JPS58102446A - In-line type electrode structure - Google Patents

In-line type electrode structure

Info

Publication number
JPS58102446A
JPS58102446A JP19982581A JP19982581A JPS58102446A JP S58102446 A JPS58102446 A JP S58102446A JP 19982581 A JP19982581 A JP 19982581A JP 19982581 A JP19982581 A JP 19982581A JP S58102446 A JPS58102446 A JP S58102446A
Authority
JP
Japan
Prior art keywords
holes
diameter
electrode
electrode structure
openings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19982581A
Other languages
Japanese (ja)
Other versions
JPH0142458B2 (en
Inventor
Kazuaki Naiki
内記 一晃
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP19982581A priority Critical patent/JPS58102446A/en
Publication of JPS58102446A publication Critical patent/JPS58102446A/en
Publication of JPH0142458B2 publication Critical patent/JPH0142458B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48Electron guns
    • H01J29/50Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
    • H01J29/503Three or more guns, the axes of which lay in a common plane

Landscapes

  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To obtain an electrode structure with large-diameter openings easily, without changing the distance between the centered points of the openings, by providing incomplete-circular openings which have a diameter smaller than the distance between the centered points by almost the thickness of the mother plate of the electrode, and the adjacent narrow parts of which are perpendicular to the direction in which the openings are arranged. CONSTITUTION:The closed surface 22 of an electrode structure 2 is provided with central and both-side electron beam holes 21G-21B; the distance (S) between the centered points of the holes 21G-21B are maintained the same as that of the conventional electrode structure, and the holes 21G-21B have a diameter (D) which is smaller than (S) by the thickness (t) of the mother plate of the electrode. The structure 2 is a closed cylindrical body consisting of the closed surface 22 and a cylindrical side part 23 which is continuous with the surface 22, and the circumferences of the holes 21G-21B are surrounded by edges 24 protruding inside the closed cylindrical body. These three holes 21G-21B are incomplete discs each having one or two chords. The width (d) of narrow parts 25 partitioned with the straight lines, are adjusted so that the edges 24 can be easily formed around the holes 21G-21B.

Description

【発明の詳細な説明】 本発明はインライン型カラー受像管用電子銃の主電子レ
ンズ構成電極の改善に関する奄のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in the main electron lens constituent electrode of an in-line color picture tube electron gun.

電子銃の解像J[%性は主として電子レンズの球面収差
に制約され、II4I4解像性特性るには主電子レンズ
を構成する電極日経を大きくして電子しンズの球面収差
を小さくする必要がある。主電子伽 レンズ電極口径はカラー受像管の硝子頚部内径に制限さ
れ、三電子銃が一列配列されたインライン蓋カラー受像
管では主電子レンズ電極口径Fi蝦大でも硝子頚部内径
の173以下となり、電子銃構体設計上何如にこの最大
径に近づけるかが11!な点となりている。
The resolution J[% of the electron gun is mainly limited by the spherical aberration of the electron lens, and in order to obtain the II4I4 resolution characteristics, it is necessary to increase the electrode diameter that makes up the main electron lens to reduce the spherical aberration of the electron lens. There is. The aperture of the main electron lens electrode is limited to the inner diameter of the glass neck of the color picture tube, and in a color picture tube with an in-line lid in which three electron guns are arranged in a row, even if the main electron lens electrode aperture is large, it is 173 or less than the inner diameter of the glass neck. How to approach this maximum diameter in gun structure design is 11! This is a major point.

