JPS5745508A - Method of manufacturing optical lattice - Google Patents

Method of manufacturing optical lattice

Info

Publication number
JPS5745508A
JPS5745508A JP10432981A JP10432981A JPS5745508A JP S5745508 A JPS5745508 A JP S5745508A JP 10432981 A JP10432981 A JP 10432981A JP 10432981 A JP10432981 A JP 10432981A JP S5745508 A JPS5745508 A JP S5745508A
Authority
JP
Japan
Prior art keywords
manufacturing optical
optical lattice
lattice
manufacturing
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10432981A
Other languages
English (en)
Japanese (ja)
Inventor
Erumorifu Annu
Baretsuto Surujiyu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of JPS5745508A publication Critical patent/JPS5745508A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Holo Graphy (AREA)
  • Manufacturing Optical Record Carriers (AREA)
JP10432981A 1980-07-03 1981-07-03 Method of manufacturing optical lattice Pending JPS5745508A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8014839A FR2486251A1 (fr) 1980-07-03 1980-07-03 Procede de realisation d'un reseau optique

Publications (1)

Publication Number Publication Date
JPS5745508A true JPS5745508A (en) 1982-03-15

Family

ID=9243808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10432981A Pending JPS5745508A (en) 1980-07-03 1981-07-03 Method of manufacturing optical lattice

Country Status (5)

Country Link
JP (1) JPS5745508A (enExample)
CA (1) CA1155797A (enExample)
DE (1) DE3125998A1 (enExample)
FR (1) FR2486251A1 (enExample)
GB (1) GB2079536B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60123803A (ja) * 1983-12-09 1985-07-02 Pioneer Electronic Corp マイクロフレネルレンズの製造方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2131229B (en) * 1982-11-30 1986-06-11 Western Electric Co Photodetector
AT382040B (de) * 1983-03-01 1986-12-29 Guenther Stangl Verfahren zur herstellung von optisch strukturierten filtern fuer elektromagnetische strahlung und optisch strukturierter filter
JPS61149923A (ja) * 1984-12-25 1986-07-08 Sony Corp 位相型光学的ロ−パスフイルタ
US4772539A (en) * 1987-03-23 1988-09-20 International Business Machines Corporation High resolution E-beam lithographic technique
GB9207627D0 (en) * 1992-04-08 1992-05-27 Northern Telecom Ltd Manufacture of optical grating structures
US5836075A (en) * 1996-12-31 1998-11-17 Westinghouse Electric Corporation Process for forming combustion turbine components by transient liquid phase bonding
FR2870041B1 (fr) * 2004-05-06 2006-11-03 Nanoraptor Sa Procede de fabrication d'un composant presentant un relief nanometrique et/ou des variations d'epaisseur, composant et ses derives issus de ce procede et leurs applications
PL439368A1 (pl) * 2021-10-30 2023-05-02 Instytut Wysokich Ciśnień Polskiej Akademii Nauk Unipress Sposób wytwarzania obszaru o regularnie zmiennym współczynniku załamania światła w wybranej warstwie warstwowej struktury półprzewodnikowej

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1561784A (en) * 1976-11-23 1980-03-05 Atomic Energy Authority Uk Optical components

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60123803A (ja) * 1983-12-09 1985-07-02 Pioneer Electronic Corp マイクロフレネルレンズの製造方法

Also Published As

Publication number Publication date
FR2486251B1 (enExample) 1983-12-16
GB2079536B (en) 1984-07-11
FR2486251A1 (fr) 1982-01-08
DE3125998A1 (de) 1982-02-04
GB2079536A (en) 1982-01-20
CA1155797A (fr) 1983-10-25

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