JPS5743985A - Exciting method in sputtering apparatus - Google Patents
Exciting method in sputtering apparatusInfo
- Publication number
- JPS5743985A JPS5743985A JP11921580A JP11921580A JPS5743985A JP S5743985 A JPS5743985 A JP S5743985A JP 11921580 A JP11921580 A JP 11921580A JP 11921580 A JP11921580 A JP 11921580A JP S5743985 A JPS5743985 A JP S5743985A
- Authority
- JP
- Japan
- Prior art keywords
- target
- errosion
- magnetic field
- forming
- sputtering apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE: To use a target metal effectively and efficiently, by forming a uniform magnetic field to make equal the errosion region of a target over the entire target in a magnetron sputtering apparatus.
CONSTITUTION: In an magnetron sputtering apparatus, the target 1 is formed with chromium and its backing plate 2 with copper. Electromagnets 11 for forming a magnetic field is arranged like a matrix under the backing plate 2. An intermittent direct current or a plus minus inversion current is sent to the electromagnetic coil of the electromagnets 11 to excite the magnets. Errosion regions are formed with a uniform errosion depth over the entire surface of the target 1, by distributing densely a large number of N and S poles over the surface of the target 1 by this method and further by forming a uniform magnetic field intersecting rectangularly with an electric field in the vicinity of the surface of the target 1. Thus the target is used uniformly and effectively, and the efficiency of its application is so markedly improved that waste is eliminated.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11921580A JPS5743985A (en) | 1980-08-29 | 1980-08-29 | Exciting method in sputtering apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11921580A JPS5743985A (en) | 1980-08-29 | 1980-08-29 | Exciting method in sputtering apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5743985A true JPS5743985A (en) | 1982-03-12 |
Family
ID=14755789
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11921580A Pending JPS5743985A (en) | 1980-08-29 | 1980-08-29 | Exciting method in sputtering apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5743985A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2534276A1 (en) * | 1982-10-11 | 1984-04-13 | Commissariat Energie Atomique | Process and device for coating an article using cathodic sputtering. |
JPS6188470A (en) * | 1984-04-27 | 1986-05-06 | オスカ−・ヴエ−ルツ・インハ−ベル・ハンス・ヴエ−ルツ | Electric terminal |
JP2020139213A (en) * | 2019-03-01 | 2020-09-03 | 株式会社アルバック | Cathode unit for magnetron sputtering device, and film deposition method |
-
1980
- 1980-08-29 JP JP11921580A patent/JPS5743985A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2534276A1 (en) * | 1982-10-11 | 1984-04-13 | Commissariat Energie Atomique | Process and device for coating an article using cathodic sputtering. |
JPS6188470A (en) * | 1984-04-27 | 1986-05-06 | オスカ−・ヴエ−ルツ・インハ−ベル・ハンス・ヴエ−ルツ | Electric terminal |
JP2020139213A (en) * | 2019-03-01 | 2020-09-03 | 株式会社アルバック | Cathode unit for magnetron sputtering device, and film deposition method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0253344A3 (en) | Sputtering cathode based on the magnetron principle | |
ATE137887T1 (en) | DEVICE FOR COATING SUBSTRATES BY CATHODE SPUTTING | |
FR2454178A1 (en) | PROCESS FOR MAGNETICALLY IMPROVING CATHODE SPRAYING OF MAGNETICALLY PERMEABLE TARGETS AND CATHODE SPRAYING DEVICE | |
JPS5743985A (en) | Exciting method in sputtering apparatus | |
JPS5334272A (en) | Steel plate magnetically floating conveying apparatus | |
SG49730A1 (en) | Magnetron sputter coating method and apparatus with rotating magnet cathode | |
EP0392097B1 (en) | Apparatus for water treatment | |
JPS5531142A (en) | Pressed magnetic field type magnetron sputter by focusing magnetic field | |
JPS5747870A (en) | Magnetron sputtering method for ferromagnetic material | |
JPS5625975A (en) | Deterioration preventing method for concrete structure | |
GB2129830B (en) | Method and means for generating electrical and magnetic fields in salt water environments | |
JPS57110689A (en) | Surface working method | |
JPS56156763A (en) | Finely working method and apparatus by plasma sputtering | |
JPS6432631A (en) | Etching device | |
JPS57118619A (en) | High speed sputtering device for ferromagnetic material | |
JPS5629115A (en) | Manufacture for magnetic scale | |
CN1004495B (en) | Combined magnetic-controlled sputter target and its plating method | |
CA1239115B (en) | Sputtering apparatus and method | |
JPS55148769A (en) | Magnetron type sputtering apparatus | |
JPS5372790A (en) | Evaporating apparatus by sputtering | |
JPS6474725A (en) | Etching device | |
JPS55105314A (en) | Manufacturing method of roll-shaped magnet | |
JPS5665975A (en) | Surface treatment of metal | |
JPS62149868A (en) | High-speed sputtering method for ferromagnetic material | |
JPS51137403A (en) | Method and apparatus for magnetic field orientation of magnetic thin film |