JPS5754368A - Handotaisochinoseizohoho - Google Patents

Handotaisochinoseizohoho

Info

Publication number
JPS5754368A
JPS5754368A JP13049480A JP13049480A JPS5754368A JP S5754368 A JPS5754368 A JP S5754368A JP 13049480 A JP13049480 A JP 13049480A JP 13049480 A JP13049480 A JP 13049480A JP S5754368 A JPS5754368 A JP S5754368A
Authority
JP
Japan
Prior art keywords
substrate
specific resistance
pulled
heat treatment
oxide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13049480A
Other languages
English (en)
Inventor
Kazutaka Kamitake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP13049480A priority Critical patent/JPS5754368A/ja
Publication of JPS5754368A publication Critical patent/JPS5754368A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Bipolar Transistors (AREA)
JP13049480A 1980-09-19 1980-09-19 Handotaisochinoseizohoho Pending JPS5754368A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13049480A JPS5754368A (ja) 1980-09-19 1980-09-19 Handotaisochinoseizohoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13049480A JPS5754368A (ja) 1980-09-19 1980-09-19 Handotaisochinoseizohoho

Publications (1)

Publication Number Publication Date
JPS5754368A true JPS5754368A (ja) 1982-03-31

Family

ID=15035598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13049480A Pending JPS5754368A (ja) 1980-09-19 1980-09-19 Handotaisochinoseizohoho

Country Status (1)

Country Link
JP (1) JPS5754368A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110400859A (zh) * 2019-08-23 2019-11-01 深圳市星华灿科技有限公司 一种红外三极管芯片制造工艺
CN110473923A (zh) * 2019-08-23 2019-11-19 深圳市星华灿科技有限公司 一种红外光敏三极管芯片

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110400859A (zh) * 2019-08-23 2019-11-01 深圳市星华灿科技有限公司 一种红外三极管芯片制造工艺
CN110473923A (zh) * 2019-08-23 2019-11-19 深圳市星华灿科技有限公司 一种红外光敏三极管芯片
CN110400859B (zh) * 2019-08-23 2020-06-23 深圳市星华灿科技有限公司 一种红外三极管芯片制造工艺

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