JPS61259440A - Inline-type electron gun electrode structure - Google Patents

Inline-type electron gun electrode structure

Info

Publication number
JPS61259440A
JPS61259440A JP9910585A JP9910585A JPS61259440A JP S61259440 A JPS61259440 A JP S61259440A JP 9910585 A JP9910585 A JP 9910585A JP 9910585 A JP9910585 A JP 9910585A JP S61259440 A JPS61259440 A JP S61259440A
Authority
JP
Japan
Prior art keywords
electrode
openings
electron gun
inline
electron lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9910585A
Other languages
Japanese (ja)
Inventor
Kazuaki Naiki
内記 一晃
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP9910585A priority Critical patent/JPS61259440A/en
Publication of JPS61259440A publication Critical patent/JPS61259440A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve resolution characteristics of main electron lenses to avoid their convergence change with the passage of time, by making main electron lens openings of an inline electron gun with united electrodes not to be in excess of eccentric distance, and enlarging their effective apertures. CONSTITUTION:Plural electron beam-transmission openings 23R, 23G, and 23B are unitedly formed on an identical electrode blocked surface 25 of an inline-type electron gun structure, to form a blocked cylindrical electrode 2 which serves as a main electron lens composite electrode. The electrode 2 is equipped with elliptical openings 21R, 21G, and 21B, which have short diameter DS approximating to an eccentric distance S between openings, without being in excess of it, and long diameter DL perpendicular to the opening, in the direction of arrangement in which the openings are formed inline on the blocked surface 25. In succession to them, recessed parts comprising spheroid conical surfaces 22R, 22G, and 22B are formed on the blocked surface 25, and cylindrical side part 26 is formed in succession to the blocked surface 25, so that the effective apertures of transmission openings 23R, 23G, and 23B are enlarged to improve resolution characteristics of main electron lens.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はインライン型カラー受像管用電子銃の主電子レ
ンズ構成電極の改善に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an improvement in the main electron lens constituent electrode of an electron gun for an in-line color picture tube.

〔従来の技術〕[Conventional technology]

受像管用電子銃の解像度特性は、主として電子レンズの
球面収差に制約され、高解像度特性を得るためには主電
子レンズを構成する電極口径を大きくして電子レンズの
球面収差を小さくする必要がある。主電子レンズの電極
口径は電子銃が配設される受像管の硝子頚部内径に制限
され、同一平面内から放射された三つの電子ビームが通
過する三つの開孔を一直線上に配列されたインライン型
電子銃では、主電子レンズ電極口径は最大でも硝子頚部
内径の14以下となり、電子銃電極構体設計上如何にこ
の最大径に近づけるかが重要な点となつている。
The resolution characteristics of electron guns for picture tubes are mainly limited by the spherical aberration of the electron lens, and in order to obtain high resolution characteristics, it is necessary to reduce the spherical aberration of the electron lens by increasing the diameter of the electrodes that make up the main electron lens. . The electrode aperture of the main electron lens is limited to the inner diameter of the glass neck of the picture tube in which the electron gun is installed, and three apertures are arranged in a straight line through which three electron beams emitted from the same plane pass. In a type electron gun, the diameter of the main electron lens electrode is at most 14 or less, which is the inner diameter of the glass neck, and it is important to approach this maximum diameter in designing the electron gun electrode structure.

第4図及び第5図はそれぞれ従来用いられている三つの
開孔が同−電極内に穿設された一体化電極から形成され
たインライン型電子銃の主電子し/ズ構成電極1の一例
を示す上面図および断面図である。即ち、電極構体1は
中央及び両外側電子ビーム透過開孔11R,IIG、I
IBが開孔間距離である離心距離Sを保って口径Doで
閉塞面15に穿設され、閉塞面15に連続して部側部1
6が形成された閉塞筒状体である。開孔11R111G
、IIBの周囲は閉塞筒状体内部に突出する突状縁14
で囲まれ、この−組の電極閉塞面を互に対向させて各開
孔部に形成される静電電子レンズの隣接間孔間相互影響
を防止すると共に、閉塞面15を強化している1、特に
電子レンズの相互影響を除くためには突状縁14の高さ
は高い程望ましく、通常は開孔径の1/3以上必要とさ
れているが、開孔径を大きくするにつれて突状縁の高さ
を大きくすることは困難となる。
FIGS. 4 and 5 each show an example of the main electron beam forming electrode 1 of an in-line electron gun, which is formed from an integrated electrode in which three conventionally used apertures are drilled in the same electrode. FIG. That is, the electrode structure 1 has central and both outer electron beam transmission apertures 11R, IIG, and I
IB is drilled in the closed surface 15 with a diameter Do while maintaining the eccentric distance S, which is the distance between the openings, and continues to the closed surface 15 with the part side 1
6 is a closed cylindrical body formed therein. Opening hole 11R111G
, IIB is surrounded by a protruding edge 14 that protrudes into the inside of the closed cylinder.
The electrode closing surfaces of this pair are opposed to each other to prevent mutual influence between adjacent holes of the electrostatic electron lens formed in each opening, and to strengthen the closing surface 15. In particular, in order to eliminate the mutual influence of the electron lens, the higher the height of the protruding edge 14 is, the more desirable it is, and usually it is required to be at least 1/3 of the aperture diameter, but as the aperture diameter increases, the height of the protruding edge 14 increases. It becomes difficult to increase the height.

