JPS5753979A - Kosokubaihooratoranjisutaoyobisonoseizohoho - Google Patents
KosokubaihooratoranjisutaoyobisonoseizohohoInfo
- Publication number
- JPS5753979A JPS5753979A JP12151181A JP12151181A JPS5753979A JP S5753979 A JPS5753979 A JP S5753979A JP 12151181 A JP12151181 A JP 12151181A JP 12151181 A JP12151181 A JP 12151181A JP S5753979 A JPS5753979 A JP S5753979A
- Authority
- JP
- Japan
- Prior art keywords
- kosokubaihooratoranjisutaoyobisonoseizohoho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/732—Vertical transistors
- H01L29/7325—Vertical transistors having an emitter-base junction leaving at a main surface and a base-collector junction leaving at a peripheral surface of the body, e.g. mesa planar transistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
- H01L21/28525—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table the conductive layers comprising semiconducting material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
- H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53271—Conductive materials containing semiconductor material, e.g. polysilicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1004—Base region of bipolar transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10642780A | 1980-08-04 | 1980-08-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5753979A true JPS5753979A (ja) | 1982-03-31 |
Family
ID=22311361
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12151181A Pending JPS5753979A (ja) | 1980-08-04 | 1981-08-04 | Kosokubaihooratoranjisutaoyobisonoseizohoho |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5753979A (ja) |
DE (1) | DE3129539A1 (ja) |
GB (1) | GB2081507A (ja) |
NL (1) | NL8103032A (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS592369A (ja) * | 1982-06-28 | 1984-01-07 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS5961179A (ja) * | 1982-09-30 | 1984-04-07 | Fujitsu Ltd | バイポ−ラ半導体装置の製造方法 |
JPS61164262A (ja) * | 1985-01-17 | 1986-07-24 | Toshiba Corp | 半導体装置 |
JPS63301562A (ja) * | 1987-02-10 | 1988-12-08 | テキサス インスツルメンツ インコーポレイテツド | 自己整合バイポーラトランジスタおよびその製作方法,とくに導電性シリコンコンタクト部形成方法 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3243059A1 (de) * | 1982-11-22 | 1984-05-24 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von bipolartransistorstrukturen mit selbstjustierten emitter- und basisbereichen fuer hoechstfrequenzschaltungen |
DE3334774A1 (de) * | 1983-09-26 | 1985-04-11 | Siemens AG, 1000 Berlin und 8000 München | Integrierbarer npn-transistor |
US5098854A (en) * | 1984-07-09 | 1992-03-24 | National Semiconductor Corporation | Process for forming self-aligned silicide base contact for bipolar transistor |
DE3580206D1 (de) * | 1984-07-31 | 1990-11-29 | Toshiba Kawasaki Kk | Bipolarer transistor und verfahren zu seiner herstellung. |
DE3686490T2 (de) * | 1985-01-22 | 1993-03-18 | Fairchild Semiconductor | Halbleiterstruktur. |
US5061986A (en) * | 1985-01-22 | 1991-10-29 | National Semiconductor Corporation | Self-aligned extended base contact for a bipolar transistor having reduced cell size and improved electrical characteristics |
US5045916A (en) * | 1985-01-22 | 1991-09-03 | Fairchild Semiconductor Corporation | Extended silicide and external contact technology |
US5227316A (en) * | 1985-01-22 | 1993-07-13 | National Semiconductor Corporation | Method of forming self aligned extended base contact for a bipolar transistor having reduced cell size |
US5340762A (en) * | 1985-04-01 | 1994-08-23 | Fairchild Semiconductor Corporation | Method of making small contactless RAM cell |
US5072275A (en) * | 1986-02-28 | 1991-12-10 | Fairchild Semiconductor Corporation | Small contactless RAM cell |
US5100824A (en) * | 1985-04-01 | 1992-03-31 | National Semiconductor Corporation | Method of making small contactless RAM cell |
US4746623A (en) * | 1986-01-29 | 1988-05-24 | Signetics Corporation | Method of making bipolar semiconductor device with wall spacer |
DE3680520D1 (de) * | 1986-03-22 | 1991-08-29 | Itt Ind Gmbh Deutsche | Verfahren zum herstellen einer monolithisch integrierten schaltung mit mindestens einem bipolaren planartransistor. |
GB2194676B (en) * | 1986-07-30 | 1991-03-20 | Mitsubishi Electric Corp | A semiconductor integrated circuit device and a method of producing same |
EP0270703B1 (de) * | 1986-12-12 | 1991-12-18 | Deutsche ITT Industries GmbH | Verfahren zum Herstellen einer monolithisch integrierten Schaltung mit mindestens einem bipolaren Planartransistor |
DE3817882A1 (de) * | 1988-05-26 | 1989-12-07 | Siemens Ag | Bipolartransistorstruktur mit reduziertem basiswiderstand und verfahren zur herstellung eines basisanschlussbereiches fuer die bipolartransistorstruktur |
KR900001034A (ko) * | 1988-06-27 | 1990-01-31 | 야마무라 가쯔미 | 반도체장치 |
US5455185A (en) * | 1991-02-08 | 1995-10-03 | Siemens Aktiengesellschaft | Method for manufacturing a bipolar transistor having base and collector in a vertical sequence |
US5358883A (en) * | 1992-02-03 | 1994-10-25 | Motorola, Inc. | Lateral bipolar transistor |
US6844225B2 (en) | 2003-01-15 | 2005-01-18 | International Business Machines Corporation | Self-aligned mask formed utilizing differential oxidation rates of materials |
-
1981
- 1981-06-23 NL NL8103032A patent/NL8103032A/nl not_active Application Discontinuation
- 1981-07-16 GB GB8121919A patent/GB2081507A/en not_active Withdrawn
- 1981-07-27 DE DE19813129539 patent/DE3129539A1/de not_active Withdrawn
- 1981-08-04 JP JP12151181A patent/JPS5753979A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS592369A (ja) * | 1982-06-28 | 1984-01-07 | Fujitsu Ltd | 半導体装置の製造方法 |
JPS5961179A (ja) * | 1982-09-30 | 1984-04-07 | Fujitsu Ltd | バイポ−ラ半導体装置の製造方法 |
JPS61164262A (ja) * | 1985-01-17 | 1986-07-24 | Toshiba Corp | 半導体装置 |
JPS63301562A (ja) * | 1987-02-10 | 1988-12-08 | テキサス インスツルメンツ インコーポレイテツド | 自己整合バイポーラトランジスタおよびその製作方法,とくに導電性シリコンコンタクト部形成方法 |
Also Published As
Publication number | Publication date |
---|---|
NL8103032A (nl) | 1982-03-01 |
GB2081507A (en) | 1982-02-17 |
DE3129539A1 (de) | 1982-06-03 |
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