JPS5753366A - Nozzle plate for liquid jet apparatus - Google Patents
Nozzle plate for liquid jet apparatusInfo
- Publication number
- JPS5753366A JPS5753366A JP12795480A JP12795480A JPS5753366A JP S5753366 A JPS5753366 A JP S5753366A JP 12795480 A JP12795480 A JP 12795480A JP 12795480 A JP12795480 A JP 12795480A JP S5753366 A JPS5753366 A JP S5753366A
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- nozzle
- nozzle plate
- elements
- liquid jet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/02—Ink jet characterised by the jet generation process generating a continuous ink jet
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Nozzles (AREA)
- Spray Control Apparatus (AREA)
Abstract
PURPOSE:To detect the precise pressure so as to increase the response speed and to highly precisely control the pressure of liquid, by providing pressure-sensitive elements adjacent to a nozzle formed in a thin film part of a silicon single crystal wafer. CONSTITUTION:The undersurface of the diaphragm section 8a adjacent to the pressure-sensitive resistance elements 9 formed in the upper surface of the thin film diaphragm 8a of the silicon single crystal wafer 8 the (100) plane of the crystal of which is oriented in parallel with the surface is subjected to anisotropy etching to form the nozzle 13. Ink under pressure is jetted from the orifice of the nozzle 13, and the pressure of the ink is detected by the elements 9.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12795480A JPS5753366A (en) | 1980-09-17 | 1980-09-17 | Nozzle plate for liquid jet apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12795480A JPS5753366A (en) | 1980-09-17 | 1980-09-17 | Nozzle plate for liquid jet apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5753366A true JPS5753366A (en) | 1982-03-30 |
Family
ID=14972748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12795480A Pending JPS5753366A (en) | 1980-09-17 | 1980-09-17 | Nozzle plate for liquid jet apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5753366A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6198558A (en) * | 1984-10-15 | 1986-05-16 | エーテイーアンドテイー テレタイプ コーポレーシヨン | Nozzle and process in which structure of said nozzle is formed |
US7461913B2 (en) | 2004-09-30 | 2008-12-09 | Fujifilm Corporation | Liquid droplet ejection apparatus |
-
1980
- 1980-09-17 JP JP12795480A patent/JPS5753366A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6198558A (en) * | 1984-10-15 | 1986-05-16 | エーテイーアンドテイー テレタイプ コーポレーシヨン | Nozzle and process in which structure of said nozzle is formed |
US7461913B2 (en) | 2004-09-30 | 2008-12-09 | Fujifilm Corporation | Liquid droplet ejection apparatus |
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