JPS58105542A - 電子ビ−ム露光装置のマ−ク検出装置 - Google Patents
電子ビ−ム露光装置のマ−ク検出装置Info
- Publication number
- JPS58105542A JPS58105542A JP20344481A JP20344481A JPS58105542A JP S58105542 A JPS58105542 A JP S58105542A JP 20344481 A JP20344481 A JP 20344481A JP 20344481 A JP20344481 A JP 20344481A JP S58105542 A JPS58105542 A JP S58105542A
- Authority
- JP
- Japan
- Prior art keywords
- mark
- data
- gain
- signal
- waveform signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20344481A JPS58105542A (ja) | 1981-12-18 | 1981-12-18 | 電子ビ−ム露光装置のマ−ク検出装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20344481A JPS58105542A (ja) | 1981-12-18 | 1981-12-18 | 電子ビ−ム露光装置のマ−ク検出装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58105542A true JPS58105542A (ja) | 1983-06-23 |
| JPS6316900B2 JPS6316900B2 (OSRAM) | 1988-04-11 |
Family
ID=16474207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20344481A Granted JPS58105542A (ja) | 1981-12-18 | 1981-12-18 | 電子ビ−ム露光装置のマ−ク検出装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58105542A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59125623A (ja) * | 1982-12-27 | 1984-07-20 | Fujitsu Ltd | 電子ビ−ム露光装置 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0387190U (OSRAM) * | 1989-12-22 | 1991-09-04 |
-
1981
- 1981-12-18 JP JP20344481A patent/JPS58105542A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59125623A (ja) * | 1982-12-27 | 1984-07-20 | Fujitsu Ltd | 電子ビ−ム露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6316900B2 (OSRAM) | 1988-04-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4859814A (en) | Noise cancellation in digitizing system and method | |
| JPH0646550B2 (ja) | 電子ビ−ム定位置照射制御方法および電子ビ−ム定位置照射制御装置 | |
| EP1031812A3 (en) | Measurement apparatus | |
| JPS5585028A (en) | Mark detecting signal amplifier | |
| EP0751644A3 (en) | Control signal detection method with calibration error and subscriber unit therewith | |
| US4880307A (en) | Method of detecting the position of an object | |
| JPS58105542A (ja) | 電子ビ−ム露光装置のマ−ク検出装置 | |
| JPS60168149A (ja) | 位置合わせ信号処理装置 | |
| US6211505B1 (en) | Method and apparatus for checking shape | |
| JPH06309434A (ja) | 画像処理方法及び装置 | |
| JPS5620382A (en) | Information input system using facsimile transmitter | |
| JPS5795628A (en) | Electron beam exposure device | |
| JP3212733B2 (ja) | Ae発生箇所標定装置 | |
| JPS61213613A (ja) | 形状測定装置 | |
| JPH06275487A (ja) | 位置検出装置 | |
| JP2003269927A (ja) | 形状測定装置 | |
| JP2758979B2 (ja) | マーク位置検出方法 | |
| JPS5821328A (ja) | 電子線描画装置 | |
| JPS6039552A (ja) | 渦流探傷装置 | |
| JPH05244515A (ja) | ビデオ信号処理装置 | |
| JPH052111B2 (OSRAM) | ||
| JPH02143106A (ja) | 電子ビーム測長方法および装置 | |
| JPH09196861A (ja) | 紙葉類の汚れ検出装置及び汚れ検出方法 | |
| JPS63142651A (ja) | 基板吸着検知装置 | |
| JP3145449B2 (ja) | 画像読取装置 |