JPS5759672A - Formation of coating resin film - Google Patents
Formation of coating resin filmInfo
- Publication number
- JPS5759672A JPS5759672A JP13376580A JP13376580A JPS5759672A JP S5759672 A JPS5759672 A JP S5759672A JP 13376580 A JP13376580 A JP 13376580A JP 13376580 A JP13376580 A JP 13376580A JP S5759672 A JPS5759672 A JP S5759672A
- Authority
- JP
- Japan
- Prior art keywords
- film
- coating film
- polysilsesquioxane
- adhesiveness
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Paints Or Removers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
PURPOSE: To enhance the mechanical strength of a coating film and the adhesiveness of the film to a coated substrate, by using polysilsesquioxane as an organic insulating coating film to be used in a semiconductor productiopn process, and irradiating the film with ion beam.
CONSTITUTION: Polysilsesquioxane dissolved in a mixed solvent comprising isophorone and toluene in a rate of 3:7 is applied as an insulating material between wires of a semiconductive device or the like. AFter dried, the applied film is heattreated for one hour at a relatively lower temperature of about 100°C in a nitrogen atmosphere to form an insulating film having a thickness of bout 1.0μ. Finally proton beams are applied for a few seconds with an energy of 100keV along a direction nearly vertical to the coating film. As a result, the coating film is improved in its hardness and strength as well as its adhesiveness to the semiconductor.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13376580A JPS5914263B2 (en) | 1980-09-26 | 1980-09-26 | Method of forming resin coating film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13376580A JPS5914263B2 (en) | 1980-09-26 | 1980-09-26 | Method of forming resin coating film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5759672A true JPS5759672A (en) | 1982-04-10 |
JPS5914263B2 JPS5914263B2 (en) | 1984-04-03 |
Family
ID=15112427
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13376580A Expired JPS5914263B2 (en) | 1980-09-26 | 1980-09-26 | Method of forming resin coating film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5914263B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
-
1980
- 1980-09-26 JP JP13376580A patent/JPS5914263B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
Also Published As
Publication number | Publication date |
---|---|
JPS5914263B2 (en) | 1984-04-03 |
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