JPS5778137A - Bake furnace - Google Patents
Bake furnaceInfo
- Publication number
- JPS5778137A JPS5778137A JP15375380A JP15375380A JPS5778137A JP S5778137 A JPS5778137 A JP S5778137A JP 15375380 A JP15375380 A JP 15375380A JP 15375380 A JP15375380 A JP 15375380A JP S5778137 A JPS5778137 A JP S5778137A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- furnace
- electrodes
- charge
- foreign material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To prevent the adherence of a foreign material to a resist pattern or the like by producing an electric field with a high DC voltage, eliminating dusts in a furnace, then charging a wafer in the furnace, charging flowing gas and neutralizing and removing the charge of the wafer. CONSTITUTION:A dust collector 5 and a static eliminator 6 are arranged in a bake furnace 1, for example, for a resist coated wafer. The dust collector 5 produces an electric field in the furnace by applying a DC voltage to a pair of electrodes 7, 8 arranged at the upper and lower positions to charge floating dusts or the like and to attract them to the electrodes 7, 8. After the dusts are removed in the furnace by this treatment, the electrodes 7, 8 are removed, and a wafer is set on a placing base 2. Subsequently, the power source 14 of a current collector 6 is energized to inject gas from a nozzle 17 to negatively charge gas particles by ions produced between the electrodes 12 and 13. This charged gas is blown to the wafer attracting foreign material on the surface to neutralize the charge of the wafer and to remove the attracted foreign material. In this manner, the quality of machining a pattern can be improved.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15375380A JPS5778137A (en) | 1980-11-04 | 1980-11-04 | Bake furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15375380A JPS5778137A (en) | 1980-11-04 | 1980-11-04 | Bake furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5778137A true JPS5778137A (en) | 1982-05-15 |
Family
ID=15569361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15375380A Pending JPS5778137A (en) | 1980-11-04 | 1980-11-04 | Bake furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5778137A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011044553A (en) * | 2009-08-20 | 2011-03-03 | Tokyo Electron Ltd | Heating treatment apparatus, and temperature treatment apparatus |
| JP2017092488A (en) * | 2016-12-28 | 2017-05-25 | 大日本印刷株式会社 | Imprint device |
-
1980
- 1980-11-04 JP JP15375380A patent/JPS5778137A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011044553A (en) * | 2009-08-20 | 2011-03-03 | Tokyo Electron Ltd | Heating treatment apparatus, and temperature treatment apparatus |
| JP2017092488A (en) * | 2016-12-28 | 2017-05-25 | 大日本印刷株式会社 | Imprint device |
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