JPS5743985A - Exciting method in sputtering apparatus - Google Patents

Exciting method in sputtering apparatus

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Publication number
JPS5743985A
JPS5743985A JP11921580A JP11921580A JPS5743985A JP S5743985 A JPS5743985 A JP S5743985A JP 11921580 A JP11921580 A JP 11921580A JP 11921580 A JP11921580 A JP 11921580A JP S5743985 A JPS5743985 A JP S5743985A
Authority
JP
Japan
Prior art keywords
target
errosion
magnetic field
forming
sputtering apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11921580A
Other languages
Japanese (ja)
Inventor
Kojirou Kazukane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11921580A priority Critical patent/JPS5743985A/en
Publication of JPS5743985A publication Critical patent/JPS5743985A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To use a target metal effectively and efficiently, by forming a uniform magnetic field to make equal the errosion region of a target over the entire target in a magnetron sputtering apparatus.
CONSTITUTION: In an magnetron sputtering apparatus, the target 1 is formed with chromium and its backing plate 2 with copper. Electromagnets 11 for forming a magnetic field is arranged like a matrix under the backing plate 2. An intermittent direct current or a plus minus inversion current is sent to the electromagnetic coil of the electromagnets 11 to excite the magnets. Errosion regions are formed with a uniform errosion depth over the entire surface of the target 1, by distributing densely a large number of N and S poles over the surface of the target 1 by this method and further by forming a uniform magnetic field intersecting rectangularly with an electric field in the vicinity of the surface of the target 1. Thus the target is used uniformly and effectively, and the efficiency of its application is so markedly improved that waste is eliminated.
COPYRIGHT: (C)1982,JPO&Japio
JP11921580A 1980-08-29 1980-08-29 Exciting method in sputtering apparatus Pending JPS5743985A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11921580A JPS5743985A (en) 1980-08-29 1980-08-29 Exciting method in sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11921580A JPS5743985A (en) 1980-08-29 1980-08-29 Exciting method in sputtering apparatus

Publications (1)

Publication Number Publication Date
JPS5743985A true JPS5743985A (en) 1982-03-12

Family

ID=14755789

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11921580A Pending JPS5743985A (en) 1980-08-29 1980-08-29 Exciting method in sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS5743985A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2534276A1 (en) * 1982-10-11 1984-04-13 Commissariat Energie Atomique Process and device for coating an article using cathodic sputtering.
JPS6188470A (en) * 1984-04-27 1986-05-06 オスカ−・ヴエ−ルツ・インハ−ベル・ハンス・ヴエ−ルツ Electric terminal
JP2020139213A (en) * 2019-03-01 2020-09-03 株式会社アルバック Cathode unit for magnetron sputtering device, and film deposition method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2534276A1 (en) * 1982-10-11 1984-04-13 Commissariat Energie Atomique Process and device for coating an article using cathodic sputtering.
JPS6188470A (en) * 1984-04-27 1986-05-06 オスカ−・ヴエ−ルツ・インハ−ベル・ハンス・ヴエ−ルツ Electric terminal
JP2020139213A (en) * 2019-03-01 2020-09-03 株式会社アルバック Cathode unit for magnetron sputtering device, and film deposition method

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