and a 90° reversal and a downward movement.
Enter 6. After a predetermined period of time, the mask plate rises again, reverses itself by 90 inches, and the mask plate becomes a horizontal position.Then, in order to convey the carrier l7[j to the rotary spinner 18 of the coating W65, a push-up rod 19 that moves up and down is first machined. ℃ plate holder removed and placed on top.

The carrier 17 operates in a reciprocating motion, a 180" rotation interlocking motion, and a mask plate sandwiching between its claws. As shown in detail in Fig. 4, the carrier 17 can swing around the conveyor body 1A. and spring l?C.

1? A pair of pawls 17F and l? which are engaged with D and connected to each other by the °C lever 17EK. G as air cylinder 1? By operating at H, it can hold and transport L remask spray) M. Then ℃, the effect is that the mask plate on the supply side has claws 17F and 1? With G open, the transport main body 17A approaches from above. Seven sills, claw 17 F, 17
Close the Gt'-C7 cylinder/17HK and chuck the plate. After rising again, it swings at the center 178 and descends at the position of the rotating spinner 18. Next, claws 17F, 17
Open G and play) M is busy on top of spinner 18. The main body 17A swings in the opposite direction to chuck the next plate. After the processing by the spinner 18 is completed, the carrier zO is activated to remove the plate from the ℃ spinner 18. In addition,
The plate is vacuum-adsorbed by the spinner 18, and when the carrier 1710 is operated, the cup rises to prevent interference.One plate is adsorbed by the spinner 18 and rotated while the photoresist is applied. After the coating is completed, the plate is transported to the baking oven 6 by a carrier zO, and transferred to the baking oven transport mechanism 2z while being vacuum-adsorbed by a push-up rod 21 that moves up and down in front of the baking oven.

The interior of the beta furnace consists of a plurality of stages, and the materials are transported after a predetermined time by a transport mechanism 22 consisting of reciprocating motion and vertical motion. The output from the baking oven is transferred to a cassette 25 of an unloader 24 by a vacuum suction transfer 28. The cassette filled with plates is turned 90 degrees,
The plates are placed vertically on a belt conveyor z6 and are fed step by step one after another. The next aerodynamic cellar) 95 is fed into the unloader S using a normal reciprocating empty cassette feeder. An operator can place items on the storage shelf 27 as appropriate.

- As shown in FIG. 2, the post-processing device 2 includes a name print section 28. Current part 29, full exposure part 8
0, a stripping section 81, a cleaning section 8z, and a drying section 88, the details of which are shown in FIG.

Further, in the peeling method, the entire surface is exposed by taking advantage of the characteristics of a positive resist, and then a shallow dipping solution is applied to peel it off. In addition, a cassette set is provided so that it can be used for name printing, shallow dipping, full exposure, peeling, washing and drying.

The loader section 84 is the same as the preprocessing device 1, and the vacuum suction transferer 85 and the carrier are 86% the same. However, after the plate is held by the claws, the carrier 86 rotates 90 degrees and moves forward, and then stops at the name print portion z8. Neno and ri- have letters carved around the disk,
Use a lens to reduce the size and print it. An optical system including the dial and lens moves back and forth to expose a predetermined character onto the mask plate. When the name and exposure are completed, the Yayaria 86 advances further and rotates 90 @ just in front of the shallow dipping/etching cup, and advances again until it comes directly above the rotary spinner 37 and stops. The spinner 87 rises and vacuum-adsorbs the °C plate.
With the carrier 86 returned, a predetermined process of shallow dipping and etching is performed. After etching is completed, the plate will be transferred to the next carrier 88! Then, it is transported to the entire surface exposure section 80. Then, a rotary spinner 89 rises from below and performs vacuum suction at a temperature of 0.degree. C., making one rotation while receiving light over the entire surface of the plate. After completion, the rotary spinner 89 is lowered and placed again on the same carrier. It rotates 90 degrees just before the peeling part 81 and moves further forward to right above the rotary spinner 40. Then, the rotary spinner moves up and vacuum-chucks the plate, and with the carrier 88 returned, a current solution for stripping is applied. The plate that has been completely peeled is placed on another carrier 41 and placed in the EIIC of the cleaning section 8z.
I-da laK is transported. Directly above the E-type loader 4z, the loader is transferred to the E-type loader while being vacuum-adsorbed at 1-°C by a push-up rod 48 that moves up and down. After that, the same cleaning as in the pretreatment device 1 is performed, and the sheets are loaded one by one into the unloader cassette 44 by the vacuum suction transfer 45. In the figure, 46 is a plate +8 (1 degree rotation mechanism, 47 is a spinner. Throughout the figures, B is a buffer cassette.

As described above, the mask of the present invention is made of fI! At L Soga, the designer directly handles the exposure process in the pre-treatment and post-treatment halls, and except for the temperature treatment, the mask plate is automatically transported and processed. Le. In addition, the present invention aims to automate at least the pre-treatment cleaning and coating, coating and storage, and the post-treatment shallow soaking, peeling, peeling, cleaning, and storage, and all processing sections are automated using mechanical methods. Since the mask plate is conveyed using the same method, there is no dust being stirred up, and there is almost no chance of foreign matter adhering to the mask plate.In addition, if the present invention is applied, it is possible to eliminate defects of dll 1 m or more in about 100 yen in the processing process.
．． This was improved from 6/clII to 0.4/d, and in the post-process, we were able to improve the number of 1 μm defects from 04/d to OJ (!I/d). The number of workers has been increased from 15 to 18, and post-processing has been reduced from 18 to 1.
The number of people can be reduced to 0. 1. If the device of the present invention is used,
By improving the mask yield, it is possible to save labor and ultimately make the mask manufacturing efficiency extremely high. In addition, it is important to prevent foreign matter from adhering to the mask, especially afterward 11.
It is also possible to omit conventional procedures such as baking, scum removal, and ultrasonic cleaning.

[Brief explanation of drawings]

Figure 1 is a conventional process diagram, Figure 2 is an overall configuration diagram of the device of the present invention, Figure 8, a3) is a plan view and front view of the pretreatment device,
FIG. 4 is a plan view of some details, and FIG. 1... Pre-processing device, 2... Post-processing! equipment, deceased
- Scrub cleaning section, 4... Vapor drying section, G... Coating section, 6... Baling section, 7... Storage 9 sections, 8... Cassette, 9... Loader section, 17 .20...Carrier, 28...Name print part, 29...Etching part, 80...Full surface exposure part, 81...Peeling part,
82j...Washing section, 88...Drying section, 85, 88.4
1... Keyboard rear, M... Mask plate. Agent Patent Attorney -1) Yuki Toshi -';1, continued on page 10 Inventor Minokuchi Kuruma, 300 Nakai-cho, Ashigarakami-gun, Kanagawa Prefecture Hitachi Electronics Engineering Co., Ltd. Inventor Susumu Yokishi' Kanagawa Hitachi Electronics Engineering Co., Ltd., 30-0 Nakai-cho, Ashigarakami-gun, Prefecture ■Applicant: Hitachi Electronics Engineering Co., Ltd.

Claims (1)

[Scope of Claims] 1. A pre-processing device having processing sections for cleaning, photoresist coating, baking, storage, etc., and printing, printing/etching, and full-surface exposure of the mask plate after exposure. a post-processing device having respective processing sections for stripping, cleaning, drying, and storage; A photomask manufacturing apparatus characterized in that it is capable of automatic conveyance between processing and peeling, between peeling and cleaning, and between storage, and mechanically performs conveyance between all processes.