JPS58100679A - 高融点金属とケイ素とからなるマグネトロンスパッタ用分割タ−ゲット - Google Patents

高融点金属とケイ素とからなるマグネトロンスパッタ用分割タ−ゲット

Info

Publication number
JPS58100679A
JPS58100679A JP19772281A JP19772281A JPS58100679A JP S58100679 A JPS58100679 A JP S58100679A JP 19772281 A JP19772281 A JP 19772281A JP 19772281 A JP19772281 A JP 19772281A JP S58100679 A JPS58100679 A JP S58100679A
Authority
JP
Japan
Prior art keywords
divided
pieces
target according
backing plate
small pieces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19772281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6134509B2 (enExample
Inventor
Toshiaki Fujioka
藤岡　俊昭
Katsuya Okumura
勝弥 奥村
Yoshito Fukube
福辺　義人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Vacuum Metallurgical Co Ltd
Ulvac Inc
Original Assignee
Toshiba Corp
Vacuum Metallurgical Co Ltd
Ulvac Inc
Nihon Shinku Gijutsu KK
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Vacuum Metallurgical Co Ltd, Ulvac Inc, Nihon Shinku Gijutsu KK, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP19772281A priority Critical patent/JPS58100679A/ja
Publication of JPS58100679A publication Critical patent/JPS58100679A/ja
Publication of JPS6134509B2 publication Critical patent/JPS6134509B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP19772281A 1981-12-10 1981-12-10 高融点金属とケイ素とからなるマグネトロンスパッタ用分割タ−ゲット Granted JPS58100679A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19772281A JPS58100679A (ja) 1981-12-10 1981-12-10 高融点金属とケイ素とからなるマグネトロンスパッタ用分割タ−ゲット

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19772281A JPS58100679A (ja) 1981-12-10 1981-12-10 高融点金属とケイ素とからなるマグネトロンスパッタ用分割タ−ゲット

Publications (2)

Publication Number Publication Date
JPS58100679A true JPS58100679A (ja) 1983-06-15
JPS6134509B2 JPS6134509B2 (enExample) 1986-08-08

Family

ID=16379256

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19772281A Granted JPS58100679A (ja) 1981-12-10 1981-12-10 高融点金属とケイ素とからなるマグネトロンスパッタ用分割タ−ゲット

Country Status (1)

Country Link
JP (1) JPS58100679A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166964A (ja) * 1985-01-18 1986-07-28 Tokuda Seisakusho Ltd スパツタリング用タ−ゲツト
JPS6475673A (en) * 1987-09-17 1989-03-22 Fujitsu Ltd Composite sputter target
EP0489396A1 (de) * 1990-12-06 1992-06-10 Multi-Arc Oberflächentechnik GmbH Segmentierte Kathode für Lichtbogenbeschichtungsverfahren

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166964A (ja) * 1985-01-18 1986-07-28 Tokuda Seisakusho Ltd スパツタリング用タ−ゲツト
JPS6475673A (en) * 1987-09-17 1989-03-22 Fujitsu Ltd Composite sputter target
EP0489396A1 (de) * 1990-12-06 1992-06-10 Multi-Arc Oberflächentechnik GmbH Segmentierte Kathode für Lichtbogenbeschichtungsverfahren

Also Published As

Publication number Publication date
JPS6134509B2 (enExample) 1986-08-08

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