一方、単に関口径DOを大きくすると、離心圧@Sが大
きくなると共に、電子銃を封止する受像管ネック径を大
きくする必要がある。周知の様に、離心距離の増大は二
電子ビームを螢光面上全域にわたって一点に集中させる
コンバージェンス特性を劣化させ、ネック径の増大は受
像管の所要偏向電力を増大させるので、いずれも望まし
くない。
On the other hand, simply increasing the aperture diameter DO increases the eccentric pressure @S and requires increasing the neck diameter of the picture tube that seals the electron gun. As is well known, an increase in the eccentricity degrades the convergence characteristic of concentrating the two electron beams over the entire area of the fluorescent surface, and an increase in the neck diameter increases the required deflection power of the picture tube, both of which are undesirable. .

従って、主電子レンズの開孔11R,IIG。Therefore, the aperture 11R, IIG of the main electron lens.

11Bの開孔径Doは離心距離Sと開孔間突状縁14に
挾まれたU字状の狭隙部17の幅doによって制限され
ている。
The opening diameter Do of the opening 11B is limited by the eccentric distance S and the width do of the U-shaped narrow gap 17 sandwiched between the opening protruding edges 14.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

最近ではインライン凰電子銃を用いたカラー受像管が一
般化し、電子銃の解像度改善に対する要求、就中高解寧
度ディスプレイとして用いられる場合に、その要求は増
々高まっている。然るに、上述の様にインライン型電子
銃主電子レンズとして通常用いられている一体化電極1
では、各開孔11R,IIG、IIB周囲に独立した三
つの突状縁14を形成する場合に、部品加上の必要から
狭隙部17の幅doは戒程度以下に小さくすることが不
可能であり、これが高解像度化に必要となる開孔径Do
を大きくする上で電極構造上からくる最大の制約となっ
ていた。通常、電極形成母材板厚が0.2〜0.4−の
時、doは開孔径DOにかかわらず0.9〜1.2 w
m程度必要とされている。
Recently, color picture tubes using in-line electron guns have become popular, and the demand for improving the resolution of electron guns, especially when used as high-resolution displays, is increasing. However, as mentioned above, the integrated electrode 1 commonly used as the main electron lens of an in-line type electron gun
In this case, when forming three independent protruding edges 14 around each opening 11R, IIG, and IIB, it is impossible to reduce the width do of the narrow gap 17 to below the predetermined level due to the necessity of machining the parts. This is the aperture diameter Do required for high resolution.
The biggest constraint on increasing the size was due to the electrode structure. Normally, when the electrode forming base material plate thickness is 0.2 to 0.4 -, do is 0.9 to 1.2 w regardless of the opening diameter DO.
About m is required.

