JPS5749277A - Manufacture for schottky barrier diode - Google Patents

Manufacture for schottky barrier diode

Info

Publication number
JPS5749277A
JPS5749277A JP12559180A JP12559180A JPS5749277A JP S5749277 A JPS5749277 A JP S5749277A JP 12559180 A JP12559180 A JP 12559180A JP 12559180 A JP12559180 A JP 12559180A JP S5749277 A JPS5749277 A JP S5749277A
Authority
JP
Japan
Prior art keywords
film
poly crystalline
schottky barrier
opening
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12559180A
Other languages
English (en)
Inventor
Akio Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP12559180A priority Critical patent/JPS5749277A/ja
Publication of JPS5749277A publication Critical patent/JPS5749277A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • H01L29/872Schottky diodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Electrodes Of Semiconductors (AREA)
JP12559180A 1980-09-09 1980-09-09 Manufacture for schottky barrier diode Pending JPS5749277A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12559180A JPS5749277A (en) 1980-09-09 1980-09-09 Manufacture for schottky barrier diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12559180A JPS5749277A (en) 1980-09-09 1980-09-09 Manufacture for schottky barrier diode

Publications (1)

Publication Number Publication Date
JPS5749277A true JPS5749277A (en) 1982-03-23

Family

ID=14913950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12559180A Pending JPS5749277A (en) 1980-09-09 1980-09-09 Manufacture for schottky barrier diode

Country Status (1)

Country Link
JP (1) JPS5749277A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4622736A (en) * 1984-01-30 1986-11-18 Tektronix, Inc. Schottky barrier diodes
JPS63257269A (ja) * 1987-04-14 1988-10-25 Fujitsu Ltd 半導体装置のコンタクト形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4622736A (en) * 1984-01-30 1986-11-18 Tektronix, Inc. Schottky barrier diodes
JPS63257269A (ja) * 1987-04-14 1988-10-25 Fujitsu Ltd 半導体装置のコンタクト形成方法

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