JPS5795536A - Apparatus for preparing work environment for manufacturing integrated circuits or the like - Google Patents

Apparatus for preparing work environment for manufacturing integrated circuits or the like

Info

Publication number
JPS5795536A
JPS5795536A JP55171909A JP17190980A JPS5795536A JP S5795536 A JPS5795536 A JP S5795536A JP 55171909 A JP55171909 A JP 55171909A JP 17190980 A JP17190980 A JP 17190980A JP S5795536 A JPS5795536 A JP S5795536A
Authority
JP
Japan
Prior art keywords
air
cooling coil
outlet port
filter
integrated circuits
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55171909A
Other languages
Japanese (ja)
Other versions
JPS649539B2 (en
Inventor
Takayoshi Hashimoto
Takahito Hayakawa
Tatae Yoshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Takasago Thermal Engineering Co Ltd
Original Assignee
Takasago Thermal Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Takasago Thermal Engineering Co Ltd filed Critical Takasago Thermal Engineering Co Ltd
Priority to JP55171909A priority Critical patent/JPS5795536A/en
Publication of JPS5795536A publication Critical patent/JPS5795536A/en
Publication of JPS649539B2 publication Critical patent/JPS649539B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24FAIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Central Air Conditioning (AREA)
  • Ventilation (AREA)

Abstract

PURPOSE:To increase the efficiency of operation and to facilitate maintenance and inspection to various apparatus employed in a line for manufacturing integrated circuits or the like, by enabling to prepare a dustless, constant-temperature and constant- humidity environment with high accuracy for a unit work space in the manufacturing line without forming a chamber. CONSTITUTION:In a screen-like casing 1, there are provided an air outlet port 2 made of a vertical porous plate having a sufficient area for covering the longitudinal section of a unit work space for a manufacturing line and a HEPA filter 3 disposed at the back of the outlet port 2. At the back of the filter 3, there is further provided a pressure equalizing, hollow space 4 to which air is supplied from a fan 5. Further, in an air passage including an air inlet port 6 for the fan 5, there are provided a direct expansion type cooling coil 7. electric heater 8 and refrigerator 9 for the cooling coil 7. With such an arrangement, air drawn from the inlet port 6 is super-cooled by the cooling coil 7 and heated to a predetermined temperature by the heater 8. Then, air controlled to the predetermined temperature is blown out from the outlet port 2 into a transparent hood 16 through the filter 3.
JP55171909A 1980-12-05 1980-12-05 Apparatus for preparing work environment for manufacturing integrated circuits or the like Granted JPS5795536A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55171909A JPS5795536A (en) 1980-12-05 1980-12-05 Apparatus for preparing work environment for manufacturing integrated circuits or the like

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55171909A JPS5795536A (en) 1980-12-05 1980-12-05 Apparatus for preparing work environment for manufacturing integrated circuits or the like

Publications (2)

Publication Number Publication Date
JPS5795536A true JPS5795536A (en) 1982-06-14
JPS649539B2 JPS649539B2 (en) 1989-02-17

Family

ID=15932069

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55171909A Granted JPS5795536A (en) 1980-12-05 1980-12-05 Apparatus for preparing work environment for manufacturing integrated circuits or the like

Country Status (1)

Country Link
JP (1) JPS5795536A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6054142U (en) * 1983-09-20 1985-04-16 日本電気株式会社 Chamber for alignment exposure device
JPS61122433A (en) * 1984-11-19 1986-06-10 Takasago Thermal Eng Co Ltd Clean and dry bench
JPS6293625U (en) * 1985-12-02 1987-06-15
EP1026450A1 (en) * 1997-09-24 2000-08-09 Daikin Industries, Ltd. Low-humidity working apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5319661A (en) * 1976-08-09 1978-02-23 Takasago Thermal Eng Co Lts Air conditioner in clean room

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5319661A (en) * 1976-08-09 1978-02-23 Takasago Thermal Eng Co Lts Air conditioner in clean room

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6054142U (en) * 1983-09-20 1985-04-16 日本電気株式会社 Chamber for alignment exposure device
JPS61122433A (en) * 1984-11-19 1986-06-10 Takasago Thermal Eng Co Ltd Clean and dry bench
JPH0461251B2 (en) * 1984-11-19 1992-09-30 Takasago Thermal Engineering
JPS6293625U (en) * 1985-12-02 1987-06-15
JPH0533856Y2 (en) * 1985-12-02 1993-08-27
EP1026450A1 (en) * 1997-09-24 2000-08-09 Daikin Industries, Ltd. Low-humidity working apparatus
EP1026450A4 (en) * 1997-09-24 2002-05-29 Daikin Ind Ltd Low-humidity working apparatus

Also Published As

Publication number Publication date
JPS649539B2 (en) 1989-02-17

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