JPS57182740A - Photomask - Google Patents

Photomask

Info

Publication number
JPS57182740A
JPS57182740A JP6869381A JP6869381A JPS57182740A JP S57182740 A JPS57182740 A JP S57182740A JP 6869381 A JP6869381 A JP 6869381A JP 6869381 A JP6869381 A JP 6869381A JP S57182740 A JPS57182740 A JP S57182740A
Authority
JP
Japan
Prior art keywords
material selected
mask
static electricity
layer
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6869381A
Other languages
Japanese (ja)
Other versions
JPS6322300B2 (en
Inventor
Chihiro Tabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP6869381A priority Critical patent/JPS57182740A/en
Priority to DE8181107702T priority patent/DE3173769D1/en
Priority to EP81107702A priority patent/EP0049799B1/en
Priority to US06/318,201 priority patent/US4440841A/en
Publication of JPS57182740A publication Critical patent/JPS57182740A/en
Publication of JPS6322300B2 publication Critical patent/JPS6322300B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To raise durability without causing defects due to static electricity, by providing a protective layer between a conductive layer and a mask. CONSTITUTION:A transparent conductive thin film layer 2 made of a material selected from Mo, Ta, Nb, Ti, Cr, V, W, Zr, Au, In2O3, and SnO2; a transparent protective layer 3, resistant to chemicals, made of a material selected from Al2O3, CaO, MgO, SiO2, CeO2, and TiO2; and a mask 4 formed into a pattern made of a material selected from Cr, Cr2O3, Si, Ta2O3, Ta, and Fe2O3 are successively formed on a transparent substrate 1, thus permitting the conductive film layer 2 to be made hardly destructible, the maks 4 to be made easily washable, and durable without causing defects due to conductivity change and static electricity.
JP6869381A 1980-10-09 1981-05-07 Photomask Granted JPS57182740A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6869381A JPS57182740A (en) 1981-05-07 1981-05-07 Photomask
DE8181107702T DE3173769D1 (en) 1980-10-09 1981-09-28 Photomask blank and photomask
EP81107702A EP0049799B1 (en) 1980-10-09 1981-09-28 Photomask blank and photomask
US06/318,201 US4440841A (en) 1981-02-28 1981-11-04 Photomask and photomask blank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6869381A JPS57182740A (en) 1981-05-07 1981-05-07 Photomask

Publications (2)

Publication Number Publication Date
JPS57182740A true JPS57182740A (en) 1982-11-10
JPS6322300B2 JPS6322300B2 (en) 1988-05-11

Family

ID=13381089

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6869381A Granted JPS57182740A (en) 1980-10-09 1981-05-07 Photomask

Country Status (1)

Country Link
JP (1) JPS57182740A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH032756A (en) * 1989-05-30 1991-01-09 Hoya Corp Photomask blank and photomask

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4953039A (en) * 1972-06-20 1974-05-23
JPS5352073A (en) * 1976-10-22 1978-05-12 Hoya Denshi Kk Photomask for ic
JPS5444479A (en) * 1977-09-12 1979-04-07 Ibm Sealed cooler
JPS5451831A (en) * 1977-09-30 1979-04-24 Konishiroku Photo Ind Co Ltd Photomask material
JPS57144549A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Photomask

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4953039A (en) * 1972-06-20 1974-05-23
JPS5352073A (en) * 1976-10-22 1978-05-12 Hoya Denshi Kk Photomask for ic
JPS5444479A (en) * 1977-09-12 1979-04-07 Ibm Sealed cooler
JPS5451831A (en) * 1977-09-30 1979-04-24 Konishiroku Photo Ind Co Ltd Photomask material
JPS57144549A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Photomask

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH032756A (en) * 1989-05-30 1991-01-09 Hoya Corp Photomask blank and photomask

Also Published As

Publication number Publication date
JPS6322300B2 (en) 1988-05-11

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