JPS5787135A - Manufacture of semiconductor - Google Patents
Manufacture of semiconductorInfo
- Publication number
- JPS5787135A JPS5787135A JP16379480A JP16379480A JPS5787135A JP S5787135 A JPS5787135 A JP S5787135A JP 16379480 A JP16379480 A JP 16379480A JP 16379480 A JP16379480 A JP 16379480A JP S5787135 A JPS5787135 A JP S5787135A
- Authority
- JP
- Japan
- Prior art keywords
- sio23
- in2o32
- etching
- layer
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000010410 layer Substances 0.000 abstract 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract 4
- 238000005530 etching Methods 0.000 abstract 4
- 239000007788 liquid Substances 0.000 abstract 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract 2
- 239000011521 glass Substances 0.000 abstract 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16379480A JPS5787135A (en) | 1980-11-20 | 1980-11-20 | Manufacture of semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16379480A JPS5787135A (en) | 1980-11-20 | 1980-11-20 | Manufacture of semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5787135A true JPS5787135A (en) | 1982-05-31 |
| JPH0117246B2 JPH0117246B2 (enrdf_load_stackoverflow) | 1989-03-29 |
Family
ID=15780821
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16379480A Granted JPS5787135A (en) | 1980-11-20 | 1980-11-20 | Manufacture of semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5787135A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61134070A (ja) * | 1984-12-05 | 1986-06-21 | Matsushita Electric Ind Co Ltd | 薄膜トランジスタアレイ |
| JP2009088098A (ja) * | 2007-09-28 | 2009-04-23 | Sharp Corp | 誘電体膜のパターニング方法 |
-
1980
- 1980-11-20 JP JP16379480A patent/JPS5787135A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61134070A (ja) * | 1984-12-05 | 1986-06-21 | Matsushita Electric Ind Co Ltd | 薄膜トランジスタアレイ |
| JP2009088098A (ja) * | 2007-09-28 | 2009-04-23 | Sharp Corp | 誘電体膜のパターニング方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0117246B2 (enrdf_load_stackoverflow) | 1989-03-29 |
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