JPS5747875A - Resist composition - Google Patents

Resist composition

Info

Publication number
JPS5747875A
JPS5747875A JP55121903A JP12190380A JPS5747875A JP S5747875 A JPS5747875 A JP S5747875A JP 55121903 A JP55121903 A JP 55121903A JP 12190380 A JP12190380 A JP 12190380A JP S5747875 A JPS5747875 A JP S5747875A
Authority
JP
Japan
Prior art keywords
resist
naphthylamine
benzotriazole
tertiary
hydroxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55121903A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6362593B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Komeno
Kosei Kajiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP55121903A priority Critical patent/JPS5747875A/ja
Publication of JPS5747875A publication Critical patent/JPS5747875A/ja
Publication of JPS6362593B2 publication Critical patent/JPS6362593B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
JP55121903A 1980-09-02 1980-09-02 Resist composition Granted JPS5747875A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55121903A JPS5747875A (en) 1980-09-02 1980-09-02 Resist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55121903A JPS5747875A (en) 1980-09-02 1980-09-02 Resist composition

Publications (2)

Publication Number Publication Date
JPS5747875A true JPS5747875A (en) 1982-03-18
JPS6362593B2 JPS6362593B2 (enrdf_load_stackoverflow) 1988-12-02

Family

ID=14822754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55121903A Granted JPS5747875A (en) 1980-09-02 1980-09-02 Resist composition

Country Status (1)

Country Link
JP (1) JPS5747875A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58182633A (ja) * 1982-04-19 1983-10-25 Tokyo Ohka Kogyo Co Ltd ポジ型画像の形成方法
JPS61130947A (ja) * 1984-11-30 1986-06-18 Japan Synthetic Rubber Co Ltd ポジ型レジスト組成物
JPS61219951A (ja) * 1985-03-27 1986-09-30 Japan Synthetic Rubber Co Ltd ポジ型感放射線性組成物
JPS63237053A (ja) * 1987-03-26 1988-10-03 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型感放射線性樹脂組成物
US4968582A (en) * 1988-06-28 1990-11-06 Mcnc And University Of Nc At Charlotte Photoresists resistant to oxygen plasmas
US5114827A (en) * 1988-06-28 1992-05-19 Microelectronics Center Of N.C. Photoresists resistant to oxygen plasmas
US7537974B2 (en) 2005-02-03 2009-05-26 Samsung Electronics Co., Ltd. Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58182633A (ja) * 1982-04-19 1983-10-25 Tokyo Ohka Kogyo Co Ltd ポジ型画像の形成方法
JPS61130947A (ja) * 1984-11-30 1986-06-18 Japan Synthetic Rubber Co Ltd ポジ型レジスト組成物
JPS61219951A (ja) * 1985-03-27 1986-09-30 Japan Synthetic Rubber Co Ltd ポジ型感放射線性組成物
JPS63237053A (ja) * 1987-03-26 1988-10-03 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型感放射線性樹脂組成物
US4968582A (en) * 1988-06-28 1990-11-06 Mcnc And University Of Nc At Charlotte Photoresists resistant to oxygen plasmas
US5114827A (en) * 1988-06-28 1992-05-19 Microelectronics Center Of N.C. Photoresists resistant to oxygen plasmas
US7537974B2 (en) 2005-02-03 2009-05-26 Samsung Electronics Co., Ltd. Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same

Also Published As

Publication number Publication date
JPS6362593B2 (enrdf_load_stackoverflow) 1988-12-02

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