本発明は上述の欠点に鑑みてなされたものであり、一体
化電極を備えたインライン型電子銃の主電子レンズ開孔
を開孔間距離である離心距離を犬きくすることなく、そ
の実効的開口径を大きくすることによって主電子レンズ
の解像度特性を向上出来るインライン型電子銃電極構体
を提供するものである。
The present invention has been made in view of the above-mentioned drawbacks, and it is possible to improve the effective The present invention provides an in-line electron gun electrode structure that can improve the resolution characteristics of a main electron lens by increasing the aperture diameter.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、三個の電子ビーム透過開孔が同一電極閉塞面
に一体形成された閉塞筒状体電極を備えたインライン型
電子銃電極構体に於て、閉塞面上では開孔配列方向に離
心距離Sを越えずに、これに近づけた短径と、開孔配列
方向に長径を持った楕円形状を有し、これと連続して閉
塞面を前記楕円を含む回転楕円体状錐面となるように凹
ませて、その端部に同一離心距離Sを保って突状縁付完
全円孔を設けたことを特徴とする。この様に電極を構成
することによって、離心距離Sを越えることなく、又、
隣接開孔狭隙部幅に制限されることなく実効的口径の大
きな電子レンズを形成出来、主電子レンズの解像度特性
を向上出来るインライン型電子銃電極構体を得ることが
出来る。
The present invention provides an in-line electron gun electrode assembly equipped with a closed cylindrical electrode in which three electron beam transmitting apertures are integrally formed on the same electrode closed surface, in which the electrode structure is eccentric in the direction of the aperture arrangement on the closed surface. It has an elliptical shape with a short axis that is close to the distance S without exceeding it, and a long axis in the direction of the arrangement of the holes, and the closed surface that is continuous with this becomes a spheroid-shaped conical surface that includes the ellipse. It is characterized in that it is recessed as shown in FIG. By configuring the electrode in this way, it is possible to avoid exceeding the eccentric distance S, and
It is possible to form an electron lens with a large effective diameter without being limited by the width of the narrow gap between adjacent openings, and to obtain an in-line electron gun electrode structure that can improve the resolution characteristics of the main electron lens.

〔実施例〕〔Example〕

以下、図面を参照して本発明の詳細な説明する。 Hereinafter, the present invention will be described in detail with reference to the drawings.

第1図、第2図は本発明の一実施例に基づく主電子レン
ズ構成電極である閉塞筒状体電極?の斜視図及び側断面
図である。閉塞筒状体電極?は閉塞面25にインライン
配列される開孔配列方向に開孔間離心距離Sを越えずに
これに近づけた短径Dsと、開孔配列方向と直交する方
向に長径DLを持った楕円形状の開孔21R,21G、
21Bを持ち、これと連続して閉塞面25を楕円を含む
回転楕円体からなる錐面22R,22G、22Bとなる
ように凹ませ、その底面近傍に離心距離Sを保って夫々
に突状縁24のついた口径DOの完全円孔23R,23
G、23Bが穿設されている。更に、閉塞面25に連続
して従来と同様に部側部26が形成されている。
1 and 2 are closed cylindrical body electrodes which are main electron lens constituent electrodes based on one embodiment of the present invention. FIG. 2 is a perspective view and a side sectional view. Closed tube electrode? is an elliptical shape having a short axis Ds that is close to but not exceeding the eccentric distance S between the holes in the direction of the hole arrangement arranged inline on the closed surface 25, and a long axis DL in the direction perpendicular to the direction of the hole arrangement. Opening holes 21R, 21G,
21B, the closed surface 25 is continuously concave to become conical surfaces 22R, 22G, and 22B made of a spheroid including an ellipse, and a protruding edge is formed near the bottom surface thereof with an eccentric distance S. Complete circular hole 23R, 23 with diameter DO with 24
G, 23B are drilled. Further, a side portion 26 is formed continuously from the closed surface 25 as in the conventional case.

この様に電極を構成したため、開孔配列方向では開孔間
離心距離Sを越えずにこれに近づけた径Dsを持って開
孔21R,21G、21Bが互いに隣接しても、従来の
所定の高さを持った突状縁で挾まれたU字状狭隙部が存
在しないため、開孔形成の加工上の制約を受けない。従
って開孔21R121G、21Bの短径は離心距離Sに
従来以上に近づけることが可能となる。更に、電極内部
の回転楕円体状錐面に短径Dsより小さい突状縁24の
ついた完全円孔23R,23G、23Bが形成されてい
るため、隣接円孔間距離は従来と同程度となり、突状縁
付円孔の加工上の制約はない。
Because the electrode is configured in this way, even if the holes 21R, 21G, and 21B are adjacent to each other with a diameter Ds that approaches the eccentric distance S between the holes without exceeding it in the hole arrangement direction, the conventional predetermined Since there is no U-shaped narrow gap sandwiched between tall protruding edges, there are no restrictions on the processing of opening formation. Therefore, the short diameters of the openings 21R, 121G, and 21B can be made closer to the eccentric distance S than before. Furthermore, since the complete circular holes 23R, 23G, and 23B with the protruding edge 24 smaller than the minor axis Ds are formed on the conical surface of the spheroid inside the electrode, the distance between adjacent circular holes is about the same as in the conventional case. , there are no restrictions on the processing of circular holes with protruding edges.

一方、開孔配列方向と直交する方向に開孔21R921
G、21Gの長径DI、をとったため、離心距離S以上
にDLを設定出来、従来以上に大口径開孔を形成出来た
ことになる。
On the other hand, the opening 21R921 in the direction perpendicular to the opening arrangement direction.
Since the long axis DI of G and 21G was taken, it was possible to set DL to be greater than the eccentric distance S, and it was possible to form a hole with a larger diameter than before.

