JPS5789474A - Detection of final point of etching and apparatus therefor - Google Patents

Detection of final point of etching and apparatus therefor

Info

Publication number
JPS5789474A
JPS5789474A JP16330380A JP16330380A JPS5789474A JP S5789474 A JPS5789474 A JP S5789474A JP 16330380 A JP16330380 A JP 16330380A JP 16330380 A JP16330380 A JP 16330380A JP S5789474 A JPS5789474 A JP S5789474A
Authority
JP
Japan
Prior art keywords
light
etching
final point
reflected
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16330380A
Other languages
Japanese (ja)
Inventor
Toru Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16330380A priority Critical patent/JPS5789474A/en
Publication of JPS5789474A publication Critical patent/JPS5789474A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To assuredly detect the final point of etching a masking plate, by detecting the final point of etching on the basis of the ratio of the quantity of irradiation light regularly reflected from the masking plate to that of irregularly reflected light. CONSTITUTION:A masking plate 2 is rotated in a unitary body by rotation of a spinner 1, and an etching solution is sprayed through a nozzle 8 to etch a chromium film 2b on the surface of the plate 2 into a desired pattern. Light is irradiated onto the plate 2 from a light irradiation part 9 at the same time when etching is started. Light IR' reflected from the surface of the film 2b is received by the first light receiver 13 to detect its quantity. Light IS' reflected from a side surface 2c is irregularly reflected along various directions because the side surface 2c is in a rugged state and partially received by the second light receiver 16 to detect its quantity. The ratio IS/IR of the two light quantities is calculated by an operation circuit 17. When the ratio comes in the error range of the reference signal of a reference signal source 19, a comparing circuit 18 detects the final point of etching, so that a control circuit 5 closes the nozzle 8 through a nozzle closing and opening circuit 4.
JP16330380A 1980-11-21 1980-11-21 Detection of final point of etching and apparatus therefor Pending JPS5789474A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16330380A JPS5789474A (en) 1980-11-21 1980-11-21 Detection of final point of etching and apparatus therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16330380A JPS5789474A (en) 1980-11-21 1980-11-21 Detection of final point of etching and apparatus therefor

Publications (1)

Publication Number Publication Date
JPS5789474A true JPS5789474A (en) 1982-06-03

Family

ID=15771258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16330380A Pending JPS5789474A (en) 1980-11-21 1980-11-21 Detection of final point of etching and apparatus therefor

Country Status (1)

Country Link
JP (1) JPS5789474A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5986222A (en) * 1982-11-10 1984-05-18 Toshiba Corp Dry etching method
JPS59147433A (en) * 1983-02-14 1984-08-23 Hitachi Ltd Etching device
JPH0272623A (en) * 1988-09-07 1990-03-12 Tokyo Electron Ltd Termination detection method
US6193900B1 (en) * 1997-11-29 2001-02-27 Electronics And Telecommunications Research Institute Method for sensing etch of distributed bragg reflector in real time
JP2014022411A (en) * 2012-07-12 2014-02-03 Research Institute Of Nanophotonics Etching method using near-field light

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5986222A (en) * 1982-11-10 1984-05-18 Toshiba Corp Dry etching method
JPS59147433A (en) * 1983-02-14 1984-08-23 Hitachi Ltd Etching device
JPH0546095B2 (en) * 1983-02-14 1993-07-13 Hitachi Ltd
JPH0272623A (en) * 1988-09-07 1990-03-12 Tokyo Electron Ltd Termination detection method
US6193900B1 (en) * 1997-11-29 2001-02-27 Electronics And Telecommunications Research Institute Method for sensing etch of distributed bragg reflector in real time
JP2014022411A (en) * 2012-07-12 2014-02-03 Research Institute Of Nanophotonics Etching method using near-field light

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