JPS5784743A - Plasma cvd method and apparatus therefor - Google Patents

Plasma cvd method and apparatus therefor

Info

Publication number
JPS5784743A
JPS5784743A JP55162201A JP16220180A JPS5784743A JP S5784743 A JPS5784743 A JP S5784743A JP 55162201 A JP55162201 A JP 55162201A JP 16220180 A JP16220180 A JP 16220180A JP S5784743 A JPS5784743 A JP S5784743A
Authority
JP
Japan
Prior art keywords
voltage
current
high frequency
phase difference
detected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55162201A
Other languages
English (en)
Inventor
Kanetake Takasaki
Kenji Koyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP55162201A priority Critical patent/JPS5784743A/ja
Publication of JPS5784743A publication Critical patent/JPS5784743A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
JP55162201A 1980-11-18 1980-11-18 Plasma cvd method and apparatus therefor Pending JPS5784743A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55162201A JPS5784743A (en) 1980-11-18 1980-11-18 Plasma cvd method and apparatus therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55162201A JPS5784743A (en) 1980-11-18 1980-11-18 Plasma cvd method and apparatus therefor

Publications (1)

Publication Number Publication Date
JPS5784743A true JPS5784743A (en) 1982-05-27

Family

ID=15749894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55162201A Pending JPS5784743A (en) 1980-11-18 1980-11-18 Plasma cvd method and apparatus therefor

Country Status (1)

Country Link
JP (1) JPS5784743A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6164123A (ja) * 1984-09-06 1986-04-02 Matsushita Electric Ind Co Ltd プラズマ化学気相堆積方法
JPS6454700A (en) * 1987-08-25 1989-03-02 Fujitsu Ltd High frequency power source output monitor circuit for plasma treatment device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6164123A (ja) * 1984-09-06 1986-04-02 Matsushita Electric Ind Co Ltd プラズマ化学気相堆積方法
JPS6454700A (en) * 1987-08-25 1989-03-02 Fujitsu Ltd High frequency power source output monitor circuit for plasma treatment device

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