ここで第3図に示す様に、前記二組の閉塞筒状体電極2
,2′の閉塞面を互に対向させて電子レンズを形成した
場合を考察してみる。開孔配列方向では三つの開孔21
R,21G、21Bの短径DSは従来以上にSに近い値
を持りて互に隣接しているため、各対向開孔間に形成さ
れる電子レンズは長径方向より短径方向の集束作用が強
くなるが、開孔周囲は回転楕円体状錐面となっているた
め、閉塞面から開孔底面に至る凹状部の深さ変化は長径
方向の方がなだらかとなっている。即ち、互に対向する
二つの閉塞面間の間隔変化は対向開孔間では短径方向よ
り長径方向の方が小さく、形成されるレンズの集束作用
は長径方向の方が短径方向より強くなる。これによって
前述した楕円形状開孔に起因する集束レンズの強さの差
は互に相殺され、更に錐面の底部に突状縁24付の完全
開孔23R,23G、23Bが穿設されている効果が相
加されて、各開孔間に形成されるレンズ電界を回転対称
形状にして非点収差を補正することが可能となる。
Here, as shown in FIG. 3, the two sets of closed cylindrical body electrodes 2
, 2' are opposed to each other to form an electron lens. Three holes 21 in the hole arrangement direction
Since the minor axes DS of R, 21G, and 21B are adjacent to each other and have a value closer to S than before, the electron lens formed between each opposing opening has a focusing effect in the minor axis direction rather than in the major axis direction. However, since the area around the aperture is a spheroidal conical surface, the change in depth of the concave portion from the closed surface to the bottom surface of the aperture is gentler in the long axis direction. In other words, the change in the distance between the two opposing closed surfaces is smaller in the major axis direction than in the minor axis direction between opposing openings, and the focusing effect of the formed lens is stronger in the major axis direction than in the minor axis direction. . As a result, the difference in strength of the focusing lens due to the elliptical aperture described above is canceled out, and furthermore, complete apertures 23R, 23G, and 23B with projecting edges 24 are bored at the bottom of the conical surface. The effects are additive, and it becomes possible to make the lens electric field formed between each aperture a rotationally symmetrical shape and to correct astigmatism.

従って、各開孔間に形成される電子レンズは開孔部が回
転楕円体状錐面となっているため、離心距離Sより大き
な実効的口径DLを持った大口径円孔による電子レンズ
とほぼ等価な電子レンズが形成され、解像度特性を飛躍
的に向上出来る。
Therefore, the electron lens formed between each hole has a conical surface in the shape of a spheroid, so it is almost the same as an electron lens formed by a large-diameter circular hole with an effective diameter DL larger than the eccentric distance S. An equivalent electron lens is formed, and resolution characteristics can be dramatically improved.

更に、三つの開孔短径Dsが離心距離S以上とならない
ため、閉塞筒状体電極の開孔配列方向長径寸法は従来の
電極と比べ余り大きくなることはなく、閉塞筒状体電極
の長径とこれが封止されるネック内壁の影響を受けるコ
ンバージェンスの経時変化も劣化することはない。
Furthermore, since the short axis Ds of the three openings is not greater than the eccentric distance S, the long axis of the closed cylindrical electrode in the direction of the aperture arrangement does not become much larger than that of conventional electrodes, and the long axis of the closed cylindrical electrode The convergence, which is affected by the inner wall of the neck to which it is sealed, does not deteriorate over time.

上述の説明では、三つの開孔の短径、長径を同一とした
が中央と両外側孔とで楕円率を変えてもよく、対向二電
極間で異った値をとってもよい。
In the above description, the short axis and long axis of the three openings are the same, but the ellipticity may be changed between the center and both outer holes, or may take different values between the two opposing electrodes.

又、本構造の電極構体は主電子レンズの集束方式カパイ
・ポテンシャル・フォーカス型、ユニ・ポテンシャル・
フォーカス型、或いは多段集束型等いずれの方式にも適
用出来ることはいうまでもない。
In addition, the electrode structure of this structure uses the main electron lens focusing system Capai potential focus type, uni potential focus type,
Needless to say, it can be applied to any method such as a focus type or a multi-stage focusing type.

