JPS58118610A - テ−パ状光導波路の製造方法 - Google Patents
テ−パ状光導波路の製造方法Info
- Publication number
- JPS58118610A JPS58118610A JP57001640A JP164082A JPS58118610A JP S58118610 A JPS58118610 A JP S58118610A JP 57001640 A JP57001640 A JP 57001640A JP 164082 A JP164082 A JP 164082A JP S58118610 A JPS58118610 A JP S58118610A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- tapered
- diffusion
- thickness
- optical waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 238000009792 diffusion process Methods 0.000 claims abstract description 23
- 230000005684 electric field Effects 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 15
- 229910021645 metal ion Inorganic materials 0.000 claims description 8
- 229910052709 silver Inorganic materials 0.000 abstract description 8
- 239000004332 silver Substances 0.000 abstract description 8
- 229910052782 aluminium Inorganic materials 0.000 abstract description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 7
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract description 5
- -1 silver ions Chemical class 0.000 abstract description 4
- 230000000903 blocking effect Effects 0.000 abstract description 2
- 239000011521 glass Substances 0.000 abstract description 2
- 239000010409 thin film Substances 0.000 abstract description 2
- 150000001455 metallic ions Chemical class 0.000 abstract 1
- 230000000149 penetrating effect Effects 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 3
- 238000007738 vacuum evaporation Methods 0.000 description 3
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/134—Integrated optical circuits characterised by the manufacturing method by substitution by dopant atoms
- G02B6/1345—Integrated optical circuits characterised by the manufacturing method by substitution by dopant atoms using ion exchange
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57001640A JPS58118610A (ja) | 1982-01-08 | 1982-01-08 | テ−パ状光導波路の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57001640A JPS58118610A (ja) | 1982-01-08 | 1982-01-08 | テ−パ状光導波路の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58118610A true JPS58118610A (ja) | 1983-07-14 |
| JPS6160401B2 JPS6160401B2 (enrdf_load_stackoverflow) | 1986-12-20 |
Family
ID=11507118
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57001640A Granted JPS58118610A (ja) | 1982-01-08 | 1982-01-08 | テ−パ状光導波路の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58118610A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60237405A (ja) * | 1984-05-09 | 1985-11-26 | Nippon Sheet Glass Co Ltd | イオン交換による光学素子の製造方法 |
| JPS6449004A (en) * | 1987-07-28 | 1989-02-23 | Polaroid Corp | Manufacture of tapered waveguide |
| JPH01282511A (ja) * | 1988-05-09 | 1989-11-14 | Brother Ind Ltd | 屈折率分布光カプラ及びその作製法 |
| US5035734A (en) * | 1989-04-13 | 1991-07-30 | Oy Nokia Ab | Method of producing optical waveguides |
| WO2006054302A2 (en) | 2004-11-17 | 2006-05-26 | Color Chip (Israel) Ltd. | Methods and process of tapering waveguides and of forming optimized waveguide structures |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0273012U (enrdf_load_stackoverflow) * | 1988-11-25 | 1990-06-04 | ||
| WO2020255369A1 (ja) * | 2019-06-21 | 2020-12-24 | 株式会社テクノシステム | 自給型ビルシステム及び自給型ビルシステム用のインフラ整備装置 |
-
1982
- 1982-01-08 JP JP57001640A patent/JPS58118610A/ja active Granted
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60237405A (ja) * | 1984-05-09 | 1985-11-26 | Nippon Sheet Glass Co Ltd | イオン交換による光学素子の製造方法 |
| JPS6449004A (en) * | 1987-07-28 | 1989-02-23 | Polaroid Corp | Manufacture of tapered waveguide |
| JPH01282511A (ja) * | 1988-05-09 | 1989-11-14 | Brother Ind Ltd | 屈折率分布光カプラ及びその作製法 |
| US5035734A (en) * | 1989-04-13 | 1991-07-30 | Oy Nokia Ab | Method of producing optical waveguides |
| WO2006054302A2 (en) | 2004-11-17 | 2006-05-26 | Color Chip (Israel) Ltd. | Methods and process of tapering waveguides and of forming optimized waveguide structures |
| JP2008521051A (ja) * | 2004-11-17 | 2008-06-19 | カラー チップ（イスラエル）リミテッド | 導波路のテーパ化及び最適化した導波路構造の形成を行う方法並びにプロセス |
| EP1824794A4 (en) * | 2004-11-17 | 2009-11-11 | Color Chip Israel Ltd | METHOD AND DEVICE FOR RECONCILING WAVE GUIDES AND FOR THE PREPARATION OF OPTIMIZED WAVELINE STRUCTURES |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6160401B2 (enrdf_load_stackoverflow) | 1986-12-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5160523A (en) | Method of producing optical waveguides by an ion exchange technique on a glass substrate | |
| US4203649A (en) | Process for manufacturing an integrated optical structure and an _opto-electronic device using said structure | |
| JPH02293351A (ja) | 光導波路の製造法とそれに使用するイオン交換マスク | |
| JPS58118610A (ja) | テ−パ状光導波路の製造方法 | |
| GB1208962A (en) | Method of fabricating thin films and membranes | |
| EP0261849A1 (en) | Method of forming waveguide lens having refractive index distribution | |
| JPS5842003A (ja) | 偏光板 | |
| US5708750A (en) | Manufacture of a buried wave guide at several burying depths | |
| GB2222465A (en) | Optical waveguide having low light loss | |
| JPS6112241B2 (enrdf_load_stackoverflow) | ||
| US4136212A (en) | Method for the production of light conductor structures with interlaying electrodes | |
| JPS5879203A (ja) | 光導波路の製造方法 | |
| JPS58118609A (ja) | 光導波路の製造方法 | |
| JPS58134609A (ja) | 光導波路の製造方法 | |
| JPS5897005A (ja) | 光導波路の製造方法 | |
| US9494737B2 (en) | Optical waveguide and method for manufacturing same | |
| JPS6066210A (ja) | 光導波路の製造方法 | |
| JPS5921522B2 (ja) | プラスチツククラツド光フアイバの端末処理方法 | |
| JPS58134610A (ja) | 光導波路の製造方法 | |
| JPS5897006A (ja) | 光導波路の製造方法 | |
| JPH0462644B2 (enrdf_load_stackoverflow) | ||
| JPS58118606A (ja) | 光導波路の製造方法 | |
| JPS58118608A (ja) | 光導波路の製造方法 | |
| JPH0251446A (ja) | 光導波路作成方法 | |
| JPS60142304A (ja) | 平面レンズの製造方法 |