JPS5789755A - Stripping agent used for water-soluble photoresist and its use method - Google Patents

Stripping agent used for water-soluble photoresist and its use method

Info

Publication number
JPS5789755A
JPS5789755A JP55165264A JP16526480A JPS5789755A JP S5789755 A JPS5789755 A JP S5789755A JP 55165264 A JP55165264 A JP 55165264A JP 16526480 A JP16526480 A JP 16526480A JP S5789755 A JPS5789755 A JP S5789755A
Authority
JP
Japan
Prior art keywords
range
photoresist
hexamethylphosphoramide
water
agent used
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55165264A
Other languages
Japanese (ja)
Other versions
JPS6310823B2 (en
Inventor
Shozo Miyazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP55165264A priority Critical patent/JPS5789755A/en
Publication of JPS5789755A publication Critical patent/JPS5789755A/en
Publication of JPS6310823B2 publication Critical patent/JPS6310823B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To strip a water-soluble photoresist, by using hexamethyl-phosphoramide. CONSTITUTION:A photoresist plate with an image formed is immersed in an aqueous solution containing hexamethylphosphoramide represented by the chemical formula (I) and further, when needed, periodate and a surfactant, and treated in 40-90 deg.C temperature range. Hexamethylphosphoramide is contained in 1-10wt% range. The action is smaller below this range, but it is not so much raised above this range. The periodate and the surfactant enhance wettability and diffusibility, shorten the treatment time, and reduce an amount of hexamethylphosphoramide to be used. The photoresist may be removed by coating this solution and rubbing it with a brush, but the immersion method is much easier. This solution does not corrode a metal, and its operation is out of danger.
JP55165264A 1980-11-26 1980-11-26 Stripping agent used for water-soluble photoresist and its use method Granted JPS5789755A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55165264A JPS5789755A (en) 1980-11-26 1980-11-26 Stripping agent used for water-soluble photoresist and its use method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55165264A JPS5789755A (en) 1980-11-26 1980-11-26 Stripping agent used for water-soluble photoresist and its use method

Publications (2)

Publication Number Publication Date
JPS5789755A true JPS5789755A (en) 1982-06-04
JPS6310823B2 JPS6310823B2 (en) 1988-03-09

Family

ID=15809019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55165264A Granted JPS5789755A (en) 1980-11-26 1980-11-26 Stripping agent used for water-soluble photoresist and its use method

Country Status (1)

Country Link
JP (1) JPS5789755A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61124589A (en) * 1984-11-17 1986-06-12 Daikin Ind Ltd Composition for etching agent

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61124589A (en) * 1984-11-17 1986-06-12 Daikin Ind Ltd Composition for etching agent

Also Published As

Publication number Publication date
JPS6310823B2 (en) 1988-03-09

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