JPS57182741A - Photomask blank plate - Google Patents

Photomask blank plate

Info

Publication number
JPS57182741A
JPS57182741A JP6869481A JP6869481A JPS57182741A JP S57182741 A JPS57182741 A JP S57182741A JP 6869481 A JP6869481 A JP 6869481A JP 6869481 A JP6869481 A JP 6869481A JP S57182741 A JPS57182741 A JP S57182741A
Authority
JP
Japan
Prior art keywords
layer
material selected
conductive
blank plate
static electricity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6869481A
Other languages
Japanese (ja)
Other versions
JPS6322301B2 (en
Inventor
Chihiro Tabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP6869481A priority Critical patent/JPS57182741A/en
Priority to EP81107702A priority patent/EP0049799B1/en
Priority to DE8181107702T priority patent/DE3173769D1/en
Priority to US06/318,201 priority patent/US4440841A/en
Publication of JPS57182741A publication Critical patent/JPS57182741A/en
Publication of JPS6322301B2 publication Critical patent/JPS6322301B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Abstract

PURPOSE:To provide a blank plate capable of forming a durable photomask without causing defects due to static electricity, by providing a protective layer between a conductive layer and a mask. CONSTITUTION:A transparent conductive thin film 2 made of a material selected from Mo, Ta, Nb, Ti, Cr, V, W, Zr, Au, In2O3, or SnO2; a transparent protective film 3 resistant to chemicals, made of a material selected from CaO, MgO, Al2O3, SiO2, CeO2, and TiO2; and a light-shading thin film layer 4 made of a material selected from Cr, Cr2O3, Si, Ta, Ta2O3, and Fe2O3 are successively laminated on a conductive substrate 1, thus permitting an image-formed conductive film 2 to be made hardly destructible, the photomask formed from the layer 4 to be easily washed, scarecely cause defects due to static electricity, and have high durability.
JP6869481A 1980-10-09 1981-05-07 Photomask blank plate Granted JPS57182741A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6869481A JPS57182741A (en) 1981-05-07 1981-05-07 Photomask blank plate
EP81107702A EP0049799B1 (en) 1980-10-09 1981-09-28 Photomask blank and photomask
DE8181107702T DE3173769D1 (en) 1980-10-09 1981-09-28 Photomask blank and photomask
US06/318,201 US4440841A (en) 1981-02-28 1981-11-04 Photomask and photomask blank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6869481A JPS57182741A (en) 1981-05-07 1981-05-07 Photomask blank plate

Publications (2)

Publication Number Publication Date
JPS57182741A true JPS57182741A (en) 1982-11-10
JPS6322301B2 JPS6322301B2 (en) 1988-05-11

Family

ID=13381119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6869481A Granted JPS57182741A (en) 1980-10-09 1981-05-07 Photomask blank plate

Country Status (1)

Country Link
JP (1) JPS57182741A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60123843A (en) * 1983-12-09 1985-07-02 Hoya Corp Photomask blank and photomask
JP2014081449A (en) * 2012-10-15 2014-05-08 Clean Surface Gijutsu:Kk Mask blank and photomask

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4953039A (en) * 1972-06-20 1974-05-23
JPS5352073A (en) * 1976-10-22 1978-05-12 Hoya Denshi Kk Photomask for ic
JPS5444479A (en) * 1977-09-12 1979-04-07 Ibm Sealed cooler
JPS5451831A (en) * 1977-09-30 1979-04-24 Konishiroku Photo Ind Co Ltd Photomask material
JPS55147628A (en) * 1979-05-07 1980-11-17 Chiyou Lsi Gijutsu Kenkyu Kumiai Mask base material
JPS55161240A (en) * 1979-06-04 1980-12-15 Dainippon Printing Co Ltd Photomask
JPS5619054A (en) * 1979-07-25 1981-02-23 Mitsubishi Electric Corp Metal photomask
JPS57144550A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Blank plate for photomask

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4953039A (en) * 1972-06-20 1974-05-23
JPS5352073A (en) * 1976-10-22 1978-05-12 Hoya Denshi Kk Photomask for ic
JPS5444479A (en) * 1977-09-12 1979-04-07 Ibm Sealed cooler
JPS5451831A (en) * 1977-09-30 1979-04-24 Konishiroku Photo Ind Co Ltd Photomask material
JPS55147628A (en) * 1979-05-07 1980-11-17 Chiyou Lsi Gijutsu Kenkyu Kumiai Mask base material
JPS55161240A (en) * 1979-06-04 1980-12-15 Dainippon Printing Co Ltd Photomask
JPS5619054A (en) * 1979-07-25 1981-02-23 Mitsubishi Electric Corp Metal photomask
JPS57144550A (en) * 1981-02-28 1982-09-07 Dainippon Printing Co Ltd Blank plate for photomask

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60123843A (en) * 1983-12-09 1985-07-02 Hoya Corp Photomask blank and photomask
JPS6235663B2 (en) * 1983-12-09 1987-08-03 Hoya Corp
JP2014081449A (en) * 2012-10-15 2014-05-08 Clean Surface Gijutsu:Kk Mask blank and photomask
US9280045B2 (en) 2012-10-15 2016-03-08 Clean Surface Technology Co. Mask blank and photomask

Also Published As

Publication number Publication date
JPS6322301B2 (en) 1988-05-11

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