纂1#7A及び第2図は従来用いられている一体化電極
から形成されたインライン型電子銃の主電子レンズ構成
電極1の一例を示す上面図、儒断面図である。即ち電極
構体lは中央及び両外側電子ビーム透過開孔11G、I
IR,IIBが#1lllt面12に穿設され、閉塞面
12に連続して筒側部13が形成された閉塞筒状体であ
る。上記電子ビーム開孔I#囲は閉塞筒状体内部に央出
する突状縁14で囲まれ、各開孔部に形成されゐ静電電
子レンズの相互影響を防止すると共に閉塞面12を強化
している。こ仁に前者の目的に対しては突状縁14の高
さ鉱大きい・程望ましく、通常は開孔径e)1/8以上
必要とされている。電子ビーム開孔11R,11G11
BC)開孔直径D・は開孔間距離8と開孔相互間に挾ま
れた挾11g15の幅d@によりて制限される。
Collection 1 #7A and FIG. 2 are a top view and a cross-sectional view showing an example of the main electron lens constituent electrode 1 of an in-line electron gun formed from a conventionally used integrated electrode. That is, the electrode structure l has central and both outer electron beam transmission apertures 11G, I
It is a closed cylindrical body in which IR and IIB are bored in the #1llt surface 12 and a cylinder side portion 13 is formed continuously to the closed surface 12. The electron beam aperture I# is surrounded by a protruding edge 14 that protrudes centrally inside the closed cylindrical body, which prevents the mutual influence of the electrostatic electron lenses formed in each aperture and strengthens the closed surface 12. are doing. For the former purpose, it is desirable that the height of the protruding edge 14 be as large as possible, and usually the opening diameter is required to be 1/8 or more. Electron beam aperture 11R, 11G11
BC) The aperture diameter D is limited by the distance 8 between the apertures and the width d@ of the clamp 11g15 sandwiched between the apertures.

上述の徴にインライン撤電子銃主電子レンズの一体化電
極lでは各開孔11R#1IG111B周囲に独立した
三つの突状縁14を形成する加工上の必要から、狭隙部
15の幅d・は或根性以下に小さくすることが出来ず、
これが開孔直径D・を制限する構造上からくる最大の制
約となってぃた6通常電極母材板厚が0.2〜0.4闘
の時、d・は口径り、にかかわらず、 0.9〜1.2
11111iK必要とされている。
In addition to the above-mentioned characteristics, in the integrated electrode l of the main electron lens of the in-line retractable electron gun, the width d of the narrow gap 15 is determined due to the processing necessity of forming three independent protruding edges 14 around each opening 11R#1IG111B. cannot be reduced below a certain level of guts,
This is the biggest structural constraint that limits the aperture diameter D. 6 Normally, when the electrode base material plate thickness is 0.2 to 0.4 mm, d is regardless of the diameter. 0.9-1.2
11111iK is required.

本発明は上記の欠点を除去して開孔間距離を変更するこ
となく開孔直径が大きく出来る電極構体を提供すること
を目的とする1本発明によればインライン配列開孔間距
離よtRlぼ電極母材板要分だけ小さい直径を持ち、隣
接開孔関狭隙部は開孔配列方向と直交する弦を持ち突状
縁で囲まれた不完全円孔状開孔が穿設され1次に狭隙部
を扱いて前記直径を持ち、突状縁で囲まれ走光全円孔状
開孔を形成して開孔間距離を変えることな〈従来よ多大
ロ径−礼を備え九一体化インライン電極構体が得られる
An object of the present invention is to eliminate the above-mentioned drawbacks and provide an electrode structure in which the diameter of the aperture can be increased without changing the distance between the apertures. It has a diameter as small as the electrode base material plate, and the narrow gap between the adjacent apertures has a chord perpendicular to the aperture arrangement direction, and an incompletely circular aperture surrounded by a protruding edge is bored. The narrow gap is treated to form a hole with the above-mentioned diameter, surrounded by a protruding edge, and a light-traveling hole shape, without changing the distance between the holes. An in-line electrode structure is obtained.

以下図面に従がって本発明の詳細な説明する。The present invention will be described in detail below with reference to the drawings.

藤3図、I!4図は本発明の一実施例に基づく籐一段階
に於ける一体化インライン電惚構体2の上面図及び側断
面図である。電極構体2は従来と同一の開孔関距*St
−保っておハSよシミ極母材板厚tだけ小さい直径DC
−ss−t)を持つ九中央及び両外備電子ビーム透過開
孔21G、21R。
Wisteria 3, I! FIG. 4 is a top view and a side sectional view of the integrated in-line electric structure 2 at one stage of rattan according to an embodiment of the present invention. The electrode structure 2 has the same opening distance *St as the conventional one.
-Keep the diameter DC smaller by the thickness of the base material plate t.
-ss-t) with nine central and outer electron beam transmission apertures 21G, 21R.

21Bが閉塞面22に穿設され、閉塞面22に連続して
筒側部23が形成された閉m筒状体であp。
21B is a closed cylindrical body in which a closed surface 22 is bored and a cylindrical side portion 23 is formed continuously from the closed surface 22.

