JPS5753884A - Inspecting method of magnetic bubble element - Google Patents
Inspecting method of magnetic bubble elementInfo
- Publication number
- JPS5753884A JPS5753884A JP12798880A JP12798880A JPS5753884A JP S5753884 A JPS5753884 A JP S5753884A JP 12798880 A JP12798880 A JP 12798880A JP 12798880 A JP12798880 A JP 12798880A JP S5753884 A JPS5753884 A JP S5753884A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- measuring
- magnetic resistance
- change
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C19/00—Digital stores in which the information is moved stepwise, e.g. shift registers
- G11C19/02—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements
- G11C19/08—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure
Landscapes
- Magnetic Heads (AREA)
Abstract
PURPOSE:To realize the measurement of various characteristics such as a magnetic resistance, a coercive force in every process on a wafer, by measuring the characteristic of the measuring part for film characteristic consisting of a permalloy film formed on the wafer in every working stage. CONSTITUTION:A part 8 where a chip of a magnetic bubble element is formed at the center of a wafer 6 is coated on the wafer by means of, for instance, a sputtering process to be worked into a strip-shaped pattern. The change of magnetic resistance of that part is measured at this stage of process. Then an SiO2 film 4 is coated on the pattern by a sputtering process, and a through-hole 10 is provided to expose the surface of the part 8 for measuring. The change of magnetic resistance is measured again at this stage of process. In the same way, the subsequent stages of process are carried out successively, and the change of the magnetic resistance of the part 8 for measuring is measured in every process. Based on the results of these measurements, the working conditions for an actual production of magnetic bubble elements are obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12798880A JPS5753884A (en) | 1980-09-17 | 1980-09-17 | Inspecting method of magnetic bubble element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12798880A JPS5753884A (en) | 1980-09-17 | 1980-09-17 | Inspecting method of magnetic bubble element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5753884A true JPS5753884A (en) | 1982-03-31 |
Family
ID=14973664
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12798880A Pending JPS5753884A (en) | 1980-09-17 | 1980-09-17 | Inspecting method of magnetic bubble element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5753884A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60155707A (en) * | 1984-01-21 | 1985-08-15 | Nippon Silk Kk | Apparatus for monitoring reeled cocoon |
-
1980
- 1980-09-17 JP JP12798880A patent/JPS5753884A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60155707A (en) * | 1984-01-21 | 1985-08-15 | Nippon Silk Kk | Apparatus for monitoring reeled cocoon |
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