JPS5768835A - Exposure device for photoengraving - Google Patents

Exposure device for photoengraving

Info

Publication number
JPS5768835A
JPS5768835A JP55145490A JP14549080A JPS5768835A JP S5768835 A JPS5768835 A JP S5768835A JP 55145490 A JP55145490 A JP 55145490A JP 14549080 A JP14549080 A JP 14549080A JP S5768835 A JPS5768835 A JP S5768835A
Authority
JP
Japan
Prior art keywords
exposure
stage
semiconductor substrate
temperature
giving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55145490A
Other languages
Japanese (ja)
Inventor
Takayuki Matsukawa
Nobufumi Komori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP55145490A priority Critical patent/JPS5768835A/en
Publication of JPS5768835A publication Critical patent/JPS5768835A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To easily remove an exposure distortion, by providing a means for giving a controlled local temperature distribution, extending over the whole surface of a stage for adsorbing and fixing a semiconductor substrate. CONSTITUTION:A resist 3 is applied on the surface of a semiconductor substrate 2 which is vacuum-adsorbed on a stage 1 held in sufficient flatness, exposure is executed by parallel light beams 6 which have passed through a mask substrate 4, and on the inside of the stage 1, a temperature controller 7 consisting of a hole formed in a reverse U-shape from the reverse side is formed at prescribed internal positins. When a fluid kept in a constant temperature is made to flow into each temperature controller 7, a temperature of each part of the state 1 is controlled optionally, and exposure is executed by giving a suitable temperature distribution to the semiconductor substrate 2. In this way, a desired pattern having scarcely distortion is transferred.
JP55145490A 1980-10-16 1980-10-16 Exposure device for photoengraving Pending JPS5768835A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55145490A JPS5768835A (en) 1980-10-16 1980-10-16 Exposure device for photoengraving

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55145490A JPS5768835A (en) 1980-10-16 1980-10-16 Exposure device for photoengraving

Publications (1)

Publication Number Publication Date
JPS5768835A true JPS5768835A (en) 1982-04-27

Family

ID=15386461

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55145490A Pending JPS5768835A (en) 1980-10-16 1980-10-16 Exposure device for photoengraving

Country Status (1)

Country Link
JP (1) JPS5768835A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63200090A (en) * 1987-02-16 1988-08-18 キヤノン株式会社 Semiconductor exposure device
KR19980020620A (en) * 1996-09-10 1998-06-25 김광호 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63200090A (en) * 1987-02-16 1988-08-18 キヤノン株式会社 Semiconductor exposure device
KR19980020620A (en) * 1996-09-10 1998-06-25 김광호 Semiconductor device manufacturing apparatus and semiconductor device manufacturing method using the same

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