三つの電子ビーム開孔周囲は閉塞筒状体内部に突出する
突状縁24で夫々囲まれている。然るに二つの開孔21
R,21G及び21G、21Bに挾まれ九、狭隙部25
は三つの開孔配列方向と直交する直線部となりているた
め、上記三つの開孔は一つ又は二つの弦を持り九不完全
円孔状となってる。直線で仕切られた挾一部25の暢d
は各開孔周囲に突状縁24が容易に加工形成可能となる
値に選ばれている6次に第5図、第6図の上面図及び1
411#面INK示す橡に、夫々の狭隙部25の両側の
壁25&、25bt−扱くことによル引抜き研磨して、
不完全円孔状開孔21R,21G、21Bt薊配直径D
tNり走光全円孔状開孔とする。挾111M25は扱き
研磨による孔径拡大化によ)最終的に電極母材板R11
1jA置の輪に狭められる。ここでIIk終的に狭隙部
260幅が電極板厚根性に限定される理由はこれ以下で
あると扱き加工時に狭隙部が閉塞面よシミ極内部に引張
られて凹んだヤ、切断されてしまうえめで、これを防止
するためKは機械加工の制約から板厚以上要するえめで
ある。
The three electron beam apertures are each surrounded by a protruding edge 24 projecting into the closed cylindrical body. However, there are two openings 21
R, sandwiched between 21G and 21G, 21B, narrow gap 25
is a straight line that is perpendicular to the arrangement direction of the three apertures, so the three apertures have one or two chords and are in the shape of a nine-perfect circular hole. 25 squares divided by straight lines
is selected to a value that allows the protruding edge 24 to be easily formed around each hole.
411# The walls 25&, 25bt on both sides of the respective narrow gaps 25 are pulled out and polished by handling,
Incomplete circular hole 21R, 21G, 21Bt diameter D
The tN phototracery is made into a circular hole-like aperture. The diameter of the hole was enlarged by handling and polishing the scissors 111M25) Finally, the electrode base material plate R11
It is narrowed to a ring of 1jA. IIk Here, the reason why the width of the narrow gap 260 is ultimately limited to the thickness of the electrode plate is that if it is less than this, the narrow gap will be pulled from the closed surface to the inside of the stain and become dented or cut. In order to prevent this, K requires a thickness greater than the plate thickness due to machining constraints.

!Ks−tの口径を持う九突状縁付不完全円孔が連成さ
れた時は、挾一部26に面し走置線状の突状縁24の1
1g5a、zsbは、材料の延びノ関係から突状縁24
の他の部分よシ高さが低いが。
! When an incomplete circular hole with a nine-shaped rim having a diameter of Ks-t is coupled, one of the protruding edges 24 in the form of a transverse line facing the scissor part 26 is connected.
1g5a and zsb have a protruding edge 24 due to the elongation of the material.
The height is lower than the rest of the body.

扱き加工によりこの部分の壁から引延ばされ、他の部分
と四−高さ以上にすることが可能となる。
The handling allows it to be stretched out from the walls of this section, making it more than four inches taller than the other sections.

かくして電極構体2の開孔は謳5図、第6図に示す橡に
D=s−4ii!IIの直径と円筒製突状縁24を持り
た完全円孔状開孔に拡大される。
Thus, the opening of the electrode structure 2 is D=s-4ii! as shown in FIGS. 5 and 6. It is enlarged to a fully circular aperture with a diameter of II and a cylindrical lip 24.

本実紬例では電極母材板厚0.25111のステンレス
鋼を用いたS:5.1 mの場合、D:5.1−0.3
=48 (1131) とな9.これは従来の同−S僅
のへ二5.1−1.0=4.1(II!I)に対し、直
径が約17−増加であシ、又S = 6.6闘の場合[
) = 6.6−0.3=6.3 (lull)  と
なハ従来のD・=5.5簡に対し約14.5−増に相幽
する。この碌に従来の加工法では狭隙部d・の−は電極
口径り、にかかわらずほぼ一定値以上要してい友ため、
本発明の適用による開孔径拡大化の改醤効果は開孔間距
離が小さいS*着となる。
In this example, when stainless steel with an electrode base material plate thickness of 0.25111 is used, S: 5.1 m, D: 5.1-0.3
=48 (1131) Tona9. This means that the diameter increases by about 17 points compared to the conventional case where S = 5.1 - 1.0 = 4.1 (II!I), and when S = 6.6 [
) = 6.6 - 0.3 = 6.3 (lull), which is about 14.5 points higher than the conventional D = 5.5 points. In conventional processing methods, the narrow gap d/- is required to exceed a certain value regardless of the electrode diameter.
The modification effect of enlarging the diameter of the openings by applying the present invention results in an S* layer with a small distance between the openings.

