JPS5756067B2 - - Google Patents
Info
- Publication number
- JPS5756067B2 JPS5756067B2 JP11768277A JP11768277A JPS5756067B2 JP S5756067 B2 JPS5756067 B2 JP S5756067B2 JP 11768277 A JP11768277 A JP 11768277A JP 11768277 A JP11768277 A JP 11768277A JP S5756067 B2 JPS5756067 B2 JP S5756067B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11768277A JPS5451831A (en) | 1977-09-30 | 1977-09-30 | Photomask material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11768277A JPS5451831A (en) | 1977-09-30 | 1977-09-30 | Photomask material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5451831A JPS5451831A (en) | 1979-04-24 |
| JPS5756067B2 true JPS5756067B2 (ja) | 1982-11-27 |
Family
ID=14717670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11768277A Granted JPS5451831A (en) | 1977-09-30 | 1977-09-30 | Photomask material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5451831A (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10913132B2 (en) | 2017-08-30 | 2021-02-09 | Tamura Corporation | Solder composition, electronic board, and bonding method |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5619054A (en) * | 1979-07-25 | 1981-02-23 | Mitsubishi Electric Corp | Metal photomask |
| JPS5685751A (en) * | 1979-12-14 | 1981-07-13 | Fujitsu Ltd | Photomask |
| JPS56133736A (en) * | 1980-03-25 | 1981-10-20 | Fujitsu Ltd | Photomask |
| JPS6018870Y2 (ja) * | 1980-08-18 | 1985-06-07 | 株式会社東芝 | プラグインユニツト収納装置 |
| JPS5741638A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Photomask for electron beam |
| JPS57182740A (en) * | 1981-05-07 | 1982-11-10 | Dainippon Printing Co Ltd | Photomask |
| JPS57144550A (en) * | 1981-02-28 | 1982-09-07 | Dainippon Printing Co Ltd | Blank plate for photomask |
| JPS57144549A (en) * | 1981-02-28 | 1982-09-07 | Dainippon Printing Co Ltd | Photomask |
| JPS5764739A (en) * | 1980-10-09 | 1982-04-20 | Dainippon Printing Co Ltd | Photomask substrate and photomask |
| JPS57182741A (en) * | 1981-05-07 | 1982-11-10 | Dainippon Printing Co Ltd | Photomask blank plate |
| US4411972A (en) * | 1981-12-30 | 1983-10-25 | International Business Machines Corporation | Integrated circuit photomask |
| JPS6231853A (ja) * | 1985-08-03 | 1987-02-10 | Fujitsu Ltd | 石英マスク |
| JPS61209451A (ja) * | 1985-12-20 | 1986-09-17 | Konishiroku Photo Ind Co Ltd | フオトマスク |
| KR0186190B1 (en) * | 1995-09-25 | 1999-04-01 | Hyundai Micro Electronics Co | Phase shift mask and its manufacture |
| JP6469983B2 (ja) * | 2014-07-16 | 2019-02-13 | Hoya株式会社 | レジスト膜付きマスクブランクおよびその製造方法ならびに転写用マスクの製造方法 |
| JP6621947B2 (ja) * | 2019-01-17 | 2019-12-18 | Hoya株式会社 | レジスト膜付きマスクブランクおよびその製造方法ならびに転写用マスクの製造方法 |
-
1977
- 1977-09-30 JP JP11768277A patent/JPS5451831A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10913132B2 (en) | 2017-08-30 | 2021-02-09 | Tamura Corporation | Solder composition, electronic board, and bonding method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5451831A (en) | 1979-04-24 |