JPS5759327A - Method for variable rectangular electron beam exposure - Google Patents
Method for variable rectangular electron beam exposureInfo
- Publication number
- JPS5759327A JPS5759327A JP13455180A JP13455180A JPS5759327A JP S5759327 A JPS5759327 A JP S5759327A JP 13455180 A JP13455180 A JP 13455180A JP 13455180 A JP13455180 A JP 13455180A JP S5759327 A JPS5759327 A JP S5759327A
- Authority
- JP
- Japan
- Prior art keywords
- slit
- waveform
- electron beam
- rotating
- changed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Analytical Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To perform an excellent exposure by a method wherein, when the rectangular beam shape is to be changed by shifting the first slit image in X and Y directions on the second slit, the matching by rotating is performed in such a manner that the beam end position on the bean transverse section on the sample surface is not shifted. CONSTITUTION:When the rectangular beam formed by the first slit 13 and the second slit 15 passes through a differentiation circuit, it is turned to a waveform a. Then, the differential waveform of the first slit 13, when passing through the second slit, which has moved on the first slit along Y axis, is changed to a waveform b. This is because of the rotation of the second slit, which retards the rotating speed by t1 seconds. In order to eliminate the deviation, the second slit is rotated is in such a manner that the t1 is zeroed. Through these procedures, the rotating positions of the two slits are matched and each side of a rectuangular electron beam can be faced sample surface in parallel, thereby enabling to perform an excellent exposure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13455180A JPS5759327A (en) | 1980-09-27 | 1980-09-27 | Method for variable rectangular electron beam exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13455180A JPS5759327A (en) | 1980-09-27 | 1980-09-27 | Method for variable rectangular electron beam exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5759327A true JPS5759327A (en) | 1982-04-09 |
Family
ID=15130956
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13455180A Pending JPS5759327A (en) | 1980-09-27 | 1980-09-27 | Method for variable rectangular electron beam exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5759327A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07107205B2 (en) * | 1983-03-07 | 1995-11-15 | イーストマン・コダック・カンパニー | Cutting device and method |
-
1980
- 1980-09-27 JP JP13455180A patent/JPS5759327A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07107205B2 (en) * | 1983-03-07 | 1995-11-15 | イーストマン・コダック・カンパニー | Cutting device and method |
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