JPS5792835A - Detection of etching finishing point and device thereof - Google Patents

Detection of etching finishing point and device thereof

Info

Publication number
JPS5792835A
JPS5792835A JP16804580A JP16804580A JPS5792835A JP S5792835 A JPS5792835 A JP S5792835A JP 16804580 A JP16804580 A JP 16804580A JP 16804580 A JP16804580 A JP 16804580A JP S5792835 A JPS5792835 A JP S5792835A
Authority
JP
Japan
Prior art keywords
light
etching
light quantity
finishing point
signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16804580A
Other languages
Japanese (ja)
Inventor
Toru Koizumi
Yoshikazu Tanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16804580A priority Critical patent/JPS5792835A/en
Publication of JPS5792835A publication Critical patent/JPS5792835A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching

Abstract

PURPOSE:To enable to detect always the etching finishing point precisely by a method wherein the etching finishing point is detected by detecting reflected light quantity or transmitted light quantity of light irradiated to an original plate of mask to be etched. CONSTITUTION:When light is irradiated onto the original plate of mask from the light emitting part 8, reflected light therefrom is detected by the light receiving part 11, and a light quantity signal is sent out to a comparator circuit 12. When etching of a chromium film 2b is advanced according to the progress of etching, the area of surface of the film 2b is reduced gradually, and light quantity of reflected light is reduced gradually being in proportion thereto. The light quantity signal sent from the light receiving part 11 is reduced correspondingly according to the reduction of light quantity, and becomes to have the value being close to the reference signal by approaching to the finishing point. The optical signal thereof is compared with a signal of the reference signal source 13 in the comparator circuit 12, and when the light quantity signal reached within the range of error, it is judged as the finishing point of etching.
JP16804580A 1980-12-01 1980-12-01 Detection of etching finishing point and device thereof Pending JPS5792835A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16804580A JPS5792835A (en) 1980-12-01 1980-12-01 Detection of etching finishing point and device thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16804580A JPS5792835A (en) 1980-12-01 1980-12-01 Detection of etching finishing point and device thereof

Publications (1)

Publication Number Publication Date
JPS5792835A true JPS5792835A (en) 1982-06-09

Family

ID=15860797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16804580A Pending JPS5792835A (en) 1980-12-01 1980-12-01 Detection of etching finishing point and device thereof

Country Status (1)

Country Link
JP (1) JPS5792835A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4479848A (en) * 1983-02-14 1984-10-30 Hitachi, Ltd. Etching method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4479848A (en) * 1983-02-14 1984-10-30 Hitachi, Ltd. Etching method and apparatus

Similar Documents

Publication Publication Date Title
EP0372748A3 (en) Fingerprint-detecting device
WO1990013000A1 (en) Projection/exposure device and projection/exposure method
JPS56168104A (en) Detector for mark position
JPS5792835A (en) Detection of etching finishing point and device thereof
JPS5630630A (en) Foreign matter detector
JPS57118106A (en) Measuring device for film thickness of thick film hybrid ic or the like
JPS5462833A (en) Controlling method of original exposure
JPS54140532A (en) Automatic focus adjustor
JPS5412488A (en) Method of detecting drum flange hole position
JPS5789474A (en) Detection of final point of etching and apparatus therefor
JPS5337457A (en) Distance measuring device
JPS57152570A (en) Recording disk detecting device
JPS55117945A (en) Defect detection unit
JPS57148239A (en) Detecting method for wiring pattern of printed circuit board
JPS54136888A (en) Surface defect detecting device
JPS5562301A (en) Optical detecting device
JPS57207807A (en) Signal stabilizing method of pattern detecting device
JPS5420742A (en) Concentration detecting method of developer
JPS5710171A (en) Original size detecting method of copying machine
JPS6416178A (en) Automatic focusing device
JPS56128406A (en) Checking method for chamfering defect of outside face of tube with screw
JPS53127990A (en) Travelling body controller
JPS56130606A (en) Optical measuring device for thickness of transparent material
JPS5530627A (en) Wire diameter meter
JPS55154579A (en) Etching method