〔発明の効果〕〔Effect of the invention〕

以上述べた様に本発明によれば、電極加工上の制約を受
けることなく、耐電圧特性、コンバージェンスの経時変
化特性を劣化させることなく、一体化電極を備えたイン
ライン型電子銃の主電子レンズ開孔を離心距離以上とす
ることなく、その実効的口径を大きくすることによって
主電子レンズの解像度特性を飛躍的に向上出来るインラ
イン型電子銃電極構体が極めて容易に得られる。
As described above, according to the present invention, the main electron lens of an in-line electron gun equipped with an integrated electrode can be used without being subject to restrictions on electrode processing and without deteriorating the withstand voltage characteristics and convergence characteristics over time. By enlarging the effective diameter of the aperture without making the aperture larger than the eccentric distance, an in-line electron gun electrode structure that can dramatically improve the resolution characteristics of the main electron lens can be obtained very easily.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は本発明の一実施例に基づく主電子レン
ズ構成電極である閉塞筒状体電極2の斜視図および側断
面図、第3図は前記二組の閉塞筒状体電極を互に対向さ
せて電子レンズを形成した場合の要部断面図、第4図、
第5図は従来用いらである。 1.2・・・・・・電極、IIR,IIG、 IIB;
 23R。 23G、23B・・・・・・電子ビーム透過開孔、21
 R,21Q21B・・・・・・楕円形状開孔、22R
,22G、22B・・・・・・回転楕円体状錐面、14
,24・・・・・・突状縁、 15゜25・・・・・・
閉塞面、16,26・・・・・・部側部、17・・・・
・・挾隙部。
1 and 2 are a perspective view and a side sectional view of a closed cylindrical body electrode 2 which is a main electron lens constituent electrode according to an embodiment of the present invention, and FIG. 3 is a side sectional view of the two sets of closed cylindrical body electrodes. FIG. 4 is a sectional view of the main parts when an electron lens is formed by facing each other.
FIG. 5 shows the conventional one. 1.2... Electrode, IIR, IIG, IIB;
23R. 23G, 23B... Electron beam transmission aperture, 21
R, 21Q21B... elliptical opening, 22R
, 22G, 22B...Spheroidal conical surface, 14
,24...Protruding edge, 15°25...
Closed surface, 16, 26... part side part, 17...
...Gap area.

Claims (1)

【特許請求の範囲】[Claims] 複数の電子ビーム透過開孔が同一電極閉塞面に一体形成
された閉塞筒状体電極を備えたインライン型電子銃電極
構体に於て、前記閉塞面を、その面上では開孔配列方向
に開孔中心間離心距離を越えることなく、これに近づけ
た短径を持ち、開孔配列方向と直交方向に長径を持った
楕円形状を有し、内方の端部では円孔となるように連続
的に凹ませて電子ビーム透過開孔を形成したことを特徴
とするインライン型電子銃電極構体。
In an in-line electron gun electrode assembly equipped with a closed cylindrical electrode in which a plurality of electron beam transmission apertures are integrally formed on the same electrode closed surface, the closed surface is opened in the direction of the aperture arrangement on that surface. It has an elliptical shape with a short axis close to, but not exceeding, the eccentric distance between the hole centers, and a long axis in the direction perpendicular to the hole arrangement direction, and the inner end is continuous to form a circular hole. An in-line electron gun electrode structure characterized in that it is recessed to form an electron beam transmission aperture.
JP9910585A 1985-05-10 1985-05-10 Inline-type electron gun electrode structure Pending JPS61259440A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9910585A JPS61259440A (en) 1985-05-10 1985-05-10 Inline-type electron gun electrode structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9910585A JPS61259440A (en) 1985-05-10 1985-05-10 Inline-type electron gun electrode structure

Publications (1)

Publication Number Publication Date
JPS61259440A true JPS61259440A (en) 1986-11-17

Family

ID=14238551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9910585A Pending JPS61259440A (en) 1985-05-10 1985-05-10 Inline-type electron gun electrode structure

Country Status (1)

Country Link
JP (1) JPS61259440A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2575143A1 (en) * 2003-09-05 2013-04-03 Carl Zeiss SMT GmbH Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2575143A1 (en) * 2003-09-05 2013-04-03 Carl Zeiss SMT GmbH Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
US8637834B2 (en) 2003-09-05 2014-01-28 Carl Zeiss Microscopy Gmbh Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
US9224576B2 (en) 2003-09-05 2015-12-29 Carl Zeiss Microscopy Gmbh Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
US9673024B2 (en) 2003-09-05 2017-06-06 Applied Materials Israel, Ltd. Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
US10504681B2 (en) 2003-09-05 2019-12-10 Carl Zeiss Microscopy Gmbh Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

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