JPS52153494A - Measuring method for degree of deterioration of etching solutions - Google Patents
Measuring method for degree of deterioration of etching solutionsInfo
- Publication number
- JPS52153494A JPS52153494A JP6978476A JP6978476A JPS52153494A JP S52153494 A JPS52153494 A JP S52153494A JP 6978476 A JP6978476 A JP 6978476A JP 6978476 A JP6978476 A JP 6978476A JP S52153494 A JPS52153494 A JP S52153494A
- Authority
- JP
- Japan
- Prior art keywords
- degree
- deterioration
- measuring method
- etching solutions
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 title abstract 4
- 230000006866 deterioration Effects 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000725 suspension Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/06—Investigating concentration of particle suspensions
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
PURPOSE:To wastefulness of an etching solution is prevented and accurate and positive etching is performed by accurately measuring the degree of deterioration from the degree of suspension of the etching solution at the time of producing semiconductor elements.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6978476A JPS5926667B2 (en) | 1976-06-16 | 1976-06-16 | Etching processing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6978476A JPS5926667B2 (en) | 1976-06-16 | 1976-06-16 | Etching processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52153494A true JPS52153494A (en) | 1977-12-20 |
JPS5926667B2 JPS5926667B2 (en) | 1984-06-29 |
Family
ID=13412720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6978476A Expired JPS5926667B2 (en) | 1976-06-16 | 1976-06-16 | Etching processing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5926667B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0258466U (en) * | 1988-10-23 | 1990-04-26 |
-
1976
- 1976-06-16 JP JP6978476A patent/JPS5926667B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5926667B2 (en) | 1984-06-29 |
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