JPS5759356A - Structure of multilayer wiring - Google Patents
Structure of multilayer wiringInfo
- Publication number
- JPS5759356A JPS5759356A JP13442080A JP13442080A JPS5759356A JP S5759356 A JPS5759356 A JP S5759356A JP 13442080 A JP13442080 A JP 13442080A JP 13442080 A JP13442080 A JP 13442080A JP S5759356 A JPS5759356 A JP S5759356A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- layer wiring
- lower layer
- mask
- contact hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE:To prevent the generation of disconnection by obviating the simultaneous etching of lower layer wiring at a contact hole section, etc. of a layer insulating film due to the displacement of a mask at the time of etching the upper layer wiring of the multilayer wiring formed onto a semiconductor substrate. CONSTITUTION:A conductive etching preventive film in Mo, etc., which are not eroded by an etching liquid of aluminum, is shaped onto the lower layer wiring 13 in aluminum, etc. formed on an insulating layer 2 coating the semiconductor substrate. When etching the upper layer wiring 5 connected to the lower layer wiring through the contact hole 6 shaped to the insulating film 4 while using a photoresist 7 as a mask, the lower layer wiring 13 is not etched because of the existence of the etching preventive film 10 even when one part of the lower layer wiring is exposed due to the displacement of the mask. The etching preventive film may be formed onto the insulating film 4 after shaping the contact hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13442080A JPS5759356A (en) | 1980-09-29 | 1980-09-29 | Structure of multilayer wiring |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13442080A JPS5759356A (en) | 1980-09-29 | 1980-09-29 | Structure of multilayer wiring |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5759356A true JPS5759356A (en) | 1982-04-09 |
Family
ID=15127965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13442080A Pending JPS5759356A (en) | 1980-09-29 | 1980-09-29 | Structure of multilayer wiring |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5759356A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08115980A (en) * | 1994-10-14 | 1996-05-07 | Nec Corp | Manufacture of semiconductor device |
-
1980
- 1980-09-29 JP JP13442080A patent/JPS5759356A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08115980A (en) * | 1994-10-14 | 1996-05-07 | Nec Corp | Manufacture of semiconductor device |
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