上述のIIK本発明によれば三つの開孔関距離農を同一
に保つたままで、従来の機械加工上の制約を大輪に緩和
して、電極開孔径を従来より14−以上大匙くしたイン
ライン蓋電極構体が容易に得られる。
According to the above-mentioned IIK invention, while keeping the three aperture distances the same, the conventional machining restrictions are relaxed to a large diameter, and the electrode aperture diameter is increased by 14 tablespoons or more compared to the conventional in-line. A lid electrode structure is easily obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は従来用いられているインライン型電他
構体の上面図、及び側断面図を、第3図。 謳4図は本発明の一1I!施例に基づく部品加工菖前段
階に於けるインライン蓋電極構体の上[ilr図、及び
lIl断面図を纂5図、第6図は本発明の一実一例に基
づく部品加工fIk終段階に於けるインライン製電他構
体の上面図、@断面図を夫々示す、11R*11G、1
1B、21R,21G、21B・・・・・・主電子レン
ズ電極一孔、12.22・・・・・・閉m面、13゜2
3・・・・・・lll1側部、14.24・・・・・・
突状縁、15゜25・・・・・・快■部。
FIGS. 1 and 2 are a top view and a side sectional view of a conventionally used in-line electrical assembly, and FIG. 3 is a side sectional view. Song 4 diagram is part of the present invention! The top of the in-line lid electrode structure at the pre-stage of parts processing based on the embodiment [ilr diagram and lIl cross-sectional view are shown in Figure 5 and Figure 6 at the final stage of parts processing fIk based on an example of the present invention. 11R*11G, 1 showing the top view and cross-sectional view of in-line electrical manufacturing and other structures, respectively.
1B, 21R, 21G, 21B... Main electron lens electrode one hole, 12.22... Closed m-plane, 13°2
3...lll1 side, 14.24...
Projected edge, 15°25...pleasant part.

Claims (1)

【特許請求の範囲】 インライン配列された開孔間距離より電極母材板厚だけ
小さい直径と、tSS開開孔間挾ilsには筒孔配列方
向に直交する弦を持った突状縁で囲まれた三つの不完全
円孔状開孔を穿設し1次に挾腸部弦を扱き研磨すること
Kよシ前記直4%を持うて円筒製突状縁でaすれ九完全
円孔状開孔に形成し◆ 九ことteaとするインライン製電極構体。
[Claims] The diameter is smaller than the distance between the holes arranged in-line by the thickness of the electrode base material, and the tSS open holes are surrounded by a protruding edge with a chord perpendicular to the direction in which the cylindrical holes are arranged. Drill three incomplete circular holes, and then handle and polish the enema part chord. An in-line electrode structure formed with a shaped hole and ◆ nine tea.
JP19982581A 1981-12-11 1981-12-11 In-line type electrode structure Granted JPS58102446A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19982581A JPS58102446A (en) 1981-12-11 1981-12-11 In-line type electrode structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19982581A JPS58102446A (en) 1981-12-11 1981-12-11 In-line type electrode structure

Publications (2)

Publication Number Publication Date
JPS58102446A true JPS58102446A (en) 1983-06-18
JPH0142458B2 JPH0142458B2 (en) 1989-09-12

Family

ID=16414264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19982581A Granted JPS58102446A (en) 1981-12-11 1981-12-11 In-line type electrode structure

Country Status (1)

Country Link
JP (1) JPS58102446A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0157648A2 (en) * 1984-04-04 1985-10-09 Hitachi, Ltd. In-line electron gun for color picture tube

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0157648A2 (en) * 1984-04-04 1985-10-09 Hitachi, Ltd. In-line electron gun for color picture tube

Also Published As

Publication number Publication date
JPH0142458B2 (en) 1989-09-12

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